SG10202010251PA - Semiconductor memory device and method of operating the same - Google Patents

Semiconductor memory device and method of operating the same

Info

Publication number
SG10202010251PA
SG10202010251PA SG10202010251PA SG10202010251PA SG10202010251PA SG 10202010251P A SG10202010251P A SG 10202010251PA SG 10202010251P A SG10202010251P A SG 10202010251PA SG 10202010251P A SG10202010251P A SG 10202010251PA SG 10202010251P A SG10202010251P A SG 10202010251PA
Authority
SG
Singapore
Prior art keywords
operating
same
memory device
semiconductor memory
semiconductor
Prior art date
Application number
SG10202010251PA
Other languages
English (en)
Inventor
Kyung Park Jong
Hyun Seo Ji
Original Assignee
Sk Hynix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sk Hynix Inc filed Critical Sk Hynix Inc
Publication of SG10202010251PA publication Critical patent/SG10202010251PA/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0483Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3454Arrangements for verifying correct programming or for detecting overprogrammed cells
    • G11C16/3459Circuits or methods to verify correct programming of nonvolatile memory cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5671Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge trapping in an insulator
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/08Address circuits; Decoders; Word-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/24Bit-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/30Power supply circuits
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/20Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels
    • H10B41/23Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels
    • H10B41/27Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B43/00EEPROM devices comprising charge-trapping gate insulators
    • H10B43/20EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels
    • H10B43/23EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels
    • H10B43/27EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/56Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
    • G11C2211/562Multilevel memory programming aspects
    • G11C2211/5621Multilevel programming verification

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Read Only Memory (AREA)
SG10202010251PA 2019-11-05 2020-10-15 Semiconductor memory device and method of operating the same SG10202010251PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020190140458A KR20210054376A (ko) 2019-11-05 2019-11-05 반도체 메모리 장치 및 그 동작 방법

Publications (1)

Publication Number Publication Date
SG10202010251PA true SG10202010251PA (en) 2021-06-29

Family

ID=75686559

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202010251PA SG10202010251PA (en) 2019-11-05 2020-10-15 Semiconductor memory device and method of operating the same

Country Status (5)

Country Link
US (1) US11328766B2 (zh)
KR (1) KR20210054376A (zh)
CN (1) CN112786093B (zh)
SG (1) SG10202010251PA (zh)
TW (1) TW202119421A (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230041949A1 (en) * 2021-08-05 2023-02-09 Macronix International Co., Ltd. Programming memory devices

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7652929B2 (en) * 2007-09-17 2010-01-26 Sandisk Corporation Non-volatile memory and method for biasing adjacent word line for verify during programming
US7995388B1 (en) * 2008-08-05 2011-08-09 Anobit Technologies Ltd. Data storage using modified voltages
US8199579B2 (en) * 2009-09-16 2012-06-12 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device
KR101798013B1 (ko) 2010-12-30 2017-11-16 삼성전자주식회사 비휘발성 메모리 장치의 프로그램 방법
US8526233B2 (en) * 2011-05-23 2013-09-03 Sandisk Technologies Inc. Ramping pass voltage to enhance channel boost in memory device, with optional temperature compensation
KR102106866B1 (ko) * 2013-01-29 2020-05-06 삼성전자주식회사 멀티레벨 불휘발성 메모리 장치 및 프로그램 방법
KR20160061765A (ko) 2014-11-24 2016-06-01 에스케이하이닉스 주식회사 반도체 장치
KR20160120990A (ko) * 2015-04-09 2016-10-19 에스케이하이닉스 주식회사 반도체 메모리 장치 및 그것의 동작 방법
KR102274280B1 (ko) * 2015-06-22 2021-07-07 삼성전자주식회사 불휘발성 메모리 장치의 동작 방법
KR102498248B1 (ko) * 2016-02-04 2023-02-10 에스케이하이닉스 주식회사 반도체 메모리 장치 및 그것의 동작 방법
KR102572610B1 (ko) * 2016-05-17 2023-09-01 에스케이하이닉스 주식회사 반도체 메모리 장치 및 이의 동작 방법
KR20180013127A (ko) * 2016-07-28 2018-02-07 에스케이하이닉스 주식회사 반도체 메모리 장치 및 이의 동작 방법
KR102491134B1 (ko) * 2018-09-21 2023-01-25 에스케이하이닉스 주식회사 메모리 시스템, 그것의 동작 방법 및 비휘발성 메모리 장치
KR102643666B1 (ko) * 2018-11-23 2024-03-06 에스케이하이닉스 주식회사 반도체 장치 및 그 동작 방법

Also Published As

Publication number Publication date
US11328766B2 (en) 2022-05-10
US20210134359A1 (en) 2021-05-06
KR20210054376A (ko) 2021-05-13
CN112786093A (zh) 2021-05-11
TW202119421A (zh) 2021-05-16
CN112786093B (zh) 2024-05-17

Similar Documents

Publication Publication Date Title
SG10202007030PA (en) Semiconductor Memory Devices And Methods Of Operating The Semiconductor Memory Devices
SG10201907458SA (en) Semiconductor device and method of manufacturing the same
SG10202006561WA (en) Semiconductor device and method of fabricating the same
SG10201909446PA (en) Semiconductor memory device and method for forming the same
SG10201907920TA (en) Semiconductor Package And Method Of Manufacturing The Same
SG10202006188PA (en) Semiconductor memory devices and methods of fabricating the same
EP3488442A4 (en) INTEGRATED MEMORY DEVICE AND METHOD FOR OPERATING IT
SG10202009367XA (en) Memory device including interface circuit and method of operating the same
EP3734666C0 (en) SEMICONDUCTOR COMPONENT AND PRODUCTION METHOD THEREOF
SG10201905833RA (en) Semiconductor device and manufacturing method of the semiconductor device
SG10201907013YA (en) Semiconductor Device And Method Of Manufacturing The Same
SG11202103709VA (en) Semiconductor structure and method of forming the same
SG10202000544WA (en) Memory device and method of operating the same
SG10201905840VA (en) Semiconductor device and manufacturing method thereof
SG10202005368UA (en) Memory device and method of operating the memory device
SG10202003386QA (en) Semiconductor Memory Devices And Methods Of Operating Semiconductor Memory Devices
KR101748949B9 (ko) 반도체 메모리 소자 및 이의 제조 방법
SG10201909519PA (en) Semiconductor memory device and manufacturing method thereof
SG10201908263RA (en) Nonvolatile memory device and operating method of the same
SG10202003748WA (en) Semiconductor devices and methods of operating the same
SG10201914009XA (en) Storage device and operating method of the storage device
SG11202100905XA (en) Semiconductor package and method of forming the same
SG10202007985RA (en) Semiconductor memory device and a method of fabricating the same
SG10202007757VA (en) Memory device and method of operating the same
SG11202012288PA (en) Semiconductor device and method of manufacturing same