SG10201404686YA - Resin mold for imprinting and method for producing same - Google Patents
Resin mold for imprinting and method for producing sameInfo
- Publication number
- SG10201404686YA SG10201404686YA SG10201404686YA SG10201404686YA SG10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA SG 10201404686Y A SG10201404686Y A SG 10201404686YA
- Authority
- SG
- Singapore
- Prior art keywords
- imprinting
- resin mold
- producing same
- producing
- same
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/40—Plastics, e.g. foam or rubber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
- B29C33/60—Releasing, lubricating or separating agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009184915 | 2009-08-07 | ||
JP2010173812 | 2010-08-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201404686YA true SG10201404686YA (en) | 2014-10-30 |
Family
ID=43544443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201404686YA SG10201404686YA (en) | 2009-08-07 | 2010-08-06 | Resin mold for imprinting and method for producing same |
Country Status (9)
Country | Link |
---|---|
US (1) | US9354512B2 (en) |
EP (1) | EP2463073B1 (en) |
JP (2) | JPWO2011016549A1 (en) |
KR (1) | KR20120046743A (en) |
CN (1) | CN102470565B (en) |
CA (1) | CA2768830C (en) |
DK (1) | DK2463073T3 (en) |
SG (1) | SG10201404686YA (en) |
WO (1) | WO2011016549A1 (en) |
Families Citing this family (34)
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KR101010431B1 (en) * | 2003-12-27 | 2011-01-21 | 엘지디스플레이 주식회사 | Method and Apparatus for Fabricating Flat Panel Display |
DK2602089T3 (en) | 2010-08-06 | 2018-01-29 | Soken Kagaku Kk | RESINFORM FOR NANOTRY AND METHOD OF PRODUCING THEREOF |
WO2012018045A1 (en) | 2010-08-06 | 2012-02-09 | 綜研化学株式会社 | Resin mold, production method thereof, and use thereof |
TWI426624B (en) * | 2011-02-14 | 2014-02-11 | 私立中原大學 | Method for manufacturing high efficient led |
WO2012115059A1 (en) * | 2011-02-22 | 2012-08-30 | 旭硝子株式会社 | Fine structure form and liquid-crystal display device comprising fine structure form |
US9030837B2 (en) | 2011-06-10 | 2015-05-12 | Scott Moncrieff | Injection molded control panel with in-molded decorated plastic film that includes an internal connector |
EP2744632B1 (en) * | 2011-08-15 | 2016-01-20 | Johnson Controls Technology Company | Semi permanent tool coating enhancement for extended number of releases |
JP5653864B2 (en) * | 2011-08-18 | 2015-01-14 | 富士フイルム株式会社 | Method for releasing mold for nanoimprint, production method using the same, mold, nanoimprint method and patterned substrate production method |
US9278857B2 (en) | 2012-01-31 | 2016-03-08 | Seagate Technology Inc. | Method of surface tension control to reduce trapped gas bubbles |
JP6015140B2 (en) * | 2012-06-01 | 2016-10-26 | 大日本印刷株式会社 | Nanoimprint mold and manufacturing method thereof |
IN2015DN03091A (en) | 2012-10-05 | 2015-10-02 | Jx Nippon Oil & Energy Corp | |
JP2014124873A (en) * | 2012-12-27 | 2014-07-07 | Seiko Epson Corp | Die for imprint, and method for producing die for imprint |
SG10201707221PA (en) | 2013-03-15 | 2017-10-30 | Canon Nanotechnologies Inc | Nano imprinting with reusable polymer template with metallic or oxide coating |
JP2016181530A (en) * | 2013-08-09 | 2016-10-13 | 綜研化学株式会社 | Stamper for micro contact printing, and method for producing structure using the same |
TWI548316B (en) * | 2014-07-24 | 2016-09-01 | 友達光電股份有限公司 | Electronic device and fabricating method thereof |
US10026609B2 (en) * | 2014-10-23 | 2018-07-17 | Board Of Regents, The University Of Texas System | Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures |
CN106477514B (en) * | 2015-08-28 | 2018-03-30 | 中芯国际集成电路制造(上海)有限公司 | MEMS and forming method thereof |
JP6583747B2 (en) * | 2015-09-29 | 2019-10-02 | 大日本印刷株式会社 | Imprint mold and manufacturing method thereof |
JP6818406B2 (en) * | 2015-12-03 | 2021-01-20 | 三井化学東セロ株式会社 | Release film for process, its application, and manufacturing method of resin-sealed semiconductor using it |
BR112018070494A2 (en) | 2016-04-06 | 2019-01-29 | Koninklijke Philips Nv | stamp for a print lithography process, method of making a stamp, parts kit for making a stamp, method of forming a patterned layer and use of a stamp |
CN105700292B (en) * | 2016-04-21 | 2019-10-11 | 深圳市华星光电技术有限公司 | The production method and nano-imprint stamp of nano-imprint stamp |
JP6924006B2 (en) * | 2016-05-09 | 2021-08-25 | デクセリアルズ株式会社 | A method for manufacturing a replica master and a method for manufacturing an object to be formed. |
WO2017195633A1 (en) * | 2016-05-09 | 2017-11-16 | デクセリアルズ株式会社 | Replica master mold, method for manufacturing replica master mold, article, and method for manufacturing body to be formed |
WO2017200491A1 (en) * | 2016-05-19 | 2017-11-23 | Agency For Science, Technology And Research | An anti-stiction flexible mold and a method for fabricating the same |
JP2020044456A (en) * | 2017-01-18 | 2020-03-26 | 綜研化学株式会社 | Hard coat film and method for producing the same |
CN107170675A (en) * | 2017-05-23 | 2017-09-15 | 深圳市华星光电技术有限公司 | The preparation method of nanometer wire grid construction |
CN107643652A (en) * | 2017-10-31 | 2018-01-30 | 武汉华星光电技术有限公司 | Nano-imprint stamp and preparation method thereof and application |
JP7003667B2 (en) * | 2018-01-05 | 2022-02-10 | 凸版印刷株式会社 | Cosmetic material |
JP7060840B2 (en) * | 2018-03-06 | 2022-04-27 | 大日本印刷株式会社 | Imprint mold and imprint method |
CN109270620B (en) | 2018-11-16 | 2022-07-19 | 京东方科技集团股份有限公司 | Manufacturing method of metal wire grid polarizer and display panel |
US10892167B2 (en) * | 2019-03-05 | 2021-01-12 | Canon Kabushiki Kaisha | Gas permeable superstrate and methods of using the same |
JP2022140088A (en) * | 2021-03-12 | 2022-09-26 | キオクシア株式会社 | Template and method for manufacturing the same |
JP6972409B1 (en) * | 2021-03-30 | 2021-11-24 | リンテック株式会社 | Microneedle manufacturing method and microneedle manufacturing equipment |
CN113736005A (en) * | 2021-09-08 | 2021-12-03 | 安徽新涛光电科技有限公司 | Acrylic casting plate for lens and preparation method thereof |
Family Cites Families (26)
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JP3555332B2 (en) | 1996-05-30 | 2004-08-18 | 住友化学工業株式会社 | Thermoforming method of thermoplastic resin sheet |
JP3751778B2 (en) | 1999-04-26 | 2006-03-01 | 日本板硝子株式会社 | Method for producing sol-gel molded product |
JP2001269942A (en) | 2000-03-27 | 2001-10-02 | Seiko Epson Corp | Method for making microstructure of image display device |
JP2001315248A (en) * | 2000-05-01 | 2001-11-13 | Chuko Kasei Kogyo Kk | Composite sheet |
JP2002270541A (en) | 2001-03-08 | 2002-09-20 | Matsushita Electric Ind Co Ltd | Mold method of manufacturing mold, and method of forming pattern |
DE102004046385A1 (en) * | 2004-09-24 | 2006-04-06 | Construction Research & Technology Gmbh | Liquid fluorine-containing compositions for surface treatment of mineral and non-mineral substrates |
TWI280159B (en) | 2005-03-29 | 2007-05-01 | Li Bing Huan | Method for fabricating nano-adhesive |
WO2008060266A2 (en) * | 2005-10-03 | 2008-05-22 | Massachusetts Institute Of Technology | Nanotemplate arbitrary-imprint lithography |
JP4933801B2 (en) * | 2006-03-06 | 2012-05-16 | 三菱レイヨン株式会社 | Molded article having surface fine uneven structure and manufacturing method thereof |
JP2007245684A (en) | 2006-03-20 | 2007-09-27 | Sekisui Chem Co Ltd | Manufacturing process of replica mold |
JP2007307752A (en) * | 2006-05-17 | 2007-11-29 | Asahi Glass Co Ltd | Mold and its manufacturing method |
KR100831046B1 (en) * | 2006-09-13 | 2008-05-21 | 삼성전자주식회사 | Mold for nano-imprinting and method of manufacturing the mold |
JP4940884B2 (en) * | 2006-10-17 | 2012-05-30 | 大日本印刷株式会社 | Method for producing pattern forming body |
JP4978188B2 (en) * | 2006-12-28 | 2012-07-18 | 旭硝子株式会社 | Manufacturing method of fine structure |
JP2008221491A (en) | 2007-03-09 | 2008-09-25 | Dainippon Printing Co Ltd | Nano imprinting mold and its manufacturing method |
JP5034578B2 (en) * | 2007-03-15 | 2012-09-26 | パナソニック株式会社 | Thin film processing equipment |
JP2009001002A (en) * | 2007-05-24 | 2009-01-08 | Univ Waseda | Mold, its manufacturing method, and manufacturing method for base material having transfer micro-pattern |
JP2008290330A (en) | 2007-05-24 | 2008-12-04 | Oji Paper Co Ltd | Device and method for producing nanoimprint sheet |
JP5209901B2 (en) * | 2007-05-29 | 2013-06-12 | 旭化成イーマテリアルズ株式会社 | Transfer apparatus and transfer method |
US20100304087A1 (en) * | 2007-06-04 | 2010-12-02 | Maruzen Petrochemical Co., Ltd | Mold, Fine Pattern Product, and Method of Manufacturing Those |
JP5394619B2 (en) * | 2007-07-04 | 2014-01-22 | 丸善石油化学株式会社 | Thermal imprint method |
JP5473266B2 (en) * | 2007-08-03 | 2014-04-16 | キヤノン株式会社 | Imprint method, substrate processing method, and semiconductor device manufacturing method by substrate processing method |
JP5002422B2 (en) * | 2007-11-14 | 2012-08-15 | 株式会社日立ハイテクノロジーズ | Resin stamper for nanoprint |
WO2009084408A1 (en) | 2007-12-28 | 2009-07-09 | Ulvac, Inc. | Film formation device and film formation method |
JP5309579B2 (en) * | 2008-02-01 | 2013-10-09 | コニカミノルタ株式会社 | Resin molding die and method for manufacturing the same |
KR20110031275A (en) * | 2008-06-05 | 2011-03-25 | 아사히 가라스 가부시키가이샤 | Mold for nanoimprinting, process for producing the same, and processes for producing molded resin having fine rugged structure on surface and for producing wire-grid polarizer |
-
2010
- 2010-08-06 KR KR1020127003673A patent/KR20120046743A/en active Search and Examination
- 2010-08-06 DK DK10806548.3T patent/DK2463073T3/en active
- 2010-08-06 US US13/389,138 patent/US9354512B2/en not_active Expired - Fee Related
- 2010-08-06 CN CN201080032803.5A patent/CN102470565B/en active Active
- 2010-08-06 SG SG10201404686YA patent/SG10201404686YA/en unknown
- 2010-08-06 WO PCT/JP2010/063375 patent/WO2011016549A1/en active Application Filing
- 2010-08-06 EP EP10806548.3A patent/EP2463073B1/en not_active Not-in-force
- 2010-08-06 JP JP2011525948A patent/JPWO2011016549A1/en active Pending
- 2010-08-06 CA CA2768830A patent/CA2768830C/en not_active Expired - Fee Related
-
2015
- 2015-05-22 JP JP2015104403A patent/JP2015201652A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CA2768830A1 (en) | 2011-02-10 |
EP2463073A4 (en) | 2015-05-13 |
EP2463073B1 (en) | 2018-04-04 |
DK2463073T3 (en) | 2018-05-22 |
US9354512B2 (en) | 2016-05-31 |
EP2463073A1 (en) | 2012-06-13 |
CN102470565B (en) | 2015-04-29 |
KR20120046743A (en) | 2012-05-10 |
CN102470565A (en) | 2012-05-23 |
WO2011016549A1 (en) | 2011-02-10 |
JPWO2011016549A1 (en) | 2013-01-17 |
JP2015201652A (en) | 2015-11-12 |
CA2768830C (en) | 2018-07-31 |
US20120133077A1 (en) | 2012-05-31 |
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