SG10201701374PA - Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device - Google Patents

Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Info

Publication number
SG10201701374PA
SG10201701374PA SG10201701374PA SG10201701374PA SG10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA
Authority
SG
Singapore
Prior art keywords
manufacturing
starting
semiconductor device
forming apparatus
mask
Prior art date
Application number
SG10201701374PA
Other languages
English (en)
Inventor
Isao Kawasumi
Toshiyuki Suzuki
Chor Boon Ang
Cheng Yong Boo
Original Assignee
Hoya Corp
Hoya Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Singapore Pte Ltd filed Critical Hoya Corp
Publication of SG10201701374PA publication Critical patent/SG10201701374PA/en

Links

SG10201701374PA 2016-03-24 2017-02-21 Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device SG10201701374PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016059740A JP6316861B2 (ja) 2016-03-24 2016-03-24 成膜装置の立ち上げ方法、マスクブランクの製造方法、転写用マスクの製造方法および半導体デバイスの製造方法

Publications (1)

Publication Number Publication Date
SG10201701374PA true SG10201701374PA (en) 2017-10-30

Family

ID=59971802

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201701374PA SG10201701374PA (en) 2016-03-24 2017-02-21 Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Country Status (2)

Country Link
JP (1) JP6316861B2 (ja)
SG (1) SG10201701374PA (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12105411B2 (en) 2019-09-04 2024-10-01 Hoya Corporation Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7159096B2 (ja) * 2019-03-28 2022-10-24 Hoya株式会社 フォトマスクブランク、フォトマスクの製造方法及び表示装置の製造方法
TW202122909A (zh) * 2019-10-25 2021-06-16 美商應用材料股份有限公司 減少極紫外遮罩毛坯缺陷之方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268367A (ja) * 1996-04-01 1997-10-14 Hitachi Ltd プラズマ処理による薄膜形成装置及び薄膜形成方法
JPH10130814A (ja) * 1996-10-24 1998-05-19 Sony Corp スパッタ膜の形成方法
JP4473410B2 (ja) * 2000-05-24 2010-06-02 キヤノンアネルバ株式会社 スパッタリング装置及び成膜方法
JP4376637B2 (ja) * 2004-01-14 2009-12-02 Ｈｏｙａ株式会社 スパッタリングターゲット及びこれを用いたマスクブランクの製造方法
CN101978093B (zh) * 2008-11-28 2012-02-01 佳能安内华股份有限公司 沉积设备和电子装置制造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12105411B2 (en) 2019-09-04 2024-10-01 Hoya Corporation Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device

Also Published As

Publication number Publication date
JP2017172000A (ja) 2017-09-28
JP6316861B2 (ja) 2018-04-25

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