SG10201404686YA - Resin mold for imprinting and method for producing same - Google Patents

Resin mold for imprinting and method for producing same

Info

Publication number
SG10201404686YA
SG10201404686YA SG10201404686YA SG10201404686YA SG10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA
Authority
SG
Singapore
Prior art keywords
imprinting
resin mold
producing same
producing
same
Prior art date
Application number
SG10201404686YA
Other languages
English (en)
Inventor
Takahide Mizawa
Satoshi Uehara
Original Assignee
Soken Kagaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Kagaku Kk filed Critical Soken Kagaku Kk
Publication of SG10201404686YA publication Critical patent/SG10201404686YA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/40—Plastics, e.g. foam or rubber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG10201404686YA 2009-08-07 2010-08-06 Resin mold for imprinting and method for producing same SG10201404686YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009184915 2009-08-07
JP2010173812 2010-08-02

Publications (1)

Publication Number Publication Date
SG10201404686YA true SG10201404686YA (en) 2014-10-30

Family

ID=43544443

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201404686YA SG10201404686YA (en) 2009-08-07 2010-08-06 Resin mold for imprinting and method for producing same

Country Status (9)

Country Link
US (1) US9354512B2 (de)
EP (1) EP2463073B1 (de)
JP (2) JPWO2011016549A1 (de)
KR (1) KR20120046743A (de)
CN (1) CN102470565B (de)
CA (1) CA2768830C (de)
DK (1) DK2463073T3 (de)
SG (1) SG10201404686YA (de)
WO (1) WO2011016549A1 (de)

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TWI426624B (zh) * 2011-02-14 2014-02-11 私立中原大學 高效率發光二極體之製作方法
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US11191164B2 (en) 2015-09-29 2021-11-30 Dai Nippon Printing Co., Ltd. Wiring structure and method of manufacturing the same, semiconductor device, multilayer wiring structure and method of manufacturing the same, semiconductor element mounting substrate, method of forming pattern structure, imprint mold and method of manufacturing the same, imprint mold set, and method of manufacturing multilayer wiring board
JP6818406B2 (ja) * 2015-12-03 2021-01-20 三井化学東セロ株式会社 プロセス用離型フィルム、その用途、及びそれを用いた樹脂封止半導体の製造方法
JP6545401B2 (ja) * 2016-04-06 2019-07-17 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． インプリントリソグラフィースタンプの作製方法及び使用方法
CN105700292B (zh) * 2016-04-21 2019-10-11 深圳市华星光电技术有限公司 纳米压印模板的制作方法及纳米压印模板
WO2017195633A1 (ja) * 2016-05-09 2017-11-16 デクセリアルズ株式会社 レプリカ原盤、レプリカ原盤の製造方法、物品および被形成体の製造方法
JP6924006B2 (ja) * 2016-05-09 2021-08-25 デクセリアルズ株式会社 レプリカ原盤の製造方法、および被形成体の製造方法
WO2017200491A1 (en) * 2016-05-19 2017-11-23 Agency For Science, Technology And Research An anti-stiction flexible mold and a method for fabricating the same
JP2020044456A (ja) * 2017-01-18 2020-03-26 綜研化学株式会社 ハードコートフィルム及びその製造方法
CN107170675A (zh) * 2017-05-23 2017-09-15 深圳市华星光电技术有限公司 纳米线栅结构的制作方法
CN107643652A (zh) * 2017-10-31 2018-01-30 武汉华星光电技术有限公司 纳米压印模板及其制作方法和应用
JP7003667B2 (ja) * 2018-01-05 2022-02-10 凸版印刷株式会社 化粧材
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Also Published As

Publication number Publication date
JP2015201652A (ja) 2015-11-12
JPWO2011016549A1 (ja) 2013-01-17
EP2463073A4 (de) 2015-05-13
WO2011016549A1 (ja) 2011-02-10
KR20120046743A (ko) 2012-05-10
US20120133077A1 (en) 2012-05-31
DK2463073T3 (en) 2018-05-22
EP2463073A1 (de) 2012-06-13
CN102470565A (zh) 2012-05-23
CA2768830A1 (en) 2011-02-10
EP2463073B1 (de) 2018-04-04
US9354512B2 (en) 2016-05-31
CA2768830C (en) 2018-07-31
CN102470565B (zh) 2015-04-29

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