SE7705766L - Forfarande och anordning for att astadkomma en beleggning i en luminiscent urladdning - Google Patents

Forfarande och anordning for att astadkomma en beleggning i en luminiscent urladdning

Info

Publication number
SE7705766L
SE7705766L SE7705766A SE7705766A SE7705766L SE 7705766 L SE7705766 L SE 7705766L SE 7705766 A SE7705766 A SE 7705766A SE 7705766 A SE7705766 A SE 7705766A SE 7705766 L SE7705766 L SE 7705766L
Authority
SE
Sweden
Prior art keywords
cathode
substrate
target
coating
biasing voltage
Prior art date
Application number
SE7705766A
Other languages
Unknown language ( )
English (en)
Swedish (sv)
Inventor
B Zega
Original Assignee
Battelle Memorial Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute filed Critical Battelle Memorial Institute
Publication of SE7705766L publication Critical patent/SE7705766L/

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SE7705766A 1976-05-19 1977-05-17 Forfarande och anordning for att astadkomma en beleggning i en luminiscent urladdning SE7705766L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH623776A CH611938A5 (fr) 1976-05-19 1976-05-19

Publications (1)

Publication Number Publication Date
SE7705766L true SE7705766L (sv) 1977-11-20

Family

ID=4306421

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7705766A SE7705766L (sv) 1976-05-19 1977-05-17 Forfarande och anordning for att astadkomma en beleggning i en luminiscent urladdning

Country Status (11)

Country Link
US (1) US4116791A (fr)
JP (1) JPS608303B2 (fr)
AT (1) AT354214B (fr)
BE (1) BE854816A (fr)
CH (1) CH611938A5 (fr)
DE (1) DE2722708A1 (fr)
FR (1) FR2352393A1 (fr)
GB (1) GB1548061A (fr)
IT (1) IT1085894B (fr)
NL (1) NL7705483A (fr)
SE (1) SE7705766L (fr)

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CN100483643C (zh) * 2006-07-13 2009-04-29 中芯国际集成电路制造(上海)有限公司 一种制作低介电常数层的新方法及其应用
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KR101975741B1 (ko) * 2009-11-13 2019-05-09 가부시키가이샤 한도오따이 에네루기 켄큐쇼 타깃 재료의 포장 방법 및 타깃의 장착 방법
CN103109344B (zh) * 2010-07-09 2016-02-10 欧瑞康先进科技股份公司 磁控管溅射设备
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Also Published As

Publication number Publication date
IT1085894B (it) 1985-05-28
FR2352393A1 (fr) 1977-12-16
GB1548061A (en) 1979-07-04
DE2722708A1 (de) 1977-12-08
CH611938A5 (fr) 1979-06-29
FR2352393B1 (fr) 1983-02-11
ATA352977A (de) 1979-05-15
JPS608303B2 (ja) 1985-03-01
AT354214B (de) 1979-12-27
NL7705483A (nl) 1977-11-22
JPS5310384A (en) 1978-01-30
BE854816A (fr) 1977-11-18
US4116791A (en) 1978-09-26

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