SG11201403244WA - Low toxicity solvent system for polyamideimide resins and solvent system manufacture - Google Patents

Low toxicity solvent system for polyamideimide resins and solvent system manufacture

Info

Publication number
SG11201403244WA
SG11201403244WA SG11201403244WA SG11201403244WA SG11201403244WA SG 11201403244W A SG11201403244W A SG 11201403244WA SG 11201403244W A SG11201403244W A SG 11201403244WA SG 11201403244W A SG11201403244W A SG 11201403244WA SG 11201403244W A SG11201403244W A SG 11201403244WA
Authority
SG
Singapore
Prior art keywords
solvent system
low toxicity
polyamideimide resins
manufacture
system manufacture
Prior art date
Application number
SG11201403244WA
Other languages
English (en)
Inventor
John Sidenstick
David Noga
Kathryn Mullins
Mace Phillips
Original Assignee
Fujifilm Hunt Chemicals Us Inc
John Sidenstick
David Noga
Kathryn Mullins
Mace Phillips
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Hunt Chemicals Us Inc, John Sidenstick, David Noga, Kathryn Mullins, Mace Phillips filed Critical Fujifilm Hunt Chemicals Us Inc
Publication of SG11201403244WA publication Critical patent/SG11201403244WA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14Polyamide-imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20Diluents or solvents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
SG11201403244WA 2011-12-15 2012-12-17 Low toxicity solvent system for polyamideimide resins and solvent system manufacture SG11201403244WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161576247P 2011-12-15 2011-12-15
PCT/US2012/070192 WO2013090933A1 (en) 2011-12-15 2012-12-17 Low toxicity solvent system for polyamideimide resins and solvent system manufacture

Publications (1)

Publication Number Publication Date
SG11201403244WA true SG11201403244WA (en) 2014-07-30

Family

ID=48613287

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201403244WA SG11201403244WA (en) 2011-12-15 2012-12-17 Low toxicity solvent system for polyamideimide resins and solvent system manufacture

Country Status (8)

Country Link
US (1) US9751986B2 (pl)
EP (1) EP2791208B1 (pl)
JP (1) JP6087373B2 (pl)
CN (2) CN104144968A (pl)
ES (1) ES2641464T3 (pl)
IN (1) IN2014DN05779A (pl)
SG (1) SG11201403244WA (pl)
WO (1) WO2013090933A1 (pl)

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* Cited by examiner, † Cited by third party
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US9751986B2 (en) 2011-12-15 2017-09-05 Fujifilm Hunt Chemicals Us, Inc. Low toxicity solvent system for polyamideimide resins and solvent system manufacture
US9029441B2 (en) * 2011-12-15 2015-05-12 Fujifilm Hunt Chemicals Us, Inc. Low toxicity solvent system for polyamideimide and polyamide amic acid resins and coating solutions thereof
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DE102014104223A1 (de) * 2014-03-26 2015-10-01 Elantas Italia S.R.L. Neues Lösemittel für Polyamidimide und Polyimide
US9725617B2 (en) * 2014-04-17 2017-08-08 Fujifilm Hunt Chemicals U.S.A., Inc. Low toxicity solvent system for polyamideimide and polyamide amic acid resin coating
US9815941B2 (en) * 2014-04-17 2017-11-14 Cymer-Dayton, Llc Low toxicity solvent system for polyamdieimide and polyamide amic acid resin manufacture
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US10301506B2 (en) * 2016-06-06 2019-05-28 Cymer-Dayton, Llc Full scale process for preparing polymer powders
WO2018002988A1 (ja) * 2016-06-27 2018-01-04 日立化成株式会社 ポリアミドイミド樹脂組成物及び塗料
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JP7226507B2 (ja) * 2017-08-01 2023-02-21 株式会社レゾナック ポリアミドイミド樹脂組成物、フッ素塗料、及び導電性組成物
JP2021526508A (ja) * 2018-06-14 2021-10-07 シーイーエム コーポレイション 固相ペプチド合成のための溶媒系
CN110258118B (zh) * 2019-07-12 2021-07-13 开封大学 水溶性耐温型碳纤维上胶剂及其制备方法
KR20230052939A (ko) 2020-09-22 2023-04-20 엘란타스 유럽 에스.알.엘. 폴리아미드이미드를 포함하는 와이어 에나멜 조성물
CN115926163A (zh) * 2022-12-21 2023-04-07 开封夸克新材料有限公司 一种水性聚酰胺酰亚胺树脂分散液及其制备方法

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Also Published As

Publication number Publication date
WO2013090933A1 (en) 2013-06-20
ES2641464T3 (es) 2017-11-10
EP2791208A4 (en) 2015-07-22
JP2015522660A (ja) 2015-08-06
US20160002408A1 (en) 2016-01-07
JP6087373B2 (ja) 2017-03-01
CN104144968A (zh) 2014-11-12
EP2791208A1 (en) 2014-10-22
EP2791208B1 (en) 2017-09-06
CN108384004A (zh) 2018-08-10
IN2014DN05779A (pl) 2015-04-10
US9751986B2 (en) 2017-09-05

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