SG10201403995WA - Film-thickness measuring apparatus, film-thickness measuring method, and polishing apparatus having the film-thickness measuring apparatus - Google Patents
Film-thickness measuring apparatus, film-thickness measuring method, and polishing apparatus having the film-thickness measuring apparatusInfo
- Publication number
- SG10201403995WA SG10201403995WA SG10201403995WA SG10201403995WA SG10201403995WA SG 10201403995W A SG10201403995W A SG 10201403995WA SG 10201403995W A SG10201403995W A SG 10201403995WA SG 10201403995W A SG10201403995W A SG 10201403995WA SG 10201403995W A SG10201403995W A SG 10201403995WA
- Authority
- SG
- Singapore
- Prior art keywords
- film
- thickness measuring
- measuring apparatus
- polishing
- measuring method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
- G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013147089A JP6145342B2 (ja) | 2013-07-12 | 2013-07-12 | 膜厚測定装置、膜厚測定方法、および膜厚測定装置を備えた研磨装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201403995WA true SG10201403995WA (en) | 2015-02-27 |
Family
ID=52251239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201403995WA SG10201403995WA (en) | 2013-07-12 | 2014-07-10 | Film-thickness measuring apparatus, film-thickness measuring method, and polishing apparatus having the film-thickness measuring apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US20150017880A1 (ja) |
JP (1) | JP6145342B2 (ja) |
KR (1) | KR102049269B1 (ja) |
CN (1) | CN104275640A (ja) |
SG (1) | SG10201403995WA (ja) |
TW (1) | TWI632988B (ja) |
Families Citing this family (33)
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US9157730B2 (en) | 2012-10-26 | 2015-10-13 | Applied Materials, Inc. | PECVD process |
KR101558548B1 (ko) * | 2014-04-22 | 2015-10-13 | 한국지질자원연구원 | 자동 박편 연마 장치 |
DE102015202470B4 (de) * | 2015-02-12 | 2018-11-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur hochgenauen optischen Messung an Objekten mit anhaftenden fluidischen Schichten |
JP6606879B2 (ja) * | 2015-06-15 | 2019-11-20 | 富士電機株式会社 | 窒化物半導体装置の製造方法 |
US11557048B2 (en) | 2015-11-16 | 2023-01-17 | Applied Materials, Inc. | Thickness measurement of substrate using color metrology |
US10565701B2 (en) * | 2015-11-16 | 2020-02-18 | Applied Materials, Inc. | Color imaging for CMP monitoring |
JP6795337B2 (ja) * | 2016-06-29 | 2020-12-02 | 株式会社荏原製作所 | 膜厚信号処理装置、研磨装置、膜厚信号処理方法、及び、研磨方法 |
JP6842851B2 (ja) * | 2016-07-13 | 2021-03-17 | 株式会社荏原製作所 | 膜厚測定装置、研磨装置、膜厚測定方法、及び、研磨方法 |
JP6844971B2 (ja) * | 2016-09-02 | 2021-03-17 | 株式会社ディスコ | 研削装置 |
KR102608200B1 (ko) * | 2017-01-13 | 2023-11-30 | 어플라이드 머티어리얼스, 인코포레이티드 | 인-시튜 모니터링으로부터의 측정들의 비저항 기반 조정 |
CN106881328B (zh) * | 2017-02-09 | 2020-11-03 | 东旭光电科技股份有限公司 | 玻璃生产线和玻璃生产方法 |
CN107228629B (zh) * | 2017-07-17 | 2023-06-30 | 青岛理工大学 | 高副接触变滑滚比油膜厚度和摩擦力同时测量模拟装置 |
JP6948868B2 (ja) * | 2017-07-24 | 2021-10-13 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
JP7081919B2 (ja) * | 2017-12-26 | 2022-06-07 | 株式会社ディスコ | 加工装置 |
JP6713015B2 (ja) * | 2018-04-13 | 2020-06-24 | 株式会社大気社 | 自動研磨システム |
KR102583017B1 (ko) * | 2018-09-13 | 2023-09-26 | 주식회사 케이씨텍 | 기판 처리 장치 |
US11100628B2 (en) | 2019-02-07 | 2021-08-24 | Applied Materials, Inc. | Thickness measurement of substrate using color metrology |
CN113613837B (zh) * | 2019-04-05 | 2023-09-22 | 胜高股份有限公司 | 研磨头、研磨装置及半导体晶圆的制造方法 |
FR3094907B1 (fr) * | 2019-04-11 | 2022-07-15 | Gebe2 Productique | Procédé d’abrasion |
JP7224254B2 (ja) * | 2019-07-17 | 2023-02-17 | 東京エレクトロン株式会社 | 基板処理装置、情報処理装置、及び基板処理方法 |
CN110695849B (zh) * | 2019-10-23 | 2020-09-15 | 清华大学 | 一种晶圆厚度测量装置和磨削机台 |
CN110774165B (zh) * | 2019-10-24 | 2021-04-23 | 苏师大半导体材料与设备研究院(邳州)有限公司 | 一种半导体材料晶片的抛光方法 |
JP7374710B2 (ja) * | 2019-10-25 | 2023-11-07 | 株式会社荏原製作所 | 研磨方法および研磨装置 |
TWI765192B (zh) * | 2019-11-19 | 2022-05-21 | 大量科技股份有限公司 | 化學機械研磨裝置之研磨墊檢測方法與研磨墊檢測裝置 |
JP2021141255A (ja) | 2020-03-06 | 2021-09-16 | キオクシア株式会社 | 半導体製造装置および半導体装置の製造方法 |
JP7365282B2 (ja) * | 2020-03-26 | 2023-10-19 | 株式会社荏原製作所 | 研磨ヘッドシステムおよび研磨装置 |
CN111775044A (zh) * | 2020-07-02 | 2020-10-16 | 长江存储科技有限责任公司 | 抛光垫修整装置和抛光垫修整方法 |
CN112086352B (zh) * | 2020-08-06 | 2024-02-20 | 北京晶亦精微科技股份有限公司 | 一种利用Locos生长氧化隔离层以及制备IGBT芯片的工艺 |
CN112964184B (zh) * | 2021-04-12 | 2022-07-01 | 西华大学 | 一种基于表面摩阻实验的油膜厚度测量装置及测量方法 |
CN114473844B (zh) * | 2021-12-31 | 2023-09-29 | 华海清科股份有限公司 | 一种膜厚测量装置 |
CN115763430B (zh) * | 2022-10-28 | 2024-01-16 | 惠科股份有限公司 | 显示面板及其膜层厚度量测方法、测试结构 |
CN117140236B (zh) * | 2023-10-25 | 2024-01-26 | 苏州博宏源机械制造有限公司 | 一种晶圆厚度在线测量装置及方法 |
CN117506703B (zh) * | 2023-12-01 | 2024-05-10 | 苏州博宏源机械制造有限公司 | 测量装置及抛光系统 |
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JPS5937047A (ja) * | 1982-08-26 | 1984-02-29 | Toshiba Corp | ダイヤフラム加工装置 |
JP2974441B2 (ja) * | 1991-04-15 | 1999-11-10 | 昭和アルミニウム株式会社 | 研磨、洗浄乾燥及び外観検査を必要とするワークの製造装置 |
US5637029A (en) * | 1993-11-22 | 1997-06-10 | Lehane; William B. | Method and apparatus for shot blasting materials |
US5657123A (en) * | 1994-09-16 | 1997-08-12 | Mitsubishi Materials Corp. | Film thickness measuring apparatus, film thickness measuring method and wafer polishing system measuring a film thickness in conjunction with a liquid tank |
US5999264A (en) * | 1997-06-26 | 1999-12-07 | Mitutoyo Corporation | On-the-fly optical interference measurement device, machining device provided with the measurement device, and machine tool suited to on-the-fly optical measurement |
JP3192396B2 (ja) * | 1997-11-07 | 2001-07-23 | 日本ピラー工業株式会社 | 流体用ロータリジョイント |
JPH11204472A (ja) * | 1998-01-12 | 1999-07-30 | Dainippon Screen Mfg Co Ltd | 基板研磨装置用光学測定装置 |
US6319093B1 (en) * | 2001-02-06 | 2001-11-20 | International Business Machines Corporation | Chemical-mechanical polishing system and method for integrated spin dry-film thickness measurement |
US6579149B2 (en) * | 2001-02-06 | 2003-06-17 | International Business Machines Corporation | Support and alignment device for enabling chemical mechanical polishing rinse and film measurements |
JP3878016B2 (ja) * | 2001-12-28 | 2007-02-07 | 株式会社荏原製作所 | 基板研磨装置 |
US6827633B2 (en) * | 2001-12-28 | 2004-12-07 | Ebara Corporation | Polishing method |
JP3995579B2 (ja) * | 2002-10-18 | 2007-10-24 | 大日本スクリーン製造株式会社 | 膜厚測定装置および反射率測定装置 |
US6967715B2 (en) * | 2002-12-06 | 2005-11-22 | International Business Machines Corporation | Method and apparatus for optical film measurements in a controlled environment |
US20040242121A1 (en) * | 2003-05-16 | 2004-12-02 | Kazuto Hirokawa | Substrate polishing apparatus |
JP4216209B2 (ja) * | 2004-03-04 | 2009-01-28 | 大日本スクリーン製造株式会社 | 膜厚測定方法および装置 |
ITBO20070504A1 (it) * | 2007-07-20 | 2009-01-21 | Marposs Spa | Apparecchiatura e metodo per il controllo dello spessore di un elemento in lavorazione |
JP2009050944A (ja) * | 2007-08-24 | 2009-03-12 | Disco Abrasive Syst Ltd | 基板の厚さ測定方法および基板の加工装置 |
JP2009111238A (ja) * | 2007-10-31 | 2009-05-21 | Marubun Corp | 半導体ウエハ研削装置 |
JP5495493B2 (ja) * | 2008-02-07 | 2014-05-21 | 株式会社東京精密 | 膜厚測定装置、及び膜厚測定方法 |
KR101004435B1 (ko) * | 2008-11-28 | 2010-12-28 | 세메스 주식회사 | 기판 연마 장치 및 이를 이용한 기판 연마 방법 |
-
2013
- 2013-07-12 JP JP2013147089A patent/JP6145342B2/ja active Active
-
2014
- 2014-07-07 KR KR1020140084538A patent/KR102049269B1/ko active IP Right Grant
- 2014-07-09 US US14/327,535 patent/US20150017880A1/en not_active Abandoned
- 2014-07-09 TW TW103123573A patent/TWI632988B/zh active
- 2014-07-10 SG SG10201403995WA patent/SG10201403995WA/en unknown
- 2014-07-11 CN CN201410330819.4A patent/CN104275640A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20150007963A (ko) | 2015-01-21 |
CN104275640A (zh) | 2015-01-14 |
KR102049269B1 (ko) | 2019-11-28 |
US20150017880A1 (en) | 2015-01-15 |
TW201503997A (zh) | 2015-02-01 |
JP6145342B2 (ja) | 2017-06-07 |
JP2015016540A (ja) | 2015-01-29 |
TWI632988B (zh) | 2018-08-21 |
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