PL2317511T3 - Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv - Google Patents

Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv

Info

Publication number
PL2317511T3
PL2317511T3 PL09013771T PL09013771T PL2317511T3 PL 2317511 T3 PL2317511 T3 PL 2317511T3 PL 09013771 T PL09013771 T PL 09013771T PL 09013771 T PL09013771 T PL 09013771T PL 2317511 T3 PL2317511 T3 PL 2317511T3
Authority
PL
Poland
Prior art keywords
photopolymer formulation
media
writing monomer
illuminated
holographic
Prior art date
Application number
PL09013771T
Other languages
English (en)
Polish (pl)
Inventor
Marc-Stephen Weiser
Thomas Rölle
Friedrich-Karl Bruder
Thomas Fäcke
Dennis Hönel
Original Assignee
Bayer Materialscience Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer Materialscience Ag filed Critical Bayer Materialscience Ag
Publication of PL2317511T3 publication Critical patent/PL2317511T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78—Nitrogen
    • C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/08—Polyurethanes from polyethers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N11/00—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties
    • G01N11/10—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material
    • G01N11/16—Investigating flow properties of materials, e.g. viscosity, plasticity; Analysing materials by determining flow properties by moving a body within the material by measuring damping effect upon oscillatory body
    • G01N11/162—Oscillations being torsional, e.g. produced by rotating bodies
    • G01N11/165—Sample held between two members substantially perpendicular to axis of rotation, e.g. parallel plate viscometer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Holo Graphy (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Polymerisation Methods In General (AREA)
PL09013771T 2009-11-03 2009-11-03 Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv PL2317511T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20090013771 EP2317511B1 (de) 2009-11-03 2009-11-03 Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv

Publications (1)

Publication Number Publication Date
PL2317511T3 true PL2317511T3 (pl) 2012-08-31

Family

ID=41667267

Family Applications (1)

Application Number Title Priority Date Filing Date
PL09013771T PL2317511T3 (pl) 2009-11-03 2009-11-03 Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv

Country Status (12)

Country Link
US (2) US8921012B2 (OSRAM)
EP (1) EP2317511B1 (OSRAM)
JP (1) JP5886751B2 (OSRAM)
KR (1) KR101727352B1 (OSRAM)
CN (1) CN102792377B (OSRAM)
AT (1) ATE548730T1 (OSRAM)
BR (1) BR112012010468A2 (OSRAM)
ES (1) ES2381808T3 (OSRAM)
PL (1) PL2317511T3 (OSRAM)
RU (1) RU2542975C9 (OSRAM)
TW (1) TWI494691B (OSRAM)
WO (1) WO2011054749A1 (OSRAM)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
BRPI0920781A2 (pt) * 2008-10-01 2015-12-22 Bayer Materialscience Ag formulações de poliuretano à base de pré-polímeros para produção de meios holográficos.
EP2218742A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
KR101782182B1 (ko) * 2009-11-03 2017-09-26 코베스트로 도이칠란드 아게 상이한 기록 공단량체를 갖는 광중합체 제제
TW201133264A (en) * 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
TWI488908B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 製造全像膜的方法
JP2013510203A (ja) * 2009-11-03 2013-03-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト 感光性ポリマー組成物における添加剤としてのフルオロウレタン
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
WO2011054793A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Verfahren zur herstellung von holographischen medien
ES2381808T3 (es) * 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
TWI489209B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 在光聚合物配製物中作為添加劑的胺甲酸乙酯
EP2531889B1 (de) * 2010-02-02 2020-06-03 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit ester-basierten schreibmonomeren zur herstellung holographischer medien
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
EP2613319A1 (de) * 2012-01-05 2013-07-10 Bayer MaterialScience AG Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
IN2015DN01583A (OSRAM) 2012-08-13 2015-07-03 Bayer Materialscience Ag
EP2700510B1 (de) * 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
EP2888116B1 (de) * 2012-08-23 2016-09-21 Covestro Deutschland AG Sicherheits- und/oder wertdokument enthaltend ein visuell schaltbares fenster mit einem hologramm
WO2015161969A1 (de) * 2014-04-25 2015-10-29 Bayer Material Science Ag Aromatische glykolether als schreibmonomere in holographischen photopolymer-formulierungen
EP3230261B1 (de) * 2014-12-12 2018-09-05 Covestro Deutschland AG Naphthylacrylate als schreibmonomere für photopolymere
KR102498092B1 (ko) * 2014-12-19 2023-02-09 코베스트로 도이칠란트 아게 수분-안정성 홀로그래픽 매체
CN108475037B (zh) 2015-12-22 2021-09-14 科思创德国股份有限公司 用基片导引的重建光束工业产生体积反射全息图的设备和方法
US11427656B2 (en) * 2016-08-30 2022-08-30 Sony Corporation Photosensitive composition for hologram recording, hologram recording medium, and hologram
KR102009421B1 (ko) 2017-04-25 2019-08-12 주식회사 엘지화학 포토폴리머 조성물
TW201906730A (zh) * 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜
EP3435156A1 (de) * 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
KR102156872B1 (ko) * 2017-09-27 2020-09-16 주식회사 엘지화학 포토폴리머 조성물
KR102244648B1 (ko) * 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102166846B1 (ko) * 2017-12-11 2020-10-16 주식회사 엘지화학 포토폴리머 조성물
KR102157366B1 (ko) 2017-12-15 2021-03-29 주식회사 엘지화학 염료 화합물 및 포토폴리머 조성물
CN108645336B (zh) * 2018-05-11 2020-06-09 赣南师范大学 一种无参考光数字全息相机及标定方法
KR102228538B1 (ko) * 2018-06-01 2021-03-15 주식회사 엘지화학 염료 화합물 및 포토폴리머 조성물
KR102239212B1 (ko) * 2018-12-14 2021-04-12 주식회사 엘지화학 포토폴리머 조성물
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11137603B2 (en) 2019-06-20 2021-10-05 Facebook Technologies, Llc Surface-relief grating with patterned refractive index modulation
EP4063356A4 (en) * 2019-11-19 2023-06-07 Mitsubishi Chemical Corporation COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIA, OPTICAL MATERIAL AND OPTICAL COMPONENT
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US20210155639A1 (en) * 2019-11-27 2021-05-27 Facebook Technologies, Llc Thiophosphate and phosphine sulfide derivatized monomers and polymers for volume bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings
EP4584335A1 (de) 2022-09-07 2025-07-16 Covestro Deutschland AG Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0389067B1 (en) 1985-11-20 1994-10-19 The Mead Corporation Ionic dye compounds
US5470813A (en) 1993-11-23 1995-11-28 Arco Chemical Technology, L.P. Double metal cyanide complex catalysts
US5712216A (en) 1995-05-15 1998-01-27 Arco Chemical Technology, L.P. Highly active double metal cyanide complex catalysts
US5482908A (en) 1994-09-08 1996-01-09 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5725970A (en) * 1994-11-07 1998-03-10 E. I. Du Pont De Nemours And Company Broad band reflection holograms and a dry process for making same
US5545601A (en) 1995-08-22 1996-08-13 Arco Chemical Technology, L.P. Polyether-containing double metal cyanide catalysts
US5627120A (en) 1996-04-19 1997-05-06 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5714428A (en) 1996-10-16 1998-02-03 Arco Chemical Technology, L.P. Double metal cyanide catalysts containing functionalized polymers
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
US6432498B1 (en) * 1998-04-10 2002-08-13 Dai Nippon Printing Co., Ltd. Volume hologram laminate
US6450642B1 (en) * 1999-01-12 2002-09-17 California Institute Of Technology Lenses capable of post-fabrication power modification
DE19905611A1 (de) 1999-02-11 2000-08-17 Bayer Ag Doppelmetallcyanid-Katalysatoren für die Herstellung von Polyetherpolyolen
KR100599354B1 (ko) 1999-02-11 2006-07-12 바이엘 악티엔게젤샤프트 폴리에테르 폴리올 제조용의 이중 금속 시아나이드 촉매
US6627354B1 (en) * 1999-03-01 2003-09-30 Lucent Technologies Inc. Photorecording medium, process for fabricating medium, and process for holography using medium
UA41239C2 (uk) * 2000-05-24 2003-06-16 Юрій Викторович Жваколюк Спосіб виготовлення печаток та штемпелів
KR100810547B1 (ko) * 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
US6743552B2 (en) * 2001-08-07 2004-06-01 Inphase Technologies, Inc. Process and composition for rapid mass production of holographic recording article
ES2285207T3 (es) * 2002-07-30 2007-11-16 Toagosei Co., Ltd. Composicion para holografia, metodo de curado de la misma y articulo curado.
US20070172742A1 (en) * 2004-02-13 2007-07-26 Kentarou Yachi Volume hologram recording material and volume hologram recording medium
EP1720079A1 (en) * 2005-05-06 2006-11-08 Neopack, Sl Coloured composition comprising a hologram and preparation process
US8941904B2 (en) * 2005-07-04 2015-01-27 Dai Nippon Printing Co., Ltd. Hologram sheet and hologram observation sheet using same, and blinding device
TW200702954A (en) * 2005-07-11 2007-01-16 Toagosei Co Ltd Volume hologram recording material, the method of processing thereof and the recording medium
JP2007279585A (ja) * 2006-04-11 2007-10-25 Fujifilm Corp 感光性組成物、並びに光記録媒体、光記録方法及び光記録装置
JP2008081726A (ja) * 2006-08-30 2008-04-10 Sanyo Electric Co Ltd 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子
RU2331095C1 (ru) * 2006-12-08 2008-08-10 Самсунг Электроникс Ко., Лтд "живые" полимеризационноспособные пленки для записи голограмм
CN101606106B (zh) * 2007-02-05 2012-10-17 新日铁化学株式会社 体积相位全息记录材料及光信息记录介质
JP5495238B2 (ja) 2007-04-11 2014-05-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト ホログラフィ用途用の有利な記録媒体
WO2008125199A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Aromatic urethane acrylates having a high refractive index
US20090012202A1 (en) * 2007-07-03 2009-01-08 Henkel Corporation Acrylated Urethanes, Processes for Making the Same and Curable Compositions Including the Same
EP2223299B1 (en) * 2007-11-27 2015-03-11 Southbourne Investments Ltd. Holographic recording medium
JP2010037541A (ja) * 2008-07-10 2010-02-18 Fujifilm Corp インプリント用硬化性組成物、パターン形成方法およびパターン
ATE493383T1 (de) 2008-08-08 2011-01-15 Bayer Materialscience Ag Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex
IL200997A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200995A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
BRPI0920781A2 (pt) * 2008-10-01 2015-12-22 Bayer Materialscience Ag formulações de poliuretano à base de pré-polímeros para produção de meios holográficos.
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
JP2012504777A (ja) * 2008-10-01 2012-02-23 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト 自己現像性ポリマーをベースとする体積ホログラフィックのための媒体
EP2218743A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2218742A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218744A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
JP2010230911A (ja) * 2009-03-26 2010-10-14 Tdk Corp 光学デバイス
KR101782182B1 (ko) * 2009-11-03 2017-09-26 코베스트로 도이칠란드 아게 상이한 기록 공단량체를 갖는 광중합체 제제
ES2381808T3 (es) * 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
TW201133264A (en) * 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
TWI488908B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 製造全像膜的方法
JP2013510203A (ja) * 2009-11-03 2013-03-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト 感光性ポリマー組成物における添加剤としてのフルオロウレタン
WO2011054793A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Verfahren zur herstellung von holographischen medien
TWI489209B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 在光聚合物配製物中作為添加劑的胺甲酸乙酯
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
TWI506018B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 新穎的非結晶甲基丙烯酸酯及其製備和用途
EP2531889B1 (de) * 2010-02-02 2020-06-03 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit ester-basierten schreibmonomeren zur herstellung holographischer medien
EP2531892B1 (de) * 2010-02-02 2016-01-27 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
JP5313401B2 (ja) * 2010-04-09 2013-10-09 Ｈｏｙａ株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスク
RU2013110226A (ru) * 2010-08-11 2014-09-20 Байер Интеллектуэль Проперти Гмбх Дифункциональные (мет)-акрилатные пишущие мономеры
EP2450893A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
US20140255824A1 (en) * 2011-10-12 2014-09-11 Bayer Intellectual Property Gmbh Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations
KR20140082692A (ko) * 2011-10-12 2014-07-02 바이엘 인텔렉쳐 프로퍼티 게엠베하 폴리우레탄-기재 광중합체 제제에서의 사슬 전달 시약
US9195215B2 (en) * 2011-11-29 2015-11-24 Bayer Intellectual Property Gmbh Holographic medium having a protective layer
EP2613318B1 (de) * 2012-01-05 2014-07-30 Bayer Intellectual Property GmbH Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht
EP2613319A1 (de) * 2012-01-05 2013-07-10 Bayer MaterialScience AG Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
TWI557187B (zh) * 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑

Also Published As

Publication number Publication date
US8921012B2 (en) 2014-12-30
US20120219884A1 (en) 2012-08-30
US20150125784A1 (en) 2015-05-07
TWI494691B (zh) 2015-08-01
BR112012010468A2 (pt) 2016-03-08
ES2381808T3 (es) 2012-05-31
RU2542975C9 (ru) 2015-11-20
CN102792377B (zh) 2016-06-01
WO2011054749A1 (de) 2011-05-12
RU2542975C2 (ru) 2015-02-27
EP2317511A1 (de) 2011-05-04
ATE548730T1 (de) 2012-03-15
KR101727352B1 (ko) 2017-04-14
CN102792377A (zh) 2012-11-21
JP5886751B2 (ja) 2016-03-16
KR20120101431A (ko) 2012-09-13
RU2012122586A (ru) 2013-12-10
EP2317511B1 (de) 2012-03-07
US9454130B2 (en) 2016-09-27
JP2013510333A (ja) 2013-03-21
TW201135361A (en) 2011-10-16

Similar Documents

Publication Publication Date Title
PL2317511T3 (pl) Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
JP5940496B2 (ja) 半硬化物、硬化物およびそれらの製造方法、光学部品、硬化樹脂組成物ならびに化合物
IN2012DN03891A (OSRAM)
KR101216817B1 (ko) 경화성 조성물 및 그의 경화물
KR101686024B1 (ko) 임프린트용 경화성 조성물, 패턴 형성 방법 및 패턴
TW200708528A (en) Radiation-curable composition and cured product thereof
EP2023169A1 (en) Wire grid polarizer and method for producing the same
TWI486390B (zh) 硬化性組成物及其硬化物
CN102245663B (zh) 光固化性材料的制造方法、光固化性材料以及物品
KR101657516B1 (ko) 임프린트용 경화성 조성물, 패턴 형성 방법 및 패턴
JP2013074015A (ja) インプリント用硬化性組成物、パターン形成方法およびパターン
IN2012DN03900A (OSRAM)
US8999221B2 (en) Curable composition for imprints, patterning method and pattern
SG160313A1 (en) Photopolymer formulations having a low crosslinking density
TW201129529A (en) Fluorourethanes as additives in a photopolymer formulation
CN101959841A (zh) (甲基)丙烯酸酯化合物，使用它的可固化组合物，用于光-纳米压印的可固化组合物，可固化组合物的固化产品和制备固化产品的方法
EP2352768A2 (en) Curable composition for imprints, patterning method and pattern
JP5712003B2 (ja) インプリント用硬化性組成物およびインプリント用重合性単量体の製造方法
Pinto-Iguanero et al. Holographic material film composed by Norland Noa 65® adhesive
WO2009014112A1 (ja) 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体
TW200738772A (en) Thermosetting resin composition, method of forming protective film for color filter and the protective film
JP6068776B2 (ja) 活性エネルギー線硬化性樹脂組成物と成型体
JP2012002978A (ja) 硬化性材料の製造方法、硬化性材料および光学部材
TWI387615B (zh) 壓克力奈米複合材料
TW201825534A (zh) 壓印材料