JPS53114679A - Plasm etching unit - Google Patents
Plasm etching unitInfo
- Publication number
- JPS53114679A JPS53114679A JP2971877A JP2971877A JPS53114679A JP S53114679 A JPS53114679 A JP S53114679A JP 2971877 A JP2971877 A JP 2971877A JP 2971877 A JP2971877 A JP 2971877A JP S53114679 A JPS53114679 A JP S53114679A
- Authority
- JP
- Japan
- Prior art keywords
- etching unit
- plasm
- plasm etching
- etch
- films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To enable to etch for films of different types, by connecting the bias circuit able to change the bias voltage to a high frequency source and by controlling the force attracting electrons through the control of negative potential of a metallic plate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2971877A JPS53114679A (en) | 1977-03-17 | 1977-03-17 | Plasm etching unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2971877A JPS53114679A (en) | 1977-03-17 | 1977-03-17 | Plasm etching unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53114679A true JPS53114679A (en) | 1978-10-06 |
JPS6124817B2 JPS6124817B2 (en) | 1986-06-12 |
Family
ID=12283881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2971877A Granted JPS53114679A (en) | 1977-03-17 | 1977-03-17 | Plasm etching unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53114679A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55118637A (en) * | 1979-03-06 | 1980-09-11 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Plasma etching apparatus |
JPS5664437A (en) * | 1979-08-22 | 1981-06-01 | Onera (Off Nat Aerospatiale) | Method and device for chemically etching integrated circuit by dry process |
JPS5750435A (en) * | 1980-09-11 | 1982-03-24 | Toshiba Corp | Plasma etching device |
US4433214A (en) * | 1981-12-24 | 1984-02-21 | Motorola, Inc. | Acoustical transducer with a slotted piston suspension |
JPS60140763U (en) * | 1984-02-24 | 1985-09-18 | 日本電子株式会社 | plasma equipment |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS48103433A (en) * | 1972-04-17 | 1973-12-25 |
-
1977
- 1977-03-17 JP JP2971877A patent/JPS53114679A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS48103433A (en) * | 1972-04-17 | 1973-12-25 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55118637A (en) * | 1979-03-06 | 1980-09-11 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Plasma etching apparatus |
JPS5664437A (en) * | 1979-08-22 | 1981-06-01 | Onera (Off Nat Aerospatiale) | Method and device for chemically etching integrated circuit by dry process |
JPH0313741B2 (en) * | 1979-08-22 | 1991-02-25 | Onera (Off Nat Aerospatiale) | |
JPS5750435A (en) * | 1980-09-11 | 1982-03-24 | Toshiba Corp | Plasma etching device |
JPH0136247B2 (en) * | 1980-09-11 | 1989-07-31 | Toshiba Kk | |
US4433214A (en) * | 1981-12-24 | 1984-02-21 | Motorola, Inc. | Acoustical transducer with a slotted piston suspension |
JPS60140763U (en) * | 1984-02-24 | 1985-09-18 | 日本電子株式会社 | plasma equipment |
JPS629324Y2 (en) * | 1984-02-24 | 1987-03-04 |
Also Published As
Publication number | Publication date |
---|---|
JPS6124817B2 (en) | 1986-06-12 |
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