WO2009014112A1 - 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体 - Google Patents
体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体 Download PDFInfo
- Publication number
- WO2009014112A1 WO2009014112A1 PCT/JP2008/063118 JP2008063118W WO2009014112A1 WO 2009014112 A1 WO2009014112 A1 WO 2009014112A1 JP 2008063118 W JP2008063118 W JP 2008063118W WO 2009014112 A1 WO2009014112 A1 WO 2009014112A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- volume phase
- phase hologram
- hologram recording
- recording material
- polymer matrix
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 6
- 230000003287 optical effect Effects 0.000 title 1
- 229920000642 polymer Polymers 0.000 abstract 4
- 239000011159 matrix material Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000004593 Epoxy Substances 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- -1 episulfide compound Chemical class 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 125000003396 thiol group Chemical group [H]S* 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/06—Polythioethers from cyclic thioethers
- C08G75/08—Polythioethers from cyclic thioethers from thiiranes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/02—Polythioethers; Polythioether-ethers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/04—Polysulfides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Holo Graphy (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009524484A JP5037616B2 (ja) | 2007-07-26 | 2008-07-22 | 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体 |
US12/670,577 US8399156B2 (en) | 2007-07-26 | 2008-07-22 | Volume phase hologram recording material and optical information recording medium using the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-194111 | 2007-07-26 | ||
JP2007194111 | 2007-07-26 | ||
JP2008-032692 | 2008-02-14 | ||
JP2008032692 | 2008-02-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009014112A1 true WO2009014112A1 (ja) | 2009-01-29 |
Family
ID=40281363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/063118 WO2009014112A1 (ja) | 2007-07-26 | 2008-07-22 | 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8399156B2 (ja) |
JP (1) | JP5037616B2 (ja) |
TW (1) | TWI460562B (ja) |
WO (1) | WO2009014112A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010250246A (ja) * | 2009-03-26 | 2010-11-04 | Univ Of Electro-Communications | 体積ホログラム記録材料用組成物及び体積ホログラム記録媒体 |
US20120321997A1 (en) * | 2009-11-03 | 2012-12-20 | Bayer Intellectual Property Gmbh | Urethanes used as additives in a photopolymer formulation |
JP2015048369A (ja) * | 2013-08-30 | 2015-03-16 | 住友精化株式会社 | 硬化性樹脂組成物及びその硬化物 |
JP2020166216A (ja) * | 2019-03-29 | 2020-10-08 | 太陽ホールディングス株式会社 | 感光性樹脂組成物、ドライフィルム、硬化物、および電子部品 |
WO2023167014A1 (ja) * | 2022-03-01 | 2023-09-07 | ナミックス株式会社 | 樹脂組成物、接着剤、封止材、硬化物、半導体装置及び電子部品 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8034514B2 (en) * | 2005-03-08 | 2011-10-11 | Nippon Steel Chemical Co., Ltd. | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
WO2007102470A1 (ja) * | 2006-03-09 | 2007-09-13 | Nippon Steel Chemical Co., Ltd. | 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 |
JP5859280B2 (ja) * | 2011-11-14 | 2016-02-10 | 新日鉄住金化学株式会社 | 感光性材料、ホログラフィック記録媒体、及びホログラフィック記録方法 |
EP2847245B1 (en) * | 2012-05-07 | 2019-01-02 | Mercene Labs AB | Method for the manufacture of coated articles and coated articles |
JP6028455B2 (ja) * | 2012-08-24 | 2016-11-16 | 大日本印刷株式会社 | 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性基板、及び、体積型ホログラム記録体 |
Citations (3)
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JP2003167331A (ja) * | 2001-12-03 | 2003-06-13 | Japan U-Pica Co Ltd | 樹脂組成物及びその硬化物 |
JP2005084262A (ja) * | 2003-09-05 | 2005-03-31 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
JP2007017601A (ja) * | 2005-07-06 | 2007-01-25 | Dainippon Printing Co Ltd | 体積型ホログラム感光性組成物 |
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US4942112A (en) | 1988-01-15 | 1990-07-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements for refractive index imaging |
JP3465528B2 (ja) * | 1997-04-22 | 2003-11-10 | 三菱瓦斯化学株式会社 | 新規な光学材料用樹脂 |
JPH11258402A (ja) * | 1998-03-13 | 1999-09-24 | Mitsui Chem Inc | 高屈折率樹脂用組成物及び該組成物を硬化させてなるプラスチックレンズ及びその製造方法 |
US6482551B1 (en) | 1998-03-24 | 2002-11-19 | Inphase Technologies | Optical article and process for forming article |
JP4171570B2 (ja) * | 2000-05-22 | 2008-10-22 | 株式会社トクヤマ | 高純度アルキルアダマンチルエステルの製造方法 |
US6592801B2 (en) * | 2001-04-30 | 2003-07-15 | Essilor International Compagnie Generale D'optique | Photopolymerization of episulfides using metal complexes and its use for making ophthalmic lenses |
JP4832665B2 (ja) * | 2001-05-22 | 2011-12-07 | 新日鐵化学株式会社 | 新規なエピスルフィド化合物 |
JP2004035413A (ja) * | 2002-06-28 | 2004-02-05 | Mitsubishi Chemicals Corp | カルバミン酸エステル化合物 |
JP4338951B2 (ja) | 2002-10-01 | 2009-10-07 | 新日鐵化学株式会社 | 可溶性多官能ビニル芳香族共重合体及びその重合方法 |
EP1554614A4 (en) * | 2002-10-22 | 2008-08-27 | Zebra Imaging Inc | ACTIVE DISPLAY OF DIGITAL HOLOGRAMS |
JP4461725B2 (ja) * | 2003-07-10 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
US20070172742A1 (en) * | 2004-02-13 | 2007-07-26 | Kentarou Yachi | Volume hologram recording material and volume hologram recording medium |
JP4550616B2 (ja) | 2004-02-24 | 2010-09-22 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物およびそれを用いる体積ホログラム記録媒体の製造方法 |
JPWO2006004158A1 (ja) * | 2004-07-07 | 2008-04-24 | 太陽インキ製造株式会社 | 光硬化性・熱硬化性樹脂組成物とそれを用いたドライフィルム、及びその硬化物 |
JP4185026B2 (ja) * | 2004-07-16 | 2008-11-19 | 株式会社東芝 | ホログラム記録媒体およびその製造方法 |
SG158878A1 (en) * | 2005-01-20 | 2010-02-26 | Sumitomo Bakelite Co | Epoxy resin composition, method of rendering the same latent, and semiconductor device |
US20060177666A1 (en) * | 2005-02-08 | 2006-08-10 | Masanao Kawabe | Curable resin compositions |
US7704643B2 (en) * | 2005-02-28 | 2010-04-27 | Inphase Technologies, Inc. | Holographic recording medium with control of photopolymerization and dark reactions |
US8034514B2 (en) * | 2005-03-08 | 2011-10-11 | Nippon Steel Chemical Co., Ltd. | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
TW200702954A (en) * | 2005-07-11 | 2007-01-16 | Toagosei Co Ltd | Volume hologram recording material, the method of processing thereof and the recording medium |
JP2007047302A (ja) * | 2005-08-08 | 2007-02-22 | Toshiba Corp | ホログラム記録媒体 |
JP2007093688A (ja) * | 2005-09-27 | 2007-04-12 | Toshiba Corp | ホログラム記録媒体、マスターホログラムの製造方法およびコピーホログラムの製造方法 |
JP4640193B2 (ja) * | 2006-01-26 | 2011-03-02 | パナソニック電工株式会社 | エピスルフィド系樹脂組成物及びそれを用いた電子部品 |
WO2007102470A1 (ja) * | 2006-03-09 | 2007-09-13 | Nippon Steel Chemical Co., Ltd. | 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 |
JP5031578B2 (ja) * | 2006-03-29 | 2012-09-19 | 太陽ホールディングス株式会社 | 光硬化性・熱硬化性樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板 |
JP5402266B2 (ja) * | 2008-06-10 | 2014-01-29 | 三菱化学株式会社 | 光反応性組成物、光学材料、ホログラム記録層形成用組成物、ホログラム記録材料およびホログラム記録媒体 |
-
2008
- 2008-07-22 JP JP2009524484A patent/JP5037616B2/ja not_active Expired - Fee Related
- 2008-07-22 US US12/670,577 patent/US8399156B2/en not_active Expired - Fee Related
- 2008-07-22 WO PCT/JP2008/063118 patent/WO2009014112A1/ja active Application Filing
- 2008-07-23 TW TW097127976A patent/TWI460562B/zh not_active IP Right Cessation
Patent Citations (3)
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JP2003167331A (ja) * | 2001-12-03 | 2003-06-13 | Japan U-Pica Co Ltd | 樹脂組成物及びその硬化物 |
JP2005084262A (ja) * | 2003-09-05 | 2005-03-31 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
JP2007017601A (ja) * | 2005-07-06 | 2007-01-25 | Dainippon Printing Co Ltd | 体積型ホログラム感光性組成物 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010250246A (ja) * | 2009-03-26 | 2010-11-04 | Univ Of Electro-Communications | 体積ホログラム記録材料用組成物及び体積ホログラム記録媒体 |
US20120321997A1 (en) * | 2009-11-03 | 2012-12-20 | Bayer Intellectual Property Gmbh | Urethanes used as additives in a photopolymer formulation |
US8877408B2 (en) * | 2009-11-03 | 2014-11-04 | Bayer Materialscience Ag | Urethanes used as additives in a photopolymer formulation |
JP2015048369A (ja) * | 2013-08-30 | 2015-03-16 | 住友精化株式会社 | 硬化性樹脂組成物及びその硬化物 |
JP2020166216A (ja) * | 2019-03-29 | 2020-10-08 | 太陽ホールディングス株式会社 | 感光性樹脂組成物、ドライフィルム、硬化物、および電子部品 |
JP7312000B2 (ja) | 2019-03-29 | 2023-07-20 | 太陽ホールディングス株式会社 | 感光性樹脂組成物、ドライフィルム、硬化物、および電子部品 |
WO2023167014A1 (ja) * | 2022-03-01 | 2023-09-07 | ナミックス株式会社 | 樹脂組成物、接着剤、封止材、硬化物、半導体装置及び電子部品 |
Also Published As
Publication number | Publication date |
---|---|
TW200921307A (en) | 2009-05-16 |
JPWO2009014112A1 (ja) | 2010-10-07 |
JP5037616B2 (ja) | 2012-10-03 |
TWI460562B (zh) | 2014-11-11 |
US20100203429A1 (en) | 2010-08-12 |
US8399156B2 (en) | 2013-03-19 |
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