CN102918183B - 用于金属加工的pvd涂层 - Google Patents

用于金属加工的pvd涂层 Download PDF

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CN102918183B
CN102918183B CN201180020660.0A CN201180020660A CN102918183B CN 102918183 B CN102918183 B CN 102918183B CN 201180020660 A CN201180020660 A CN 201180020660A CN 102918183 B CN102918183 B CN 102918183B
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雅各布·舍伦
乔恩·安德森
约尔格·费特尔
于尔根·米勒
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Abstract

本发明涉及一种适于沉积在用于切屑形成金属加工的切割刀具刀片上的耐磨涂层。所述涂层包括至少两个层，所述两个层具有不同粒度，但具有本质上相同的成分。所述涂层是通过物理气相沉积(PVD)而沉积的。

Description

用于金属加工的PVD涂层
技术领域
本发明涉及一种耐磨涂层，该耐磨涂层适于沉积在用于切屑形成金属加工的切割刀具刀片上。涂层包括至少两个层，所述至少两层具有不同的粒度，但具有本质上(essentially)相同的成分。涂层通过物理气相沉积(PVD)而沉积。
背景技术
现代切屑形成金属加工增加的生产率需要具有高可靠性和优良耐磨特性的刀具。自20世纪60年代末期起，能够通过将合适的涂层涂覆到刀具表面而显著地延长刀具寿命就已经是众所周知的了。化学气相沉积(CVD)是第一种用于切割刀具的沉积技术，并且该方法仍然被广泛地用于沉积TiN、Ti(C，N)和Al2O3层。物理气相沉积(PVD)在20世纪80年代引入，并从那时起发展成从稳定金属化合物如TiN或Ti(C，N)的沉积到通过诸如溅射或阴极电弧蒸发之类的方法的、包括多种成分、亚稳化合物如(Ti，Al)N，(Ti，Si)N，或(Al，Cr)N的沉积。这些涂层的性能针对特定的应用进行优化，并且因此这些涂层的性能其在各自的应用领域之外就显著降低。例如，具有约5-30nm的典型粒度的细粒度涂层通常用于具有小切屑厚度的端铣刀，而随着在使用可转位刀片的铣削和车削应用中，切屑厚度和温度升高，具有约50-500nm的典型粒度的粗粒度涂层通常表现突出。
发明内容
本发明的目的在于提供一种在从很小到很大切屑厚度范围内的广阔应用领域中具有高加工性能的涂层。
本发明涉及一种适于沉积在用于切屑形成金属加工的切割刀具刀片上的耐磨涂层。根据本发明的涂层包含至少两个层，所述至少两个层具有本质上相同的成分，但具有不同的粒度。涂层具有广阔的应用领域，所述应用领域的范围从采用端铣刀的精加工到利用可转位刀片的中等精度加工或粗加工。涂层是通过物理气相沉积而沉积的。
附图说明
图1显示了根据本发明的涂层的断裂横截面的扫描电子显微镜图像(SEM)。涂层包括两个双层(图中标记为D)，每个双层均包括一个细粒度涂层(标记A)和一个粗粒度涂层(标记B)。
具体实施方式
本发明涉及一种用于切屑形成金属加工的切削刀具的耐磨PVD涂层。涂层包括一个或更多个D双层，其中每一个D双层由一个内B层和一个外A层构成，A层在没有中间层的情况下沉积在B层上。层A和层B具有本质上相同的成分，但不同之处在于其平均粒宽wA和wB，使得wA＜wB。层的粒宽w是在层的中间沿着垂直于晶粒生长方向的线跨越至少20个晶粒的破裂横截面扫描电子显微镜(SEM)图像上估算出来的。对于具有本质上相同的化学成分，这里意味着：A和B层从相同的阴极沉积而来，并且由于A层和B层沉积的工艺条件的不同，最终形成的A层和B层具有相同的化学元素，但每一种元素的原子含量(不包括氮)可能在近似±3at％单位内变化，而氮含量在每个D双层内是恒定的。
在每一个D双层内，优选的是，A层是细粒度的且2＜wA＜50nm，B层具有粗晶粒且大致柱状晶粒，且30＜wB＜500nm，并且wB/wA＞2。A层的厚度在0.03μm和5μm之间，优选在0.05μm和2μm之间，并且B层的厚度在0.1μm和5μm之间，优选在0.2μm和2μm之间。D双层的数量在1和100之间，优选在1到20之间，最优选在1和10之间。所有D双层的总厚度在0.3μm到20μm之间，优选在0.5μm到10μm之间。A层和B层之间的或D双层之间的过渡(transition)优选为突变或渐变，但是涂层还能够在D双层之间包括一个或更多个中间层，以实现在0.5μm到20μm之间的厚度。
本发明还涉及一种包括一个或更多个D双层的涂层，且在至少一个所述D双层中，粒度从粗粒度连续减小到细粒度。然后D双层被分成具有粗粒度和细粒度的两个层部分，并且这些层部分被分别定义为层A和层B。
根据本发明的涂层还可以包括如在本领域中已知的、被设置在基底和最里面的D双层之间的内侧单层和/或内侧多层，和/或被设置到最外面的D双层上的外侧单层和/或外侧多层，以实现在0.5μm到30μm之间，优选在0.5μm到15μm之间，最优选在0.5μm到10μm之间的总涂层厚度。
在一个优选实施例中，涂层包括一个D双层。
在另一优选实施例中，涂层包括两个D双层。
在第三优选实施例中，A层和B层具有根据如下化学式的成分：(Ti1-x1-y1Alx1Mey1)(N1-a1Qa1)z1，其中，0.3＜x1＜0.7，0≤y1＜0.3，优选0≤y1＜0.15，最优选y1＝0，0.90＜z1＜1.10，优选0.96＜z1＜1.04，0≤a1＜0.5，优选0≤a1＜0.3，最优选a1＝0。Me是Zr、Hf、V、Nb、Ta、Cr、Y、Sc、Ce、Mo、W和Si中的一个或更多个，优选是Zr、Hf、V、Nb、Cr、Ce和Si中的一个或更多个，并且Q是C、B、S和O中的一个或更多个。
在第四优选实施例中，A层和B层具有根据如下化学式的成分：(Ti1-x2-y2Six2Mey2)(N1-a2Qa2)z2，其中，0.02＜x2＜0.25，0≤y2＜0.3，优选0≤y2＜0.15，最优选y2＝0，0.90＜z2＜1.10，优选0.96＜z2＜1.04，0≤a2＜0.5，优选0≤a2＜0.3，最优选a2＝0。Me是Zr、Hf、V、Nb、Ta、Cr、Y、Sc、Ce、Mo、W和Al中的一个或更多个，优选是Zr、Hf、V、Nb、Cr、Ce和Al中的一个或更多个，并且Q是C、B、S和O中的一个或更多个。
在第五优选实施例中，A层和B层具有根据如下化学式的成分：(Cr1-x3-y3Alx3Mey3)(N1-a3Qa3)z3，其中，0.3＜x3＜0.75，0≤y3＜0.3，优选0≤y3＜0.15，最优选y3＝0，0.90＜z3＜1.10，优选0.96＜z3＜1.04，0≤a3＜0.5，优选0≤a3＜0.3，最优选a3＝0。Me是Zr、Hf、V、Nb、Ta、Cr、Y、Sc、Ce、Mo、W和Ti中的一个或更多个，优选是Zr、Hf、V、Nb、Cr、Ce和Ti中的一个或更多个，并且Q是C、B、S和O中的一个或更多个。
根据本发明中的A层和B层是通过PVD沉积的，优选地是通过阴极电弧度沉积的。粒度的变化可以通过多种方式实现，例如通过：1)改变阴极处的磁场，2)改变沉积温度，和/或3)改变蒸发电流。通过实验来确定合适的工艺条件是在熟悉本领的技术人员的能力范围内的。
示例1
根据本发明的(Ti，Al)N涂层通过阴极电弧蒸发沉积到硬质合金刀片上，并且主要成分是90wt％WC+10wt％Co。
在沉积之前，在碱性溶液和酒精的超声波浴中清洁刀片。将沉积室抽空到低于2.0×10-3Pa的基础压力，在这之后采用Ar离子来溅射清洗刀片。在总压强为4Pa的99.995％纯N2气氛中，在450℃下使用-80V的偏压和90A的蒸发电流，从成分为Ti∶Al＝34∶66的TiAl复合阴极沉积涂层。在阴极表面的前方的磁场被调节到两个水平，即M强和M弱之间，以分别产生A层和B层，其中M强大致垂直于阴极表面且其磁场强度在3-20mT的范围内在阴极表面上变化，而M弱也大致垂直于阴极表面且磁场强度在0.5-2.5mT的范围内。首先，在M弱下使用20％的总沉积时间沉积B层，然后在M强下使用30％的总沉积时间沉积A层，并且然后重复一次相同的流程。
将涂层采用扫描电子显微镜进行研究。图1显示了断裂横截面的SEM图像，其中清晰看到两个D双层，每一个D双层均由一个A层和一个B层组成。沿着图1b中示出的线估算平均粒宽w。两个A层均具有细粒度的等轴晶粒且w～19nm，并且两个B层均具有粗粒度的柱状晶粒且w～61nm。总涂层厚度约为2μm。
示例2
根据本发明的(Ti，Al)N涂层通过阴极电弧蒸发沉积到硬质合金刀片上，并且主要成分是90wt％WC+10wt％Co。沉积条件与示例1相同，但是首先在M弱下使用70％的总沉积时间沉积B层，并且然后在M强下使用30％的沉积时间沉积A层。层B的平均粒宽w被估算出来是w～70nm，而层A的平均粒宽w被估算出来是w～18nm。总涂层厚度约为2μm。
示例3
在铣削操作中使用如下数据条件测试示例1(此处记为Inv1)和示例2(Inv2)的涂层：
作为参考，使用了具有与本发明的涂层类似的成分和厚度的两个商用(Ti，Al)N涂层，即Ref1和Ref2。Ref1是用于该特定铣削操作的现有技术并且具有w～100nm的柱状晶粒和粗粒度。Ref2是w～15nm的细粒度的。
表显示出，发现本发明的涂层实现的刀具寿命与Ref1实现的刀具寿命处在同一水平或更高的水平，并且显著地高于Ref2实现的刀具寿命。
示例4
在如下数据条件下，在使用具有涂层的端铣刀的精加工操作中测试示例1(此处记为Inv1)和示例2(Inv2)的涂层：
作为参考，使用了与实施例3中所使用的相同的商用(Ti，Al)N涂层，即Ref1和Ref2。Ref2是用于该特定应用的现有技术。
表显示出，发现本发明的涂层实现的工具寿命与Ref2实现的工具寿命处在同一水平或更高的水平，并且显著地高于Ref1实现的工具寿命。

Claims (7)

1.一种用于切屑形成金属加工的切割刀具的耐磨PVD涂层，所述涂层沉积在基底上并且所述涂层包括一个或更多个D双层，其中每个D双层由一个内B层和一个外A层构成，所述A层在没有中间层的情况下沉积在所述B层上，其特征在于，所述A层和所述B层具有本质上相同的化学成分，但是在所述A层的平均粒宽wA和所述B层的平均粒宽wB方面彼此不同，使得wA<wB，并且在每个D双层内，所述A层是细粒度的，其中2<wA<50nm，所述B层是粗粒度的，其中30<wB<500nm，并且wB/wA>2，并且每一个所述A层的厚度都在0.03μm至5μm之间并且每一个B层的厚度都在0.1μm至5μm之间，由此所有D双层的总厚度在0.3μm至20μm之间。
2.根据权利要求1中的任一项所述的涂层，其特征在于，所述涂层在D双层之间包括一个或更多个中间层，以实现在0.5μm至20μm之间的厚度。
3.根据权利要求1和2中的任一项所述的涂层，其特征在于，所述涂层包括，被设置在基底和最里面的D双层之间的内侧单层和/或内侧多层，和/或被设置到最外面的D双层上的外侧单层和/或外侧多层，以实现在0.5μm至30μm之间的总涂层厚度。
4.根据权利要求1或2所述的涂层，其特征在于，所述A层和B层具有根据如下化学式的成分：(Ti1-x1-y1Alx1Mey1)(N1-a1Qa1)z1，其中，0.3<x1<0.7，0≦y1<0.3，0.90<z1<1.10，0≦a1<0.5，Me是Zr、Hf、V、Nb、Ta、Cr、Y、Sc、Ce、Mo、W和Si中的一个或更多个，并且Q是C、B、S和O中的一个或更多个。
5.根据权利要求1或2所述的涂层，其特征在于，所述A层和B层具有根据如下化学式的成分：(Ti1-x2-y2Six2Mey2)(N1-a2Qa2)z2，其中，0.02<x2<0.25，0≦y2<0.3，0.90<z2<1.10，0≦a2<0.5，Me是Zr、Hf、V、Nb、Ta、Cr、Y、Sc、Ce、Mo、W和Al中的一个或更多个，并且Q是C、B、S和O中的一个或更多个。
6.根据权利要求1或2所述的涂层，其特征在于，所述A层和B层具有根据如下化学式的成分：(Cr1-x3-y3Alx3Mey3)(N1-a3Qa3)z3，其中，0.3<x3<0.75，0≦y3<0.3，0.90<z3<1.10，0≦a3<0.5，Me是Zr、Hf、V、Nb、Ta、Cr、Y、Sc、Ce、Mo、W和Ti中的一个或更多个，并且Q是C、B、S和O中的一个或更多个。
7.根据权利要求1或2所述的涂层，其特征在于，所述A层和B层是通过阴极电弧蒸发而沉积的。
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