SG102707A1 - Generation and use of integrated circuit profile-based simulation information - Google Patents

Generation and use of integrated circuit profile-based simulation information

Info

Publication number
SG102707A1
SG102707A1 SG200300820A SG200300820A SG102707A1 SG 102707 A1 SG102707 A1 SG 102707A1 SG 200300820 A SG200300820 A SG 200300820A SG 200300820 A SG200300820 A SG 200300820A SG 102707 A1 SG102707 A1 SG 102707A1
Authority
SG
Singapore
Prior art keywords
generation
integrated circuit
simulation information
based simulation
circuit profile
Prior art date
Application number
SG200300820A
Other languages
English (en)
Inventor
Nickhil Jakatdar
Xinhui Niu
Junwei Bao
Original Assignee
Timbre Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Timbre Tech Inc filed Critical Timbre Tech Inc
Publication of SG102707A1 publication Critical patent/SG102707A1/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2119/00—Details relating to the type or aim of the analysis or the optimisation
    • G06F2119/08—Thermal analysis or thermal optimisation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Evolutionary Computation (AREA)
  • Computer Hardware Design (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG200300820A 2002-02-28 2003-02-27 Generation and use of integrated circuit profile-based simulation information SG102707A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/087,069 US7136796B2 (en) 2002-02-28 2002-02-28 Generation and use of integrated circuit profile-based simulation information

Publications (1)

Publication Number Publication Date
SG102707A1 true SG102707A1 (en) 2004-03-26

Family

ID=27733421

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200300820A SG102707A1 (en) 2002-02-28 2003-02-27 Generation and use of integrated circuit profile-based simulation information

Country Status (6)

Country Link
US (2) US7136796B2 (ko)
EP (1) EP1341225A2 (ko)
JP (3) JP2003324041A (ko)
KR (1) KR100525567B1 (ko)
SG (1) SG102707A1 (ko)
TW (1) TWI273457B (ko)

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JP6909374B2 (ja) 2016-05-13 2021-07-28 東京エレクトロン株式会社 光増感化学又は感光性化学増幅レジストを用いた限界寸法制御
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CN107368655A (zh) * 2017-07-21 2017-11-21 中冶集团武汉勘察研究院有限公司 抽水蓄能电站动态监测监控与仿真培训系统及其实现方法
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Also Published As

Publication number Publication date
US20030163295A1 (en) 2003-08-28
JP2003324041A (ja) 2003-11-14
EP1341225A2 (en) 2003-09-03
US7136796B2 (en) 2006-11-14
KR20030071575A (ko) 2003-09-03
TWI273457B (en) 2007-02-11
US7580823B2 (en) 2009-08-25
JP2011082562A (ja) 2011-04-21
JP4838217B2 (ja) 2011-12-14
JP2008028418A (ja) 2008-02-07
US20070118349A1 (en) 2007-05-24
KR100525567B1 (ko) 2005-11-03
TW200304079A (en) 2003-09-16

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