SG10201906330YA - Polishing apparatus and polishing method - Google Patents
Polishing apparatus and polishing methodInfo
- Publication number
- SG10201906330YA SG10201906330YA SG10201906330YA SG10201906330YA SG10201906330YA SG 10201906330Y A SG10201906330Y A SG 10201906330YA SG 10201906330Y A SG10201906330Y A SG 10201906330YA SG 10201906330Y A SG10201906330Y A SG 10201906330YA SG 10201906330Y A SG10201906330Y A SG 10201906330YA
- Authority
- SG
- Singapore
- Prior art keywords
- polishing
- polishing apparatus
- polishing method
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
- B24B49/105—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/10—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
- G01B7/105—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/7684—Smoothing; Planarisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Disintegrating Or Milling (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018133606A JP7084811B2 (en) | 2018-07-13 | 2018-07-13 | Polishing equipment and polishing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201906330YA true SG10201906330YA (en) | 2020-02-27 |
Family
ID=69139013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201906330YA SG10201906330YA (en) | 2018-07-13 | 2019-07-08 | Polishing apparatus and polishing method |
Country Status (6)
Country | Link |
---|---|
US (1) | US20200016720A1 (en) |
JP (1) | JP7084811B2 (en) |
KR (1) | KR20200007670A (en) |
CN (1) | CN110712118B (en) |
SG (1) | SG10201906330YA (en) |
TW (1) | TWI788583B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7390945B2 (en) * | 2020-03-19 | 2023-12-04 | 株式会社荏原製作所 | Polishing equipment, information processing system and program |
TW202310109A (en) * | 2021-08-10 | 2023-03-01 | 日商東京威力科創股份有限公司 | Substrate thickness measurement device, substrate processing system, and substrate thickness measurement method |
JP2023148801A (en) * | 2022-03-30 | 2023-10-13 | 株式会社東京精密 | Polishing end-point detector and cmp device |
KR102581184B1 (en) * | 2023-01-26 | 2023-09-21 | 주식회사 민테크 | Impedance estimation method and apparatus |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4451111B2 (en) * | 2003-10-20 | 2010-04-14 | 株式会社荏原製作所 | Eddy current sensor |
EP1758711B1 (en) * | 2004-06-21 | 2013-08-07 | Ebara Corporation | Polishing apparatus and polishing method |
US20070205112A1 (en) * | 2004-08-27 | 2007-09-06 | Masako Kodera | Polishing apparatus and polishing method |
JP5094320B2 (en) * | 2007-10-11 | 2012-12-12 | 株式会社荏原製作所 | Polishing monitoring method, polishing apparatus, and monitoring apparatus |
JP5080933B2 (en) * | 2007-10-18 | 2012-11-21 | 株式会社荏原製作所 | Polishing monitoring method and polishing apparatus |
US20130065493A1 (en) * | 2011-08-09 | 2013-03-14 | Taro Takahashi | Polishing monitoring method, polishing end point detection method, and polishing apparatus |
JP5894833B2 (en) * | 2012-03-30 | 2016-03-30 | 株式会社荏原製作所 | Eddy current sensor and polishing method and apparatus |
JP6030041B2 (en) * | 2013-11-01 | 2016-11-24 | 株式会社荏原製作所 | Polishing apparatus and polishing method |
US9636797B2 (en) * | 2014-02-12 | 2017-05-02 | Applied Materials, Inc. | Adjusting eddy current measurements |
JP6795337B2 (en) * | 2016-06-29 | 2020-12-02 | 株式会社荏原製作所 | Film thickness signal processing device, polishing device, film thickness signal processing method, and polishing method |
JP6842851B2 (en) * | 2016-07-13 | 2021-03-17 | 株式会社荏原製作所 | Film thickness measuring device, polishing device, film thickness measuring method, and polishing method |
JP2018083267A (en) * | 2016-11-25 | 2018-05-31 | 株式会社荏原製作所 | Polishing device and polishing method |
KR102538861B1 (en) * | 2017-12-26 | 2023-06-01 | 가부시키가이샤 에바라 세이사꾸쇼 | Magnetic element and eddy current type sensor using the same |
JP7153490B2 (en) * | 2018-07-13 | 2022-10-14 | 株式会社荏原製作所 | Polishing equipment and calibration method |
-
2018
- 2018-07-13 JP JP2018133606A patent/JP7084811B2/en active Active
-
2019
- 2019-07-03 TW TW108123414A patent/TWI788583B/en active
- 2019-07-05 KR KR1020190081387A patent/KR20200007670A/en active IP Right Grant
- 2019-07-08 SG SG10201906330YA patent/SG10201906330YA/en unknown
- 2019-07-10 US US16/507,381 patent/US20200016720A1/en active Pending
- 2019-07-12 CN CN201910628469.2A patent/CN110712118B/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2020011315A (en) | 2020-01-23 |
TW202006816A (en) | 2020-02-01 |
US20200016720A1 (en) | 2020-01-16 |
JP7084811B2 (en) | 2022-06-15 |
CN110712118A (en) | 2020-01-21 |
CN110712118B (en) | 2023-05-09 |
KR20200007670A (en) | 2020-01-22 |
TWI788583B (en) | 2023-01-01 |
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