SE9904080D0 - Fotoinitiatorberedning - Google Patents

Fotoinitiatorberedning

Info

Publication number
SE9904080D0
SE9904080D0 SE9904080A SE9904080A SE9904080D0 SE 9904080 D0 SE9904080 D0 SE 9904080D0 SE 9904080 A SE9904080 A SE 9904080A SE 9904080 A SE9904080 A SE 9904080A SE 9904080 D0 SE9904080 D0 SE 9904080D0
Authority
SE
Sweden
Prior art keywords
c4alkyl
c20alkyl
biphenylyl
cyclopentyl
naphthyl
Prior art date
Application number
SE9904080A
Other languages
English (en)
Swedish (sv)
Inventor
Andre Litzler
Manfred Koehler
Nils Hoeck
Guido Tolotti
Jean-Pierre Wolf
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of SE9904080D0 publication Critical patent/SE9904080D0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
    • C07F9/32—Esters thereof
    • C07F9/3258—Esters thereof the ester moiety containing a substituent or a structure which is considered as characteristic
    • C07F9/3264—Esters with hydroxyalkyl compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1065—Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Materials For Photolithography (AREA)
SE9904080A 1998-12-03 1999-11-11 Fotoinitiatorberedning SE9904080D0 (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH239998 1998-12-03
CH45399 1999-03-11

Publications (1)

Publication Number Publication Date
SE9904080D0 true SE9904080D0 (sv) 1999-11-11

Family

ID=25684626

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9904080A SE9904080D0 (sv) 1998-12-03 1999-11-11 Fotoinitiatorberedning

Country Status (4)

Country Link
US (2) US6251963B1 (https=)
JP (1) JP4869463B2 (https=)
GB (1) GB9927430D0 (https=)
SE (1) SE9904080D0 (https=)

Families Citing this family (158)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1106627B1 (en) * 1999-12-08 2003-10-29 Ciba SC Holding AG Novel phosphine oxide photoinitiator systems and curable compositions with low color
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
JP4597323B2 (ja) * 2000-07-07 2010-12-15 リンテック株式会社 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート
US20030164580A1 (en) * 2000-09-14 2003-09-04 Karsten Rinker Acylphosphine oxide photoinitiators in methacrylate casting resins
WO2002024344A2 (de) * 2000-09-25 2002-03-28 Chemetall Gmbh Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate
KR100673265B1 (ko) * 2000-10-04 2007-01-22 엘지.필립스 엘시디 주식회사 액정표시장치
US20020132871A1 (en) * 2000-11-13 2002-09-19 Martin Colton Transparent UV curable coating system
US6737216B2 (en) * 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
US6951623B2 (en) * 2001-11-02 2005-10-04 The Boeing Company Radiation curable maskant and line sealer for protecting metal substrates
DE10206096A1 (de) * 2002-02-13 2003-08-14 Basf Ag Mono- und Bisacylphosphinderivate
DE10206097A1 (de) * 2002-02-13 2003-08-14 Basf Ag Alkoxylierte Acyl- und Bisacylphosphinderivate
US7618709B2 (en) * 2002-04-30 2009-11-17 Avery Dennison Corporation Fluorescent articles having multiple film layers
US7264880B2 (en) * 2002-04-30 2007-09-04 Avery Dennison Corporation Fluorescent articles having multiple film layers
JP4485117B2 (ja) * 2002-06-27 2010-06-16 日東電工株式会社 保護剥離用フィルム
US6773261B2 (en) * 2002-06-28 2004-08-10 3M Innovative Properties Company Processes for forming dental materials
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US6822063B2 (en) * 2002-08-27 2004-11-23 Ecolab Inc. Highly durable waterborne radiation cured coating
KR100867294B1 (ko) * 2002-10-08 2008-11-06 쿠라레 메디카루 가부시키가이샤 치과용 코팅용 키트
WO2004035703A1 (en) * 2002-10-18 2004-04-29 Lg Cable Ltd. Melt-flow controlling method for elastomer by uv irradiation
CA2509222A1 (en) * 2002-12-10 2004-06-24 Wyeth Substituted indole oxo-acetyl amino acetic acid derivatives as inhibitors of plasminogen activator inhibitor-1 (pai-1)
US20040122126A1 (en) * 2002-12-20 2004-06-24 Dong Wu Free-radical initiator systems containing enzymes, compositions, and methods
BR0317587A (pt) * 2002-12-20 2005-11-22 Ciba Sc Holding Ag Processo para formação de camadas funcionais
US20040120901A1 (en) * 2002-12-20 2004-06-24 Dong Wu Dental compositions including enzymes and methods
DE10261241A1 (de) * 2002-12-20 2004-07-15 3M Espe Ag Dentalmaterial mit bakteriostatischen und/oder bakteriziden Substanzen
US20040206932A1 (en) * 2002-12-30 2004-10-21 Abuelyaman Ahmed S. Compositions including polymerizable bisphosphonic acids and methods
WO2005021634A2 (en) * 2003-02-20 2005-03-10 Texas Research International, Inc. Ultraviolet light curing compositions for composite repair
JP5008978B2 (ja) * 2003-05-23 2012-08-22 チバ ホールディング インコーポレーテッド 強力接着性表面被覆
DE10335596A1 (de) * 2003-08-04 2005-02-24 Basf Coatings Ag Verfahren zur Charakterisierung von Oberflächenstrukturen und seine Verwendung bei der Modifizierung, Neuentwicklung und Herstellung von Werkstoffen
BRPI0413348A (pt) * 2003-08-04 2006-10-10 Ciba Sc Holding Ag processo para a produção de revestimentos fortemente aderentes
MXPA06001305A (es) * 2003-08-04 2006-05-04 Ciba Sc Holding Ag Proceso para la produccion de recubrimientos fuertemente adherentes.
US7632098B2 (en) * 2003-08-12 2009-12-15 3M Innovative Properties Company Self-adhesive dental compositions and methods
ES2660319T3 (es) * 2003-08-29 2018-03-21 Igm Group B.V. Recubrimientos de fibra óptica
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US8962709B2 (en) * 2003-10-22 2015-02-24 The Regents Of The University Of Colorado, A Body Corporate Resin systems for dental restorative materials and methods using same
US8192673B2 (en) * 2003-10-22 2012-06-05 University Of Kansas Resin systems for dental restorative materials
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CN100564461C (zh) * 2004-03-26 2009-12-02 佳能株式会社 活性能量射线固化型水性油墨组合物、使用该组合物的喷墨记录方法、墨盒、记录单元和喷墨记录装置
JP4533205B2 (ja) * 2004-03-26 2010-09-01 キヤノン株式会社 活性エネルギー線硬化型水性インク、それを用いたインクジェット記録方法、インクカートリッジ、記録ユニット及びインクジェット記録装置
BRPI0509896B1 (pt) * 2004-04-15 2016-07-12 Ciba Sc Holding Ag "processo para curar compostos polimerizáveis etilenicamente insaturados para produção de revestimentos,coberturas de gel, compósitos ou adesivos tendo cortes espessos".
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US20060025522A1 (en) * 2004-07-30 2006-02-02 Johnson Jeffery W High solids primer composition based on thermal initiated free-radical polymerization
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