SG106161A1 - Method and apparatus for isolating light source gas from main chamber gas in a lithography tool - Google Patents

Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Info

Publication number
SG106161A1
SG106161A1 SG200306781A SG200306781A SG106161A1 SG 106161 A1 SG106161 A1 SG 106161A1 SG 200306781 A SG200306781 A SG 200306781A SG 200306781 A SG200306781 A SG 200306781A SG 106161 A1 SG106161 A1 SG 106161A1
Authority
SG
Singapore
Prior art keywords
light source
gas
main chamber
lithography tool
source gas
Prior art date
Application number
SG200306781A
Other languages
English (en)
Inventor
Roux Stephen
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG106161A1 publication Critical patent/SG106161A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
SG200306781A 2002-11-21 2003-11-13 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool SG106161A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/300,898 US6770895B2 (en) 2002-11-21 2002-11-21 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Publications (1)

Publication Number Publication Date
SG106161A1 true SG106161A1 (en) 2004-09-30

Family

ID=32229878

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200306781A SG106161A1 (en) 2002-11-21 2003-11-13 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Country Status (7)

Country Link
US (3) US6770895B2 (ja)
EP (1) EP1422568A3 (ja)
JP (1) JP4516738B2 (ja)
KR (1) KR100822071B1 (ja)
CN (1) CN100476584C (ja)
SG (1) SG106161A1 (ja)
TW (1) TWI331702B (ja)

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US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
US7094036B2 (en) * 2003-09-24 2006-08-22 The Boc Group Plc Vacuum pumping system
US8094288B2 (en) * 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9077022B2 (en) * 2004-10-29 2015-07-07 Medtronic, Inc. Lithium-ion battery
US7361911B2 (en) 2004-12-09 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006054726B4 (de) * 2006-11-21 2014-09-11 Asml Netherlands B.V. Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung
JP2009036182A (ja) * 2007-08-03 2009-02-19 Fuji Koki Corp 可変容量型圧縮機用制御弁
TWI402628B (zh) * 2007-08-31 2013-07-21 Cymer Inc 控管極遠紫外線（ｅｕｖ）光微影裝置腔室間之氣體流動的系統
US8115900B2 (en) 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5339742B2 (ja) * 2008-03-04 2013-11-13 ウシオ電機株式会社 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置
US8288742B2 (en) 2008-05-22 2012-10-16 Vladimir Balakin Charged particle cancer therapy patient positioning method and apparatus
US8637833B2 (en) 2008-05-22 2014-01-28 Vladimir Balakin Synchrotron power supply apparatus and method of use thereof
US8569717B2 (en) 2008-05-22 2013-10-29 Vladimir Balakin Intensity modulated three-dimensional radiation scanning method and apparatus
US8188688B2 (en) 2008-05-22 2012-05-29 Vladimir Balakin Magnetic field control method and apparatus used in conjunction with a charged particle cancer therapy system
EP2283711B1 (en) 2008-05-22 2018-07-11 Vladimir Yegorovich Balakin Charged particle beam acceleration apparatus as part of a charged particle cancer therapy system
EP2283713B1 (en) 2008-05-22 2018-03-28 Vladimir Yegorovich Balakin Multi-axis charged particle cancer therapy apparatus
US8373145B2 (en) * 2008-05-22 2013-02-12 Vladimir Balakin Charged particle cancer therapy system magnet control method and apparatus
US8368038B2 (en) 2008-05-22 2013-02-05 Vladimir Balakin Method and apparatus for intensity control of a charged particle beam extracted from a synchrotron
US8129699B2 (en) 2008-05-22 2012-03-06 Vladimir Balakin Multi-field charged particle cancer therapy method and apparatus coordinated with patient respiration
US8229072B2 (en) * 2008-07-14 2012-07-24 Vladimir Balakin Elongated lifetime X-ray method and apparatus used in conjunction with a charged particle cancer therapy system
CN104597115B (zh) * 2015-02-12 2019-03-19 中国科学院光电研究院 极紫外辐照材料测试系统的真空获得装置及相应测试方法
WO2018039363A1 (en) 2016-08-23 2018-03-01 Randall May International, Inc. Instrument carrier with auto-release articulating back brace
CN111065887A (zh) * 2017-09-12 2020-04-24 Asml控股股份有限公司 光束指向监测和补偿系统

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Also Published As

Publication number Publication date
KR20040045327A (ko) 2004-06-01
US6894293B2 (en) 2005-05-17
TWI331702B (en) 2010-10-11
JP2004172626A (ja) 2004-06-17
US20050169767A1 (en) 2005-08-04
EP1422568A3 (en) 2006-02-01
US6770895B2 (en) 2004-08-03
EP1422568A2 (en) 2004-05-26
TW200411341A (en) 2004-07-01
US20040099816A1 (en) 2004-05-27
US7087911B2 (en) 2006-08-08
CN100476584C (zh) 2009-04-08
CN1503058A (zh) 2004-06-09
JP4516738B2 (ja) 2010-08-04
KR100822071B1 (ko) 2008-04-15
US20040155205A1 (en) 2004-08-12

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