SG109002A1 - Lithographic apparatus, device manufacturing method, and device manufactured thereby - Google Patents

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Info

Publication number
SG109002A1
SG109002A1 SG200404373A SG200404373A SG109002A1 SG 109002 A1 SG109002 A1 SG 109002A1 SG 200404373 A SG200404373 A SG 200404373A SG 200404373 A SG200404373 A SG 200404373A SG 109002 A1 SG109002 A1 SG 109002A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
device manufacturing
manufactured
device manufactured
manufacturing
Prior art date
Application number
SG200404373A
Other languages
English (en)
Inventor
De Ven Bastiaan Lambertus Van
Gertjan Heerens
Robert Gabriel Mari Lansbergen
Martinus Hendrikus An Leenders
Erik Roelof Loopstra
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03077308A external-priority patent/EP1500980A1/en
Priority claimed from US10/740,822 external-priority patent/US7084961B2/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG109002A1 publication Critical patent/SG109002A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Library & Information Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200404373A 2003-07-22 2004-07-19 Lithographic apparatus, device manufacturing method, and device manufactured thereby SG109002A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03077308A EP1500980A1 (en) 2003-07-22 2003-07-22 Lithographic apparatus, device manufacturing method, and device manufactured thereby
US10/740,822 US7084961B2 (en) 2003-12-22 2003-12-22 Safety mechanism for a lithographic patterning device

Publications (1)

Publication Number Publication Date
SG109002A1 true SG109002A1 (en) 2005-02-28

Family

ID=34276734

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200404373A SG109002A1 (en) 2003-07-22 2004-07-19 Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG200404313A SG108972A1 (en) 2003-07-22 2004-07-19 Safety mechanism for a lithographic patterning device

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG200404313A SG108972A1 (en) 2003-07-22 2004-07-19 Safety mechanism for a lithographic patterning device

Country Status (6)

Country Link
EP (2) EP1500985B1 (zh)
JP (5) JP4116598B2 (zh)
KR (2) KR100748445B1 (zh)
CN (2) CN1577108B (zh)
SG (2) SG109002A1 (zh)
TW (2) TWI245170B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7755742B2 (en) * 2005-10-11 2010-07-13 Asml Netherlands B.V. Lithographic apparatus with mounted sensor
TWI393171B (zh) * 2006-01-19 2013-04-11 尼康股份有限公司 A moving body driving method and a moving body driving system, a pattern forming method and a pattern forming apparatus, an exposure method and an exposure apparatus, and an element manufacturing method
WO2008007521A1 (fr) * 2006-07-11 2008-01-17 Nikon Corporation Élément de support de réticule, étage de réticule, appareil d'exposition, procédé d'exposition par projection et procédé de fabrication de dispositif
US7869003B2 (en) 2006-07-12 2011-01-11 Asml Holding Nv Lithographic apparatus and device manufacturing method with reticle gripper
US8760187B2 (en) 2008-12-03 2014-06-24 L-3 Communications Corp. Thermocentric alignment of elements on parts of an apparatus
US8941814B2 (en) * 2011-06-20 2015-01-27 Nikon Corporation Multiple-blade holding devices
JP7097872B2 (ja) * 2016-07-29 2022-07-08 エーエスエムエル ホールディング エヌ．ブイ． ステージ装置
DE102017200636A1 (de) 2017-01-17 2018-07-19 Carl Zeiss Smt Gmbh Optische Anordnung, insbesondere Lithographiesystem, mit einer Transportsicherung
CN109856917A (zh) * 2017-11-30 2019-06-07 上海微电子装备（集团）股份有限公司 安全装置、工件台及光刻机
CN108362771A (zh) * 2018-02-13 2018-08-03 京东方科技集团股份有限公司 一种损伤监测装置及系统
KR20210090185A (ko) * 2018-11-16 2021-07-19 에이에스엠엘 홀딩 엔.브이. 충격 부하를 분산시키기 위한 다중-패드 레티클 범퍼
NL2024436A (en) * 2018-12-21 2020-07-07 Asml Holding Nv Direct drive reticle safety latch
CN113811819A (zh) * 2019-05-09 2021-12-17 Asml控股股份有限公司 缓冲器装置
US20230075162A1 (en) * 2020-02-14 2023-03-09 Asml Holding N.V. Reticle Gripper Damper and Isolation System for Lithographic Apparatuses

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012550A (ja) 1983-07-04 1985-01-22 Nippon Kogaku Kk <Nikon> 露光転写装置用マスク供給装置
US4820930A (en) * 1984-06-20 1989-04-11 Canon Kabushiki Kaisha Photomask positioning device
US4760429A (en) * 1986-11-05 1988-07-26 The Perkin-Elmer Corporation High speed reticle change system
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
JPH03273663A (ja) * 1990-03-23 1991-12-04 Canon Inc 基板保持装置
DE59105735D1 (de) 1990-05-02 1995-07-20 Fraunhofer Ges Forschung Belichtungsvorrichtung.
JP2699629B2 (ja) * 1990-09-07 1998-01-19 ヤマハ株式会社 楽音信号生成装置
US5253012A (en) * 1990-10-05 1993-10-12 Canon Kabushiki Kaisha Substrate holding apparatus for vertically holding a substrate in an exposure apparatus
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
IL119213A (en) * 1996-09-06 2000-08-31 Orbot Instr Ltd Universal chuck for holding plates of various sizes
US6172738B1 (en) * 1996-09-24 2001-01-09 Canon Kabushiki Kaisha Scanning exposure apparatus and device manufacturing method using the same
JP4072212B2 (ja) * 1996-11-19 2008-04-09 キヤノン株式会社 走査露光装置
JPH10116780A (ja) * 1996-10-14 1998-05-06 Nikon Corp 縦型基板保持装置
DE69735016T2 (de) 1996-12-24 2006-08-17 Asml Netherlands B.V. Lithographisches Gerät mit zwei Objekthaltern
DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab, Taeby Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
USRE40043E1 (en) 1997-03-10 2008-02-05 Asml Netherlands B.V. Positioning device having two object holders
JP3928232B2 (ja) * 1997-12-24 2007-06-13 ウシオ電機株式会社 露光装置におけるマスク保持装置
US6211945B1 (en) * 1998-05-19 2001-04-03 Orc Technologies, Inc. Apparatus and method for exposing substrates
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
JP2001203145A (ja) 2000-01-20 2001-07-27 Nikon Corp 露光装置
US6717159B2 (en) * 2000-10-18 2004-04-06 Nikon Corporation Low distortion kinematic reticle support
DE60219844T2 (de) * 2001-03-01 2008-01-17 Asml Netherlands B.V. Verfahren zur Übernahme einer lithographischen Maske
EP1237045B1 (en) * 2001-03-01 2007-05-02 ASML Netherlands B.V. Method of taking over a lithographic mask
JP2003203847A (ja) 2002-01-08 2003-07-18 Canon Inc 露光装置

Also Published As

Publication number Publication date
JP2008022034A (ja) 2008-01-31
CN1577108B (zh) 2010-10-06
CN1289969C (zh) 2006-12-13
TWI266153B (en) 2006-11-11
EP1500985B1 (en) 2014-02-26
JP2005045253A (ja) 2005-02-17
JP2008205479A (ja) 2008-09-04
CN1577108A (zh) 2005-02-09
EP1500985A3 (en) 2009-05-06
KR100614955B1 (ko) 2006-08-25
KR20050011713A (ko) 2005-01-29
JP2008053741A (ja) 2008-03-06
JP2005045254A (ja) 2005-02-17
KR100748445B1 (ko) 2007-08-10
KR20050011702A (ko) 2005-01-29
JP4468980B2 (ja) 2010-05-26
JP4112533B2 (ja) 2008-07-02
SG108972A1 (en) 2005-02-28
JP4116598B2 (ja) 2008-07-09
EP1500985A2 (en) 2005-01-26
JP4797036B2 (ja) 2011-10-19
TW200515105A (en) 2005-05-01
EP1517185A1 (en) 2005-03-23
TWI245170B (en) 2005-12-11
CN1577094A (zh) 2005-02-09
TW200510964A (en) 2005-03-16

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