EP1422568A3 - Method and apparatus for preventing the mixing of a light source gas with the main chamber gas in a lithography tool - Google Patents

Method and apparatus for preventing the mixing of a light source gas with the main chamber gas in a lithography tool Download PDF

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Publication number
EP1422568A3
EP1422568A3 EP03026062A EP03026062A EP1422568A3 EP 1422568 A3 EP1422568 A3 EP 1422568A3 EP 03026062 A EP03026062 A EP 03026062A EP 03026062 A EP03026062 A EP 03026062A EP 1422568 A3 EP1422568 A3 EP 1422568A3
Authority
EP
European Patent Office
Prior art keywords
gas
mixing
preventing
light source
main chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP03026062A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1422568A2 (en
Inventor
Stephen Roux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of EP1422568A2 publication Critical patent/EP1422568A2/en
Publication of EP1422568A3 publication Critical patent/EP1422568A3/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
EP03026062A 2002-11-21 2003-11-12 Method and apparatus for preventing the mixing of a light source gas with the main chamber gas in a lithography tool Ceased EP1422568A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US300898 2002-11-21
US10/300,898 US6770895B2 (en) 2002-11-21 2002-11-21 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool

Publications (2)

Publication Number Publication Date
EP1422568A2 EP1422568A2 (en) 2004-05-26
EP1422568A3 true EP1422568A3 (en) 2006-02-01

Family

ID=32229878

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03026062A Ceased EP1422568A3 (en) 2002-11-21 2003-11-12 Method and apparatus for preventing the mixing of a light source gas with the main chamber gas in a lithography tool

Country Status (7)

Country Link
US (3) US6770895B2 (ja)
EP (1) EP1422568A3 (ja)
JP (1) JP4516738B2 (ja)
KR (1) KR100822071B1 (ja)
CN (1) CN100476584C (ja)
SG (1) SG106161A1 (ja)
TW (1) TWI331702B (ja)

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US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
US7094036B2 (en) * 2003-09-24 2006-08-22 The Boc Group Plc Vacuum pumping system
US8094288B2 (en) * 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9077022B2 (en) * 2004-10-29 2015-07-07 Medtronic, Inc. Lithium-ion battery
US7361911B2 (en) 2004-12-09 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006054726B4 (de) * 2006-11-21 2014-09-11 Asml Netherlands B.V. Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung
JP2009036182A (ja) * 2007-08-03 2009-02-19 Fuji Koki Corp 可変容量型圧縮機用制御弁
TWI402628B (zh) * 2007-08-31 2013-07-21 Cymer Inc 控管極遠紫外線（ｅｕｖ）光微影裝置腔室間之氣體流動的系統
US8115900B2 (en) 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5339742B2 (ja) * 2008-03-04 2013-11-13 ウシオ電機株式会社 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置
US8288742B2 (en) 2008-05-22 2012-10-16 Vladimir Balakin Charged particle cancer therapy patient positioning method and apparatus
US8368038B2 (en) 2008-05-22 2013-02-05 Vladimir Balakin Method and apparatus for intensity control of a charged particle beam extracted from a synchrotron
US8569717B2 (en) 2008-05-22 2013-10-29 Vladimir Balakin Intensity modulated three-dimensional radiation scanning method and apparatus
US8188688B2 (en) 2008-05-22 2012-05-29 Vladimir Balakin Magnetic field control method and apparatus used in conjunction with a charged particle cancer therapy system
EP2283711B1 (en) 2008-05-22 2018-07-11 Vladimir Yegorovich Balakin Charged particle beam acceleration apparatus as part of a charged particle cancer therapy system
US8129699B2 (en) 2008-05-22 2012-03-06 Vladimir Balakin Multi-field charged particle cancer therapy method and apparatus coordinated with patient respiration
US8373145B2 (en) * 2008-05-22 2013-02-12 Vladimir Balakin Charged particle cancer therapy system magnet control method and apparatus
US8637833B2 (en) 2008-05-22 2014-01-28 Vladimir Balakin Synchrotron power supply apparatus and method of use thereof
EP2283713B1 (en) 2008-05-22 2018-03-28 Vladimir Yegorovich Balakin Multi-axis charged particle cancer therapy apparatus
US8229072B2 (en) * 2008-07-14 2012-07-24 Vladimir Balakin Elongated lifetime X-ray method and apparatus used in conjunction with a charged particle cancer therapy system
CN104597115B (zh) * 2015-02-12 2019-03-19 中国科学院光电研究院 极紫外辐照材料测试系统的真空获得装置及相应测试方法
WO2018039363A1 (en) 2016-08-23 2018-03-01 Randall May International, Inc. Instrument carrier with auto-release articulating back brace
NL2021553A (en) * 2017-09-12 2019-03-19 Asml Holding Nv Beam pointing monitor and compensation systems background

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EP1460479A2 (en) * 2003-03-20 2004-09-22 ASML Holding N.V. Method and apparatus for recycling gases in a lithography tool

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US20010038442A1 (en) * 2000-05-03 2001-11-08 Silicon Valley Group, Inc. Method and apparatus for a non-contact scavenging seal
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EP1460479A2 (en) * 2003-03-20 2004-09-22 ASML Holding N.V. Method and apparatus for recycling gases in a lithography tool

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Also Published As

Publication number Publication date
KR20040045327A (ko) 2004-06-01
US7087911B2 (en) 2006-08-08
JP4516738B2 (ja) 2010-08-04
CN1503058A (zh) 2004-06-09
CN100476584C (zh) 2009-04-08
US6770895B2 (en) 2004-08-03
US20040099816A1 (en) 2004-05-27
US20040155205A1 (en) 2004-08-12
US20050169767A1 (en) 2005-08-04
US6894293B2 (en) 2005-05-17
TW200411341A (en) 2004-07-01
EP1422568A2 (en) 2004-05-26
TWI331702B (en) 2010-10-11
SG106161A1 (en) 2004-09-30
JP2004172626A (ja) 2004-06-17
KR100822071B1 (ko) 2008-04-15

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