SG10201700763VA - Processing apparatus - Google Patents

Processing apparatus

Info

Publication number
SG10201700763VA
SG10201700763VA SG10201700763VA SG10201700763VA SG10201700763VA SG 10201700763V A SG10201700763V A SG 10201700763VA SG 10201700763V A SG10201700763V A SG 10201700763VA SG 10201700763V A SG10201700763V A SG 10201700763VA SG 10201700763V A SG10201700763V A SG 10201700763VA
Authority
SG
Singapore
Prior art keywords
processing apparatus
processing
Prior art date
Application number
SG10201700763VA
Other languages
English (en)
Inventor
Oshida Kunio
Hashimoto Hiroyuki
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201700763VA publication Critical patent/SG10201700763VA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046Dry cleaning only
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/04Headstocks; Working-spindles; Features relating thereto
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00Bearings not otherwise provided for
    • F16C32/06Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F16C32/0614Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
    • F16C32/0622Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings via nozzles, restrictors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00Bearings not otherwise provided for
    • F16C32/06Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0681Construction or mounting aspects of hydrostatic bearings, for exclusively rotary movement, related to the direction of load
    • F16C32/0692Construction or mounting aspects of hydrostatic bearings, for exclusively rotary movement, related to the direction of load for axial load only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H01L21/02013Grinding, lapping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2322/00Apparatus used in shaping articles
    • F16C2322/39General buildup of machine tools, e.g. spindles, slides, actuators

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Dicing (AREA)
SG10201700763VA 2016-02-17 2017-01-31 Processing apparatus SG10201700763VA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016028063A JP6664986B2 (ja) 2016-02-17 2016-02-17 加工装置

Publications (1)

Publication Number Publication Date
SG10201700763VA true SG10201700763VA (en) 2017-09-28

Family

ID=59522651

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201700763VA SG10201700763VA (en) 2016-02-17 2017-01-31 Processing apparatus

Country Status (8)

Country Link
US (1) US11261911B2 (de)
JP (1) JP6664986B2 (de)
KR (1) KR102485790B1 (de)
CN (1) CN107088971B (de)
DE (1) DE102017202316A1 (de)
MY (1) MY192753A (de)
SG (1) SG10201700763VA (de)
TW (1) TWI698302B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017110950B4 (de) * 2017-05-19 2022-12-22 Karl Heesemann Maschinenfabrik Gmbh & Co. Kg Schleifmaschine zum Schleifen einer Oberfläche eines Objektes
DE102017121692A1 (de) * 2017-09-19 2019-03-21 Supfina Grieshaber Gmbh & Co. Kg Feinbearbeitungsmaschine
CH714351A1 (de) * 2017-11-17 2019-05-31 Besi Switzerland Ag Bondkopf für die Montage von Bauelementen.
FR3073763B1 (fr) 2017-11-17 2021-05-14 Besi Switzerland Ag Tete de soudage pour monter des composants et microsoudeuse de puce avec une telle tete de soudage
CN110894854B (zh) * 2019-09-25 2021-06-04 北京工业大学 一种集成永磁悬浮的重载气浮主轴
CN111975438A (zh) * 2020-08-21 2020-11-24 南通大学 基于距离传感器及机器视觉的机床急停方法及装置
JP7507636B2 (ja) * 2020-08-27 2024-06-28 株式会社ディスコ スピンドルユニットおよび加工装置
WO2023073937A1 (ja) * 2021-10-29 2023-05-04 ファナック株式会社 工作機械および工作機械の制御方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149611A (ja) * 1984-12-20 1986-07-08 Toshiba Corp すべり軸受監視装置
WO1994007045A1 (en) * 1992-09-11 1994-03-31 Hanes Charles E Stiff bearing system with minimal vibration characteristics
US6623251B2 (en) * 1999-06-21 2003-09-23 Nsk Ltd. Spindle apparatus
JP2001099157A (ja) * 1999-09-28 2001-04-10 Toshiba Mach Co Ltd 空気静圧軸受の接触回避制御装置
KR100454120B1 (ko) * 2001-11-12 2004-10-26 삼성전자주식회사 화학적 기계적 연마 장비의 슬러리 공급 장치 및 방법
JP2007223014A (ja) * 2006-02-27 2007-09-06 Disco Abrasive Syst Ltd スピンドルユニット
JP2008091698A (ja) * 2006-10-03 2008-04-17 Matsushita Electric Ind Co Ltd 基板処理装置および基板処理方法
JP2009196029A (ja) * 2008-02-21 2009-09-03 Disco Abrasive Syst Ltd スピンドルユニット
JP2010052057A (ja) 2008-08-26 2010-03-11 Star Micronics Co Ltd 数値制御工作機械
JP2010173002A (ja) 2009-01-29 2010-08-12 Disco Abrasive Syst Ltd 切削装置
JP4875180B2 (ja) * 2010-03-25 2012-02-15 ファナック株式会社 微細接触力調整機構を有する接触式計測装置
JP5221719B2 (ja) * 2011-08-18 2013-06-26 ファナック株式会社 エアバランスを利用して退避動作を行う位置決め装置
JP5930645B2 (ja) * 2011-09-30 2016-06-08 株式会社ディスコ ウエーハの加工方法
TWM481892U (zh) * 2013-11-21 2014-07-11 yao-zhang Lin 可回收及防水氣的包裝袋
CN204584871U (zh) * 2015-04-23 2015-08-26 苏州东昱精机有限公司 数控机床密着确认装置

Also Published As

Publication number Publication date
KR20170096958A (ko) 2017-08-25
US11261911B2 (en) 2022-03-01
US20170234365A1 (en) 2017-08-17
JP6664986B2 (ja) 2020-03-13
MY192753A (en) 2022-09-06
CN107088971B (zh) 2021-06-04
JP2017144516A (ja) 2017-08-24
CN107088971A (zh) 2017-08-25
TW201739566A (zh) 2017-11-16
KR102485790B1 (ko) 2023-01-05
DE102017202316A1 (de) 2017-08-24
TWI698302B (zh) 2020-07-11

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