SG10202101299QA - Polishing apparatus and polishing method - Google Patents
Polishing apparatus and polishing methodInfo
- Publication number
- SG10202101299QA SG10202101299QA SG10202101299QA SG10202101299QA SG10202101299QA SG 10202101299Q A SG10202101299Q A SG 10202101299QA SG 10202101299Q A SG10202101299Q A SG 10202101299QA SG 10202101299Q A SG10202101299Q A SG 10202101299QA SG 10202101299Q A SG10202101299Q A SG 10202101299QA
- Authority
- SG
- Singapore
- Prior art keywords
- polishing
- polishing apparatus
- polishing method
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Disintegrating Or Milling (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017142578A JP6948868B2 (ja) | 2017-07-24 | 2017-07-24 | 研磨装置および研磨方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202101299QA true SG10202101299QA (en) | 2021-03-30 |
Family
ID=65014740
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201806039QA SG10201806039QA (en) | 2017-07-24 | 2018-07-13 | Polishing apparatus and polishing method |
SG10202101299QA SG10202101299QA (en) | 2017-07-24 | 2018-07-13 | Polishing apparatus and polishing method |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201806039QA SG10201806039QA (en) | 2017-07-24 | 2018-07-13 | Polishing apparatus and polishing method |
Country Status (6)
Country | Link |
---|---|
US (1) | US11911867B2 (zh) |
JP (2) | JP6948868B2 (zh) |
KR (1) | KR102549750B1 (zh) |
CN (2) | CN109290940B (zh) |
SG (2) | SG10201806039QA (zh) |
TW (2) | TW202313252A (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7403998B2 (ja) * | 2019-08-29 | 2023-12-25 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
CN110695840B (zh) * | 2019-11-07 | 2021-02-02 | 许昌学院 | 一种基于光电检测的半导体研磨装置 |
JP2022061077A (ja) * | 2020-10-06 | 2022-04-18 | 株式会社荏原製作所 | 光学式膜厚測定装置および研磨装置 |
US20230011748A1 (en) * | 2021-07-12 | 2023-01-12 | Applied Materials, Inc. | System and method to map thickness variations of substrates inmanufacturing systems |
Family Cites Families (35)
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GB1507747A (en) * | 1975-08-21 | 1978-04-19 | Standard Telephones Cables Ltd | Immiscible liquids measurement |
JPS61126427A (ja) * | 1984-11-26 | 1986-06-13 | Toshiba Corp | 光学式検出装置 |
JPH11204473A (ja) * | 1998-01-19 | 1999-07-30 | Hitachi Ltd | 研磨加工方法および研磨加工装置 |
JP3717340B2 (ja) | 1999-07-27 | 2005-11-16 | シャープ株式会社 | 電子部品製造装置 |
JP2000254860A (ja) * | 1999-03-08 | 2000-09-19 | Nikon Corp | 研磨装置 |
TW200421444A (en) * | 2002-12-10 | 2004-10-16 | Nippon Kogaku Kk | Optical device and projecting exposure apparatus using such optical device |
US20040242121A1 (en) * | 2003-05-16 | 2004-12-02 | Kazuto Hirokawa | Substrate polishing apparatus |
JP2005243985A (ja) * | 2004-02-27 | 2005-09-08 | Canon Inc | 高屈折率液体内でのパターン結像方法 |
JP2005288572A (ja) * | 2004-03-31 | 2005-10-20 | Ebara Corp | 水切り機構を有するオーバーハング方式CMPin−situモニター装置 |
US7226339B2 (en) | 2005-08-22 | 2007-06-05 | Applied Materials, Inc. | Spectrum based endpointing for chemical mechanical polishing |
JP2007178188A (ja) * | 2005-12-27 | 2007-07-12 | Moritex Corp | 液体検出用光導波路式センサ及び光導波路式液体検出装置 |
JP2007222965A (ja) * | 2006-02-21 | 2007-09-06 | Ebara Corp | 研磨テーブルの定盤製造方法、研磨テーブル、及び研磨装置 |
TWI422798B (zh) * | 2006-10-06 | 2014-01-11 | Ebara Corp | 加工終點檢測方法、研磨方法及研磨裝置 |
JP2009050944A (ja) | 2007-08-24 | 2009-03-12 | Disco Abrasive Syst Ltd | 基板の厚さ測定方法および基板の加工装置 |
JP5339791B2 (ja) * | 2008-06-30 | 2013-11-13 | 株式会社東京精密 | 研磨終点検出方法及び研磨装置 |
KR20110120893A (ko) * | 2009-01-16 | 2011-11-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 윈도우 지지부를 가지는 폴리싱 패드 및 시스템 |
KR101042316B1 (ko) * | 2009-08-12 | 2011-06-17 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
JP5050024B2 (ja) | 2009-09-28 | 2012-10-17 | 株式会社荏原製作所 | 基板研磨装置および基板研磨方法 |
JP5728239B2 (ja) | 2010-03-02 | 2015-06-03 | 株式会社荏原製作所 | 研磨監視方法、研磨方法、研磨監視装置、および研磨装置 |
JP5731806B2 (ja) * | 2010-12-02 | 2015-06-10 | 株式会社ディスコ | 研削装置 |
JP6005467B2 (ja) | 2011-10-26 | 2016-10-12 | 株式会社荏原製作所 | 研磨方法および研磨装置 |
JP2013222856A (ja) | 2012-04-17 | 2013-10-28 | Ebara Corp | 研磨装置および研磨方法 |
CN103624673B (zh) | 2012-08-21 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | 化学机械抛光装置及化学机械抛光的方法 |
US20140141696A1 (en) * | 2012-11-21 | 2014-05-22 | Applied Materials, Inc. | Polishing System with In-Sequence Sensor |
JP6027454B2 (ja) * | 2013-02-05 | 2016-11-16 | 株式会社荏原製作所 | 研磨装置 |
JP6215602B2 (ja) * | 2013-07-11 | 2017-10-18 | 株式会社荏原製作所 | 研磨装置および研磨状態監視方法 |
TWI675721B (zh) | 2013-07-11 | 2019-11-01 | 日商荏原製作所股份有限公司 | 研磨裝置及研磨狀態監視方法 |
JP6145342B2 (ja) * | 2013-07-12 | 2017-06-07 | 株式会社荏原製作所 | 膜厚測定装置、膜厚測定方法、および膜厚測定装置を備えた研磨装置 |
JP6266493B2 (ja) * | 2014-03-20 | 2018-01-24 | 株式会社荏原製作所 | 研磨装置及び研磨方法 |
WO2015163164A1 (ja) * | 2014-04-22 | 2015-10-29 | 株式会社 荏原製作所 | 研磨方法および研磨装置 |
US10898987B2 (en) * | 2015-06-01 | 2021-01-26 | Ebara Corporation | Table for holding workpiece and processing apparatus with the table |
JP6473050B2 (ja) | 2015-06-05 | 2019-02-20 | 株式会社荏原製作所 | 研磨装置 |
CN204988999U (zh) | 2015-08-04 | 2016-01-20 | 天津融冠颢业科技发展有限公司 | 一种宽光谱光纤水质监测仪 |
JP6659332B2 (ja) * | 2015-12-07 | 2020-03-04 | 株式会社荏原製作所 | 基板処理装置、基板処理装置の真空吸着テーブルから基板を脱着する方法、及び、基板処理装置の真空吸着テーブルに基板を載置する方法 |
CN205520892U (zh) | 2016-01-05 | 2016-08-31 | 天津华海清科机电科技有限公司 | 抛光盘组件以及具有其的抛光机 |
-
2017
- 2017-07-24 JP JP2017142578A patent/JP6948868B2/ja active Active
-
2018
- 2018-07-13 SG SG10201806039QA patent/SG10201806039QA/en unknown
- 2018-07-13 SG SG10202101299QA patent/SG10202101299QA/en unknown
- 2018-07-16 TW TW111144496A patent/TW202313252A/zh unknown
- 2018-07-16 TW TW107124475A patent/TWI788383B/zh active
- 2018-07-18 US US16/039,065 patent/US11911867B2/en active Active
- 2018-07-19 KR KR1020180083850A patent/KR102549750B1/ko active IP Right Grant
- 2018-07-19 CN CN201810796740.9A patent/CN109290940B/zh active Active
- 2018-07-19 CN CN202210133260.0A patent/CN114434314A/zh active Pending
-
2021
- 2021-09-21 JP JP2021153009A patent/JP2022002870A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN109290940A (zh) | 2019-02-01 |
CN109290940B (zh) | 2022-03-15 |
SG10201806039QA (en) | 2019-02-27 |
TWI788383B (zh) | 2023-01-01 |
US20190022820A1 (en) | 2019-01-24 |
US11911867B2 (en) | 2024-02-27 |
JP6948868B2 (ja) | 2021-10-13 |
TW201909268A (zh) | 2019-03-01 |
KR20190011206A (ko) | 2019-02-01 |
TW202313252A (zh) | 2023-04-01 |
JP2019024036A (ja) | 2019-02-14 |
JP2022002870A (ja) | 2022-01-11 |
KR102549750B1 (ko) | 2023-06-30 |
CN114434314A (zh) | 2022-05-06 |
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