RU2016102845A - СЛОИ TixSi1-xN И ИХ ПОЛУЧЕНИЕ - Google Patents

СЛОИ TixSi1-xN И ИХ ПОЛУЧЕНИЕ Download PDF

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RU2016102845A
RU2016102845A RU2016102845A RU2016102845A RU2016102845A RU 2016102845 A RU2016102845 A RU 2016102845A RU 2016102845 A RU2016102845 A RU 2016102845A RU 2016102845 A RU2016102845 A RU 2016102845A RU 2016102845 A RU2016102845 A RU 2016102845A
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layer
workpiece
coating
intermediate layer
preform according
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RU2016102845A
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RU2674179C2 (ru
RU2016102845A3 (ru
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Денис КУРАПОВ
Зигфрид КРАССНИТЦЕР
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Эрликон Серфиз Солюшнз Аг, Трюббах
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Priority claimed from DE201310011071 external-priority patent/DE102013011071A1/de
Priority claimed from DE102013011073.4A external-priority patent/DE102013011073A1/de
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0682—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Coating By Spraying Or Casting (AREA)

Claims (9)


     1. Заготовка с покрытием, причем покрытие содержит по меньшей мере один слой TixSi1-xN, отличающаяся тем, что x≤0,85, и слой TixSi1-xN содержит нанокристаллы, и содержащиеся нанокристаллы имеют средний размер зерна не более 15 нм, причем x означает концентрацию Ti, выраженную в ат.%, при учете только металлических элементов.

     2. Заготовка по п.1, отличающаяся тем, что между слоем TixSi1-xN и основой заготовки предусмотрен промежуточный слой, содержащий TiAlN.

     3. Заготовка по п.2, отличающаяся тем, что между промежуточным слоем и слоем TixSi1-xN предусмотрен переходный слой, который содержит как TiAlN, так и TixSi1-xN.

     4. Заготовка по п.3, отличающаяся тем, что переходный слой является градиентным слоем, в котором содержание кремния повышается с увеличением расстояния от поверхности основы.

     5. Заготовка по п.1, отличающаяся тем, что между слоем TixSi1-xN и основой заготовки предусмотрен промежуточный слой, содержащий CryAl1-yN, где y означает концентрацию Cr, выраженную в ат.%, рассчитанную с учетом только металлических элементов.

     6. Заготовка по п.5, отличающаяся тем, что между промежуточным слоем и слоем TixSi1-xN предусмотрен переходный слой, который содержит как CryAl1-yN, так и TixSi1-xN.

     7. Заготовка по п.6, отличающаяся тем, что переходный слой является градиентным слоем, в котором доля кремния повышается с увеличением расстояния от поверхности основы.

     8. Способ нанесения покрытия на заготовку по одному из предыдущих пунктов, отличающийся тем, что для получения слоя TixSi1-xN применяется способ распыления, в котором в качестве распыляемой мишени применяется по меньшей мере одна мишень TixSi1-x, где x≤0,85 ат.%, причем на поверхности распыляемой мишени могут возникать плотности тока по меньшей мере 0,2 А/см2, предпочтительно больше 0,2 А/см2.

     9. Способ покрытия заготовки по одному из предыдущих пунктов 3, 4, 6 или 7, отличающийся тем, что промежуточный слой получают совместным распылением.
RU2016102845A 2013-07-03 2014-07-01 СЛОИ TixSi1-xN И ИХ ПОЛУЧЕНИЕ RU2674179C2 (ru)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE102013011073.4 2013-07-03
DE201310011071 DE102013011071A1 (de) 2013-07-03 2013-07-03 TixSi1-xN Schichten mit CryAl1-yN Haftschicht und ihre Herstellung
DE102013011073.4A DE102013011073A1 (de) 2013-07-03 2013-07-03 TlxSi1-xN Schichten und ihre Herstellung
DE102013011071.8 2013-07-03
PCT/EP2014/001792 WO2015000581A1 (de) 2013-07-03 2014-07-01 Tixsi1-xn schichten und ihre herstellung

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RU2016102845A true RU2016102845A (ru) 2017-08-09
RU2016102845A3 RU2016102845A3 (ru) 2018-05-24
RU2674179C2 RU2674179C2 (ru) 2018-12-05

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EP (1) EP3017079B2 (ru)
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KR (2) KR102178189B1 (ru)
CN (1) CN105392911B (ru)
BR (1) BR112015032169B1 (ru)
CA (1) CA2916784C (ru)
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MX (1) MX361325B (ru)
MY (1) MY187100A (ru)
PH (1) PH12015502753A1 (ru)
PL (1) PL3017079T5 (ru)
PT (1) PT3017079T (ru)
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PL3017079T5 (pl) 2020-12-28
KR101891900B1 (ko) 2018-09-28
MX2015017033A (es) 2016-10-26
US9840768B2 (en) 2017-12-12
ES2630316T5 (es) 2021-06-18
KR20160029091A (ko) 2016-03-14
SG11201510417RA (en) 2016-01-28
RU2674179C2 (ru) 2018-12-05
RU2016102845A3 (ru) 2018-05-24
BR112015032169B1 (pt) 2022-04-19
EP3017079B2 (de) 2020-09-09
MX361325B (es) 2018-11-20
JP2016534217A (ja) 2016-11-04
CN105392911A (zh) 2016-03-09
CA2916784C (en) 2018-07-31
PH12015502753B1 (en) 2016-03-21
JP6122975B2 (ja) 2017-04-26
BR112015032169A2 (pt) 2017-07-25
CN105392911B (zh) 2018-12-21
IL243136A (en) 2017-04-30
PH12015502753A1 (en) 2016-03-21
MY187100A (en) 2021-08-31
KR20170108177A (ko) 2017-09-26
HK1219516A1 (zh) 2017-04-07
EP3017079A1 (de) 2016-05-11
KR102178189B1 (ko) 2020-11-13
CA2916784A1 (en) 2015-01-08
BR112015032169A8 (pt) 2018-01-02
US20160177436A1 (en) 2016-06-23
ES2630316T3 (es) 2017-08-21
WO2015000581A1 (de) 2015-01-08
PT3017079T (pt) 2017-07-19
PL3017079T3 (pl) 2017-09-29
EP3017079B1 (de) 2017-04-12

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