BR112015032169A8 - Método para o revestimento de uma peça de trabalho - Google Patents
Método para o revestimento de uma peça de trabalhoInfo
- Publication number
- BR112015032169A8 BR112015032169A8 BR112015032169A BR112015032169A BR112015032169A8 BR 112015032169 A8 BR112015032169 A8 BR 112015032169A8 BR 112015032169 A BR112015032169 A BR 112015032169A BR 112015032169 A BR112015032169 A BR 112015032169A BR 112015032169 A8 BR112015032169 A8 BR 112015032169A8
- Authority
- BR
- Brazil
- Prior art keywords
- tixsi1
- layer
- workpiece
- target
- coating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0682—Silicides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
Abstract
CAMADAS DE TixSi1-xN E SUA PRODUÇÃO. A presente invenção se refere a uma peça de trabalho tendo um revestimento, o mencionado revestimento compreendendo pelo menos uma camada de TixSi1-xN, caracterizada pelo fato de que x (menor igual) 0,85 e a camada de TixSi1-xN contém nanocristais, os nanocristais presentes apresentam um tamanho médio de grão não maior do que 15 nm e uma (200) textura. A presente invenção também se refere a um processo para a produção da camada anteriormente mencionada, caracterizado pelo fato de que a camada é produzida com a utilização de um processo de pulverização, no qual densidades de corrente maiores do que 0,2 A/cm2 aparecem na superfície alvo do alvo de pulverização, e o alvo consiste de um alvo de TixSi1-xN, no qual x (menor igual) 0,85. Uma camada intermediária contendo TiAlN ou CrAlN é providenciada preferencialmente entre a camada de TixSi1-xN e o corpo do substrato da peça de trabalho.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013011073.4 | 2013-07-03 | ||
| DE102013011073.4A DE102013011073A1 (de) | 2013-07-03 | 2013-07-03 | TlxSi1-xN Schichten und ihre Herstellung |
| DE201310011071 DE102013011071A1 (de) | 2013-07-03 | 2013-07-03 | TixSi1-xN Schichten mit CryAl1-yN Haftschicht und ihre Herstellung |
| DE102013011071.8 | 2013-07-03 | ||
| PCT/EP2014/001792 WO2015000581A1 (de) | 2013-07-03 | 2014-07-01 | Tixsi1-xn schichten und ihre herstellung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| BR112015032169A2 BR112015032169A2 (pt) | 2017-07-25 |
| BR112015032169A8 true BR112015032169A8 (pt) | 2018-01-02 |
| BR112015032169B1 BR112015032169B1 (pt) | 2022-04-19 |
Family
ID=51167846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112015032169-0A BR112015032169B1 (pt) | 2013-07-03 | 2014-07-01 | Método para o revestimento de uma peça de trabalho |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US9840768B2 (pt) |
| EP (1) | EP3017079B2 (pt) |
| JP (1) | JP6122975B2 (pt) |
| KR (2) | KR101891900B1 (pt) |
| CN (1) | CN105392911B (pt) |
| BR (1) | BR112015032169B1 (pt) |
| CA (1) | CA2916784C (pt) |
| ES (1) | ES2630316T5 (pt) |
| HK (1) | HK1219516A1 (pt) |
| IL (1) | IL243136A (pt) |
| MX (1) | MX361325B (pt) |
| MY (1) | MY187100A (pt) |
| PH (1) | PH12015502753B1 (pt) |
| PL (1) | PL3017079T5 (pt) |
| PT (1) | PT3017079T (pt) |
| RU (1) | RU2674179C2 (pt) |
| SG (1) | SG11201510417RA (pt) |
| WO (1) | WO2015000581A1 (pt) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6362003B2 (ja) * | 2016-03-30 | 2018-07-25 | 三菱日立ツール株式会社 | 被覆切削工具 |
| KR102336097B1 (ko) | 2017-09-27 | 2021-12-06 | 가부시키가이샤 몰디노 | 피복 절삭 공구 |
| CN115125486B (zh) * | 2022-07-27 | 2024-01-02 | 安徽工业大学 | 一种含有多层结构的高强韧纳米复合涂层及其制备方法 |
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| JPH07197246A (ja) * | 1993-12-28 | 1995-08-01 | Mitsubishi Materials Corp | 成膜中にパーティクル発生の少ないスパッタリング用Ｔｉシリサイド焼結ターゲット材 |
| JPH0867971A (ja) * | 1994-08-30 | 1996-03-12 | Mitsubishi Materials Corp | モザイク状Ｔｉシリサイドターゲット材 |
| DE19625577A1 (de) | 1996-06-27 | 1998-01-02 | Vaw Motor Gmbh | Aluminium-Gußteil und Verfahren zu seiner Herstellung |
| JP3417907B2 (ja) † | 2000-07-13 | 2003-06-16 | 日立ツール株式会社 | 多層皮膜被覆工具 |
| JP3996809B2 (ja) * | 2002-07-11 | 2007-10-24 | 住友電工ハードメタル株式会社 | 被覆切削工具 |
| US6906295B2 (en) * | 2003-02-20 | 2005-06-14 | National Material L.P. | Foodware with multilayer stick resistant ceramic coating and method of making |
| AU2003903853A0 (en) | 2003-07-25 | 2003-08-07 | Antoine Bittar | Barriers, materials and processes for solar selective surfaces |
| US7097922B2 (en) | 2004-05-03 | 2006-08-29 | General Motors Corporation | Multi-layered superhard nanocomposite coatings |
| JP2005344148A (ja) * | 2004-06-01 | 2005-12-15 | Sumitomo Electric Ind Ltd | 耐摩耗性被膜およびこれを用いた表面被覆切削工具 |
| US7790003B2 (en) * | 2004-10-12 | 2010-09-07 | Southwest Research Institute | Method for magnetron sputter deposition |
| US7348074B2 (en) | 2005-04-01 | 2008-03-25 | Oc Oerlikon Balzers Ag | Multilayer hard coating for tools |
| SE0500994L (sv) * | 2005-04-29 | 2006-10-30 | Seco Tools Ab | Tunt slitstarkt skikt |
| US8034459B2 (en) * | 2005-10-18 | 2011-10-11 | Southwest Research Institute | Erosion resistant coatings |
| GB0608582D0 (en) † | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
| US7939172B2 (en) * | 2006-05-17 | 2011-05-10 | G & H Technologies, Llc | Wear resistant vapor deposited coating, method of coating deposition and applications therefor |
| RU2327811C1 (ru) * | 2006-11-14 | 2008-06-27 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
| SE0602814L (sv) * | 2006-12-27 | 2008-06-28 | Sandvik Intellectual Property | Skärverktyg med multiskiktbeläggning |
| ATE520489T1 (de) | 2007-05-30 | 2011-09-15 | Sumitomo Elec Hardmetal Corp | Oberflächenbeschichtetes schneidwerkzeug |
| KR101200785B1 (ko) * | 2007-10-12 | 2012-11-13 | 히타치 쓰루 가부시키가이샤 | 경질 피막 피복 부재, 및 그 제조 방법 |
| EP2072637B1 (en) † | 2007-12-21 | 2018-08-15 | Sandvik Intellectual Property AB | Coated cutting tool and a method of making a coated cutting tool |
| JP5640004B2 (ja) | 2008-07-09 | 2014-12-10 | エーリコン・トレイディング・アーゲー・トリューバッハ | コーティングシステム、コーティングされたワークピースおよびその製造方法 |
| ATE535629T1 (de) * | 2008-07-29 | 2011-12-15 | Sulzer Metaplas Gmbh | Gepulstes hochleistungs-magnetronsputterverfahren sowie hochleistungs-elektroenergiequelle |
| JP5156971B2 (ja) | 2009-03-17 | 2013-03-06 | Ｓｍｃ株式会社 | 溶損防止用被覆部材 |
| SE533883C2 (sv) | 2009-06-01 | 2011-02-22 | Seco Tools Ab | Nanolaminerat belagt skärverktyg |
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| PL2524066T3 (pl) | 2010-01-11 | 2019-02-28 | Iscar Ltd. | Powleczone narzędzie tnące |
| JP2011167793A (ja) * | 2010-02-18 | 2011-09-01 | Mitsubishi Materials Corp | 表面被覆切削工具 |
| RU2428509C1 (ru) * | 2010-04-13 | 2011-09-10 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
| RU2419680C1 (ru) * | 2010-04-20 | 2011-05-27 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
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| DE102010034321B4 (de) | 2010-08-09 | 2017-04-06 | Technische Universität Dresden | Verfahren zur Herstellung einer Hartstoffbeschichtung auf metallischen, keramischen oder hartmetallischen Bauteilen sowie eine mit dem Verfahren hergestellte Hartstoffbeschichtung |
| WO2012070290A1 (ja) | 2010-11-26 | 2012-05-31 | 住友電工ハードメタル株式会社 | 表面被覆焼結体 |
| SG194537A1 (en) † | 2011-04-20 | 2013-12-30 | Oerlikon Trading Ag | High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation |
| DE102011018363A1 (de) † | 2011-04-20 | 2012-10-25 | Oerlikon Trading Ag, Trübbach | Hochleistungszerstäubungsquelle |
| DE102011117177A1 (de) | 2011-10-28 | 2013-05-02 | Oerlikon Trading Ag, Trübbach | Verfahren zur Bereitstellung sequenzieller Leistungspulse |
| DE102011053372A1 (de) | 2011-09-07 | 2013-03-07 | Walter Ag | Werkzeug mit chromhaltiger Funktionsschicht |
| WO2013083238A1 (de) | 2011-12-05 | 2013-06-13 | Oerlikon Trading Ag, Trübbach | Reaktiver sputterprozess |
| DE102012209293B3 (de) † | 2012-06-01 | 2013-06-20 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Sputterverfahren |
-
2014
- 2014-07-01 PT PT147371488T patent/PT3017079T/pt unknown
- 2014-07-01 CN CN201480037761.2A patent/CN105392911B/zh active Active
- 2014-07-01 MX MX2015017033A patent/MX361325B/es active IP Right Grant
- 2014-07-01 US US14/902,826 patent/US9840768B2/en active Active
- 2014-07-01 MY MYPI2015704719A patent/MY187100A/en unknown
- 2014-07-01 EP EP14737148.8A patent/EP3017079B2/de active Active
- 2014-07-01 WO PCT/EP2014/001792 patent/WO2015000581A1/de active Application Filing
- 2014-07-01 SG SG11201510417RA patent/SG11201510417RA/en unknown
- 2014-07-01 KR KR1020167002703A patent/KR101891900B1/ko active IP Right Grant
- 2014-07-01 CA CA2916784A patent/CA2916784C/en not_active Expired - Fee Related
- 2014-07-01 PL PL14737148T patent/PL3017079T5/pl unknown
- 2014-07-01 KR KR1020177026135A patent/KR102178189B1/ko active IP Right Grant
- 2014-07-01 RU RU2016102845A patent/RU2674179C2/ru active
- 2014-07-01 JP JP2015563197A patent/JP6122975B2/ja active Active
- 2014-07-01 ES ES14737148T patent/ES2630316T5/es active Active
- 2014-07-01 BR BR112015032169-0A patent/BR112015032169B1/pt active IP Right Grant
-
2015
- 2015-12-09 PH PH12015502753A patent/PH12015502753B1/en unknown
- 2015-12-15 IL IL243136A patent/IL243136A/en active IP Right Grant
-
2016
- 2016-06-29 HK HK16107568.9A patent/HK1219516A1/zh unknown
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