SG106161A1 - Method and apparatus for isolating light source gas from main chamber gas in a lithography tool - Google Patents

Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Info

Publication number
SG106161A1
SG106161A1 SG200306781A SG200306781A SG106161A1 SG 106161 A1 SG106161 A1 SG 106161A1 SG 200306781 A SG200306781 A SG 200306781A SG 200306781 A SG200306781 A SG 200306781A SG 106161 A1 SG106161 A1 SG 106161A1
Authority
SG
Singapore
Prior art keywords
light source
gas
main chamber
lithography tool
source gas
Prior art date
Application number
SG200306781A
Other languages
English (en)
Inventor
Roux Stephen
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG106161A1 publication Critical patent/SG106161A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
SG200306781A 2002-11-21 2003-11-13 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool SG106161A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/300,898 US6770895B2 (en) 2002-11-21 2002-11-21 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Publications (1)

Publication Number Publication Date
SG106161A1 true SG106161A1 (en) 2004-09-30

Family

ID=32229878

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200306781A SG106161A1 (en) 2002-11-21 2003-11-13 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Country Status (7)

Country Link
US (3) US6770895B2 (ja)
EP (1) EP1422568A3 (ja)
JP (1) JP4516738B2 (ja)
KR (1) KR100822071B1 (ja)
CN (1) CN100476584C (ja)
SG (1) SG106161A1 (ja)
TW (1) TWI331702B (ja)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
US7094036B2 (en) * 2003-09-24 2006-08-22 The Boc Group Plc Vacuum pumping system
US8094288B2 (en) * 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9077022B2 (en) * 2004-10-29 2015-07-07 Medtronic, Inc. Lithium-ion battery
US7361911B2 (en) 2004-12-09 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006054726B4 (de) * 2006-11-21 2014-09-11 Asml Netherlands B.V. Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung
JP2009036182A (ja) * 2007-08-03 2009-02-19 Fuji Koki Corp 可変容量型圧縮機用制御弁
TWI402628B (zh) * 2007-08-31 2013-07-21 Cymer Inc 控管極遠紫外線（ｅｕｖ）光微影裝置腔室間之氣體流動的系統
US8115900B2 (en) 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5339742B2 (ja) * 2008-03-04 2013-11-13 ウシオ電機株式会社 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置
US8373145B2 (en) * 2008-05-22 2013-02-12 Vladimir Balakin Charged particle cancer therapy system magnet control method and apparatus
US8569717B2 (en) 2008-05-22 2013-10-29 Vladimir Balakin Intensity modulated three-dimensional radiation scanning method and apparatus
US8129699B2 (en) 2008-05-22 2012-03-06 Vladimir Balakin Multi-field charged particle cancer therapy method and apparatus coordinated with patient respiration
EP2283713B1 (en) 2008-05-22 2018-03-28 Vladimir Yegorovich Balakin Multi-axis charged particle cancer therapy apparatus
US8288742B2 (en) 2008-05-22 2012-10-16 Vladimir Balakin Charged particle cancer therapy patient positioning method and apparatus
US8188688B2 (en) 2008-05-22 2012-05-29 Vladimir Balakin Magnetic field control method and apparatus used in conjunction with a charged particle cancer therapy system
US8637833B2 (en) 2008-05-22 2014-01-28 Vladimir Balakin Synchrotron power supply apparatus and method of use thereof
US8368038B2 (en) 2008-05-22 2013-02-05 Vladimir Balakin Method and apparatus for intensity control of a charged particle beam extracted from a synchrotron
US9058910B2 (en) 2008-05-22 2015-06-16 Vladimir Yegorovich Balakin Charged particle beam acceleration method and apparatus as part of a charged particle cancer therapy system
US8229072B2 (en) * 2008-07-14 2012-07-24 Vladimir Balakin Elongated lifetime X-ray method and apparatus used in conjunction with a charged particle cancer therapy system
CN104597115B (zh) * 2015-02-12 2019-03-19 中国科学院光电研究院 极紫外辐照材料测试系统的真空获得装置及相应测试方法
WO2018039363A1 (en) 2016-08-23 2018-03-01 Randall May International, Inc. Instrument carrier with auto-release articulating back brace
CN111065887A (zh) * 2017-09-12 2020-04-24 Asml控股股份有限公司 光束指向监测和补偿系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0384754A2 (en) * 1989-02-24 1990-08-29 Micrion Corporation Localized vacuum apparatus and method
EP0826629A2 (en) * 1996-08-27 1998-03-04 The Boc Group, Inc. Recovery of noble gases

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58225636A (ja) * 1982-06-25 1983-12-27 バッテル・ディベロプメント・コーポレーション Ｘ線を対象物に照射する装置
US4692934A (en) * 1984-11-08 1987-09-08 Hampshire Instruments X-ray lithography system
JPH0744020B2 (ja) * 1986-05-13 1995-05-15 日本電信電話株式会社 プラズマｘ線源のｘ線取り出し装置
US4866517A (en) * 1986-09-11 1989-09-12 Hoya Corp. Laser plasma X-ray generator capable of continuously generating X-rays
JPS63292553A (ja) * 1987-05-25 1988-11-29 Agency Of Ind Science & Technol Ｘ線発生装置におけるプラズマ飛散防止機構
JP2572787B2 (ja) * 1987-11-18 1997-01-16 株式会社日立製作所 Ｘ線発生装置
DE69531019T2 (de) 1994-04-08 2004-01-08 Canon K.K. Behandlungsmethode und -vorrichtung für ein resistbeschichtetes Substrat
US6341006B1 (en) * 1995-04-07 2002-01-22 Nikon Corporation Projection exposure apparatus
US6133577A (en) 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6031241A (en) * 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6376329B1 (en) * 1997-08-04 2002-04-23 Nikon Corporation Semiconductor wafer alignment using backside illumination
JPH11204411A (ja) * 1998-01-19 1999-07-30 Nikon Corp 塗布現像露光装置
EP1083777A4 (en) * 1998-05-29 2004-03-05 Nippon Kogaku Kk LASER EXCITED PLASMA LIGHT SOURCE, LIGHTING DEVICE AND MANUFACTURING METHOD THEREOF
US6385290B1 (en) * 1998-09-14 2002-05-07 Nikon Corporation X-ray apparatus
WO2000019496A1 (fr) * 1998-09-28 2000-04-06 Hitachi, Ltd. Generateur au plasma laser de rayons x, dispositif d'alignement de semiconducteurs possedant ce generateur et procede d'exposition de semiconducteurs
JP3317957B2 (ja) * 1999-03-15 2002-08-26 サイマー インコーポレイテッド ブラストシールドを備えるプラズマフォーカス高エネルギフォトン源
US6190835B1 (en) * 1999-05-06 2001-02-20 Advanced Energy Systems, Inc. System and method for providing a lithographic light source for a semiconductor manufacturing process
JP2001108799A (ja) * 1999-10-08 2001-04-20 Nikon Corp Ｘ線発生装置、ｘ線露光装置及び半導体デバイスの製造方法
EP1098225A3 (en) 1999-11-05 2002-04-10 Asm Lithography B.V. Lithographic projection apparatus with purge gas system and method using the same
CA2392919A1 (en) * 1999-12-06 2001-06-07 Glaxo Group Limited Systems and methods to facilitate multiple order combinatorial chemical processes
US6469310B1 (en) * 1999-12-17 2002-10-22 Asml Netherlands B.V. Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
TW508980B (en) * 1999-12-23 2002-11-01 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
JP2001345263A (ja) * 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
AU2001259331A1 (en) * 2000-05-03 2001-11-12 Silicon Valley Group Inc Non-contact seal using purge gas
TW518913B (en) * 2000-07-03 2003-01-21 Asml Netherlands Bv Radiation source, lithographic apparatus, and semiconductor device manufacturing method
EP1186958B1 (en) 2000-09-04 2007-03-14 ASML Netherlands B.V. Lithographic projection apparatus
DE10061248B4 (de) * 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
EP1271604A4 (en) * 2001-01-10 2005-05-25 Ebara Corp EXAMINATION DEVICE AND INVESTIGATION METHOD WITH ELECTRON BEAM AND COMPONENT MANUFACTURING METHODS WITH THE INVESTIGATION DEVICE
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2002289585A (ja) 2001-03-26 2002-10-04 Ebara Corp 中性粒子ビーム処理装置
DE10139677A1 (de) 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
DE10134033A1 (de) 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung/weicher Röntgenstrahlung
EP1381919A1 (en) 2001-04-17 2004-01-21 Koninklijke Philips Electronics N.V. Euv-transparent interface structure
JP4995379B2 (ja) * 2001-06-18 2012-08-08 ギガフォトン株式会社 光源装置及びそれを用いた露光装置
JP2003068630A (ja) * 2001-08-29 2003-03-07 Kyocera Corp 露光装置
KR20040052231A (ko) * 2001-10-12 2004-06-22 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 리소그래피용 투영 장치, 소자 제조 방법 및 오염 물질집진부
US6762424B2 (en) * 2002-07-23 2004-07-13 Intel Corporation Plasma generation
DE10238096B3 (de) 2002-08-21 2004-02-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source
JP2004170787A (ja) * 2002-11-21 2004-06-17 Toshiba Corp 表示装置およびその駆動方法
US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
DE10256663B3 (de) 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
DE10310623B8 (de) 2003-03-10 2005-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
ATE476859T1 (de) 2003-03-18 2010-08-15 Koninkl Philips Electronics Nv Einrichtung und verfahren zur erzeugung von extrem-ultraviolett-und/oder weicher röntgenstrahlung mittels eines plasmas
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0384754A2 (en) * 1989-02-24 1990-08-29 Micrion Corporation Localized vacuum apparatus and method
EP0826629A2 (en) * 1996-08-27 1998-03-04 The Boc Group, Inc. Recovery of noble gases

Also Published As

Publication number Publication date
EP1422568A3 (en) 2006-02-01
EP1422568A2 (en) 2004-05-26
US20040155205A1 (en) 2004-08-12
US7087911B2 (en) 2006-08-08
CN100476584C (zh) 2009-04-08
JP2004172626A (ja) 2004-06-17
TW200411341A (en) 2004-07-01
US6894293B2 (en) 2005-05-17
JP4516738B2 (ja) 2010-08-04
CN1503058A (zh) 2004-06-09
US20050169767A1 (en) 2005-08-04
KR100822071B1 (ko) 2008-04-15
US20040099816A1 (en) 2004-05-27
KR20040045327A (ko) 2004-06-01
US6770895B2 (en) 2004-08-03
TWI331702B (en) 2010-10-11

Similar Documents

Publication Publication Date Title
SG106161A1 (en) Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
AU2003251878A8 (en) Method and apparatus for uniform lighting source
AU2003293396A8 (en) Gas distribution apparatus and method for uniform etching
SG115636A1 (en) Method and apparatus for recycling gases used in a lithography tool
DE60330940D1 (de) Vorrichtung und Verfahren zum Betrieb einer Hochdruckentladungslampe
EP1779481A4 (en) METHOD AND DEVICE FOR REDUCING COHERENCE FOR LIGHT EMITTED BY A GAS DISCHARGE LASER
AU2002310152A1 (en) Method and apparatus for generating source code
HK1081251A1 (en) Method and apparatus for controlling a gas-emitting process and related devices
AU2003239135A8 (en) Apparatus and method for powering portable battery operated light sources
AU2003216530A8 (en) Method and apparatus for manufacturing silica-titania extreme ultraviolet elements
AU2003212355A1 (en) Method and apparatus for using metadata from different sources
EP1644071A4 (en) METHOD AND DEVICE FOR SUPPLYING GAS TO A FIELD
GB0323001D0 (en) Apparatus and method for plasma treating a substrate
IL165326A0 (en) Method and apparatus for gas purification
AU2003239323A1 (en) Method and apparatus for enabling a quick repeat feature
SG117607A1 (en) Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus, device manufacturing method and device manufactured thereby
EP1467601A4 (en) APPARATUS AND METHOD FOR OPERATING A HIGH PRESSURE DISCHARGE LAMP
AU2003299552A8 (en) Method and apparatus for pressurizing a liquefied gas
AU2003266866A1 (en) Method and apparatus for generating and maintaining a plasma
GB0208037D0 (en) Method and apparatus for gas detection
AU2003210146A8 (en) Source of light and method for regenerating a source of light
AU2003242284A1 (en) Method and apparatus for gas sterilization
GB0204432D0 (en) Apparatus and method for generating a process definition
AUPS311402A0 (en) A method and apparatus for providing a reaction chamber
AU2003214403A8 (en) Method for analysing a gas sample and apparatus therefor