JP5037616B2 - 体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体 - Google Patents
体積位相型ホログラム記録材料及びそれを用いた光情報記録媒体 Download PDFInfo
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- JP5037616B2 JP5037616B2 JP2009524484A JP2009524484A JP5037616B2 JP 5037616 B2 JP5037616 B2 JP 5037616B2 JP 2009524484 A JP2009524484 A JP 2009524484A JP 2009524484 A JP2009524484 A JP 2009524484A JP 5037616 B2 JP5037616 B2 JP 5037616B2
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Description
(f)分子中に1つ以上のチイラン環を有するエピスルフィド化合物0.5〜50重量%、
(g)分子中に1つ以上のオキシラン環を有し、チイラン環を有さないエポキシ化合物、及び
(h)硬化剤
を含むポリマーマトリックス形成材料から形成されたチオール基を有するポリマーマトリックスであることを特徴とする体積位相型ホログラム記録材料に関する。
HDEEBA:水添ビスフェノールA型エピスルフィド樹脂(ジャパンエポキシレジン製 YL-7007)
ESF−300S:ビスフェノールフルオレン型エピスルフィド樹脂(新日鐵化学製 ESF-300S)
PETMP:ペンタエリトリトールテトラ(3−メルカプトプロピオナート)
TDMAMP:2,4,6−トリス(ジメチルアミノメチル)フェノール
DVBP:3,3’−ジビニルビフェニル
MPV:ビス(4-ビニルチオフェニル)スルフィド
DMI:1,3−ジメチル−2−イミダゾリジノン
DEEBA:ビスフェノールA型エピスルフィド樹脂(ジャパンエポキシレジン製:YL−7000)
HDGEBA:水添ビスフェノールA型エポキシ樹脂(東都化成製:ST−3000)
SR−TPG:トリプロピレングリコールジグリシジルエーテル
BDTP:ブタンジオールビスチオプロピオネート
DBU:1,8ジアザビシクロ[5.4.0]ウンデセン−7
*最大回折効率(SHOT−500による測定)
透過型ホログラムの回折効率は、直線偏光型He−Neレーザ(633nm)による回折光及び透過光を光パワーメーターで読み取った値を用いて、次式により算出した。
回折効率(%)=〔回折光強度/(透過光強度+回折光強度)〕×100
また、最大回折効率を得るのに要した露光量を感度とした。
ホログラム記録材料の多重記録性の指標であるダイナミックレンジ(M#)ならびに体積収縮率(シュリンケージ)は次式より算出できる。
ダイナミックレンジ :M/#=Σ√(回折効率)
シュリンケージ(%):ホログラム記録時の角度と再生時の角度の差(デチューン角度)から計算。
記録したページデータの600秒経過後におけるSNR変化率を求め、A:変化率が5%以内、B:変化率が5〜20%、C:変化率が20%以上とした。
下記の通りの成分を配合して、体積位相型ホログラム記録材料前駆体を作製した。
まず、TDMAMP 0.11gとDVBP 0.28gとDMI 0.28gとを混合させておき、これにビス(エタ(5)シクロペンタジエニル)-ビス-(2,6-ジフルオロ-3-(ピロール1-イル)フェニル)チタニウム(Irgacure784、チバ・スペシャルティ・ケミカルズ社製)を0.02g溶解させた。続いて、HDEEBA 0.15gとDGEPPG 1.21gそしてPETMP 0.82gを溶解させて、感光性組成物溶液を得た。この液体は、体積位相型ホログラム記録材料前駆体である。
この感光性組成物溶液を30mm×30mm、厚み1.2mmのガラス基板(両面反射防止膜付き)の片面にディスペンサーを使用して塗布した。続いて、真空下で気泡がなくなるまで脱泡し、これにもう一枚のガラスをかぶせて、50℃に設定した窒素雰囲気のイナートブン内で24時間硬化させ、エポキシ・エピスルフィド樹脂系ポリマーマトリックスを有する厚みが200μmとなる体積位相型ホログラム記録材料層を有する感光板を作製した。これを体積位相型ホログラム記録媒体とした。
配合組成を表1に示すとおりとした以外は実施例1と同様にして、感光性樹脂組成物溶液を得て、これから体積位相型ホログラム記録材料及びホログラム記録用光情報記録媒体を得て、ホログラムを記録し、評価を行った。組成及び評価結果を表1にまとめた。また、記録材料のFT−IR測定結果を図1に示した。図1からエピスルフィド化合物の配合による三次元架橋ポリマーマトリックス内への反応性チオール基形成と、エピスルフィド化合物の配合量に応じてチオール基の導入量が調整できることが読み取れる。
ジビニルベンゼン1.83モル(270.7ml)、エチルビニルベンゼン1.38モル(197.8ml)、2−ヒドロキシエチルメタクリレート(1.07mol)及びトルエン(誘電率:2.4)2011mlを3000mlのフラスコ内に投入して50℃に保持した。さらに、1.05molの酢酸エチル、さらに、1.13molの三フッ化ホウ素ジエチルエーテル錯体(BF3・OEt2)141.9mlを添加し、3時間反応させた。重合反応をメタノールで停止させた後、分液漏斗を用いて0.1Mの水酸化ナトリウム水溶液により分液することにより、未反応の開始剤ならびに触媒を除去した。その後、室温で有機層を大量のメタノールに投入し、末端に−O−C2H4−OOC−C(CH3)=CH2基を有する可溶性芳香族共重合体を析出させた。得られた共重合体をメタノールで洗浄し、濾別、乾燥、秤量して、メタクリロイル基含有可溶性芳香族共重合体(b1)159.9g(収率:45.2wt%)を得た。得られた共重合体(b1)のMwは6200、Mnは3700、Mw/Mnは1.67であった。また、NMR分析結果より式(2)の構造単位の含有量は58%であった。
下記の通りの成分を配合して、体積位相型ホログラム記録材料前駆体を作製した。
まず、DBU 0.15gと合成例で得た共重合体(b1)1.81gとMPV1.81gと安息香酸ブチル3.61gとを混合させておき、これにビス(エタ(5)シクロペンタジエニル)-ビス-(2,6-ジフルオロ-3-(ピロール1-イル)フェニル)チタニウム(Irgacure784、チバ・スペシャルティ・ケミカルズ社製)を0.27g溶解させた。続いて、HDEEBAを1.87gとSR−TPGを15.4gそしてBDTP11.3gを溶解させて、感光性組成物溶液を得た。この液体は、体積位相型ホログラム記録材料前駆体である。
配合組成を表2に示すとおりとした以外は実施例5と同様にして、感光性樹脂組成物溶液を得て、これから体積位相型ホログラム記録媒体を得て、ホログラムを記録し、評価を行った。組成及び評価結果を表2にまとめた。
Claims (12)
- (a)ポリマーマトリックス、(b)光ラジカル重合性化合物及び(c)光ラジカル重合開始剤を主成分とする体積位相型ホログラム記録材料であって、(a)ポリマーマトリックスが、
(f)分子中に1つ以上のチイラン環を有するエピスルフィド化合物0.5〜50重量%、
(g)分子中に1つ以上のオキシラン環を有し、チイラン環を有さないエポキシ化合物、及び
(h)硬化剤
を含むポリマーマトリックス形成材料から形成されたチオール基を有するポリマーマトリックスであることを特徴とする体積位相型ホログラム記録材料。 - (a)ポリマーマトリックスが、3次元架橋ポリマーマトリックスである請求項1に記載の体積位相型ホログラム記録材料。
- (a)ポリマーマトリックスが、
(f2)分子中に2つ以下のチイラン環を有するエピスルフィド化合物0.5〜50重量%、
(g2)分子中に2つ以下のオキシラン環を有し、チイラン環を有さないエポキシ化合物及び
(h2)2官能型硬化剤、
を含むポリマーマトリックス形成材料から形成された2級チオール基を有する線状ポリマーマトリックスである請求項1に記載の体積位相型ホログラム記録材料。 - ポリマーマトリックス形成材料が、屈折率差の絶対値が0.05以上となる組合せを含む2種以上の化合物の混合物である請求項1に記載の体積位相型ホログラム記録材料。
- (a)ポリマーマトリックスと相溶する少なくとも1種の(d)非反応性化合物を更に含む請求項1に記載の体積位相型ホログラム記録材料。
- 可溶性芳香族共重合体(b1)を構成するモノビニル芳香族化合物がスチレン、ビニルナフタレン、ビニルビフェニル、インデン、アセナフチレン、ベンゾチオフェン又はそれらの置換体から選ばれる芳香族オレフィンである請求項7に記載の体積位相型ホログラム記録材料。
- 請求項1〜8いずれかに記載の体積位相型ホログラム記録材料が、1つの支持体上に又は2つの支持体間に形成されてなる体積位相型ホログラム記録用光情報記録媒体。
- ポリマーマトリックス形成材料、(b)光ラジカル重合性化合物及び(c)光ラジカル重合開始剤を主成分とする体積位相型ホログラム記録材料前駆体であって、
ポリマーマトリックス形成材料が、
(f)分子中に1つ以上のチイラン環を有するエピスルフィド化合物0.5〜50重量%、
(g)分子中に1つ以上オキシラン環を有し、チイラン環を有さないエポキシ化合物、及び
(h)硬化剤
を含み、且つ光ラジカル重合反応以外の重合反応によって重合してポリマーマトリックスを形成するものであることを特徴とする体積位相型ホログラム記録材料前駆体。 - ポリマーマトリックス形成材料が、
(f2)分子中に2つ以下のチイラン環を有するエピスルフィド化合物0.5〜50重量%、
(g2)分子中に2つ以下のオキシラン環を有し、チイラン環を有さないエポキシ化合物、及び
(h2)2官能型硬化剤、
を含み、且つ光ラジカル重合反応以外の重合反応によって重合して反応性の2級チオール基を有する線状ポリマーマトリックスを形成するものである請求項10に記載の体積位相型ホログラム記録材料前駆体。 - 請求項10に記載の体積位相型ホログラム記録材料前駆体を、光ラジカル重合反応以外の重合反応によって、チオール基を有する3次元架橋ポリマーマトリックスを形成させることを特徴とする(a)3次元架橋ポリマーマトリックス、(b)光ラジカル重合性化合物及び(c)光ラジカル重合開始剤を主成分とする体積位相型ホログラム記録材料の製造方法。
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Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8034514B2 (en) * | 2005-03-08 | 2011-10-11 | Nippon Steel Chemical Co., Ltd. | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
WO2007102470A1 (ja) * | 2006-03-09 | 2007-09-13 | Nippon Steel Chemical Co., Ltd. | 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 |
JP5665165B2 (ja) * | 2009-03-26 | 2015-02-04 | 国立大学法人電気通信大学 | 体積ホログラム記録材料用組成物及び体積ホログラム記録媒体 |
EP2496617B1 (de) * | 2009-11-03 | 2015-02-25 | Bayer Intellectual Property GmbH | Urethane als additive in einer photopolymer-formulierung |
JP5859280B2 (ja) * | 2011-11-14 | 2016-02-10 | 新日鉄住金化学株式会社 | 感光性材料、ホログラフィック記録媒体、及びホログラフィック記録方法 |
CN104321354B (zh) | 2012-05-07 | 2017-03-08 | 莫赛纳实验室公司 | 用于制造含涂层产品以及复合物的方法和配方 |
JP6028455B2 (ja) * | 2012-08-24 | 2016-11-16 | 大日本印刷株式会社 | 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性基板、及び、体積型ホログラム記録体 |
JP6174948B2 (ja) * | 2013-08-30 | 2017-08-02 | 住友精化株式会社 | 硬化性樹脂組成物及びその硬化物 |
JP7312000B2 (ja) * | 2019-03-29 | 2023-07-20 | 太陽ホールディングス株式会社 | 感光性樹脂組成物、ドライフィルム、硬化物、および電子部品 |
WO2023167014A1 (ja) * | 2022-03-01 | 2023-09-07 | ナミックス株式会社 | 樹脂組成物、接着剤、封止材、硬化物、半導体装置及び電子部品 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003167331A (ja) * | 2001-12-03 | 2003-06-13 | Japan U-Pica Co Ltd | 樹脂組成物及びその硬化物 |
JP2005084262A (ja) * | 2003-09-05 | 2005-03-31 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
JP2007017601A (ja) * | 2005-07-06 | 2007-01-25 | Dainippon Printing Co Ltd | 体積型ホログラム感光性組成物 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4942112A (en) | 1988-01-15 | 1990-07-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements for refractive index imaging |
JP3465528B2 (ja) * | 1997-04-22 | 2003-11-10 | 三菱瓦斯化学株式会社 | 新規な光学材料用樹脂 |
JPH11258402A (ja) * | 1998-03-13 | 1999-09-24 | Mitsui Chem Inc | 高屈折率樹脂用組成物及び該組成物を硬化させてなるプラスチックレンズ及びその製造方法 |
US6482551B1 (en) | 1998-03-24 | 2002-11-19 | Inphase Technologies | Optical article and process for forming article |
JP4171570B2 (ja) * | 2000-05-22 | 2008-10-22 | 株式会社トクヤマ | 高純度アルキルアダマンチルエステルの製造方法 |
US6592801B2 (en) * | 2001-04-30 | 2003-07-15 | Essilor International Compagnie Generale D'optique | Photopolymerization of episulfides using metal complexes and its use for making ophthalmic lenses |
JP4832665B2 (ja) * | 2001-05-22 | 2011-12-07 | 新日鐵化学株式会社 | 新規なエピスルフィド化合物 |
JP2004035413A (ja) * | 2002-06-28 | 2004-02-05 | Mitsubishi Chemicals Corp | カルバミン酸エステル化合物 |
JP4338951B2 (ja) | 2002-10-01 | 2009-10-07 | 新日鐵化学株式会社 | 可溶性多官能ビニル芳香族共重合体及びその重合方法 |
JP2006511843A (ja) * | 2002-10-22 | 2006-04-06 | ゼブラ・イメージング・インコーポレイテッド | アクティブ・デジタル・ホログラム・ディスプレイ |
JP4461725B2 (ja) * | 2003-07-10 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
US20070172742A1 (en) * | 2004-02-13 | 2007-07-26 | Kentarou Yachi | Volume hologram recording material and volume hologram recording medium |
JP4550616B2 (ja) | 2004-02-24 | 2010-09-22 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物およびそれを用いる体積ホログラム記録媒体の製造方法 |
WO2006004158A1 (ja) * | 2004-07-07 | 2006-01-12 | Taiyo Ink Mfg. Co., Ltd. | 光硬化性・熱硬化性樹脂組成物とそれを用いたドライフィルム、及びその硬化物 |
JP4185026B2 (ja) * | 2004-07-16 | 2008-11-19 | 株式会社東芝 | ホログラム記録媒体およびその製造方法 |
WO2006078062A1 (ja) * | 2005-01-20 | 2006-07-27 | Sumitomo Bakelite Co., Ltd. | エポキシ樹脂組成物、その潜伏化方法、及び半導体装置 |
US20060177666A1 (en) * | 2005-02-08 | 2006-08-10 | Masanao Kawabe | Curable resin compositions |
US7704643B2 (en) * | 2005-02-28 | 2010-04-27 | Inphase Technologies, Inc. | Holographic recording medium with control of photopolymerization and dark reactions |
US8034514B2 (en) * | 2005-03-08 | 2011-10-11 | Nippon Steel Chemical Co., Ltd. | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
TW200702954A (en) * | 2005-07-11 | 2007-01-16 | Toagosei Co Ltd | Volume hologram recording material, the method of processing thereof and the recording medium |
JP2007047302A (ja) * | 2005-08-08 | 2007-02-22 | Toshiba Corp | ホログラム記録媒体 |
JP2007093688A (ja) * | 2005-09-27 | 2007-04-12 | Toshiba Corp | ホログラム記録媒体、マスターホログラムの製造方法およびコピーホログラムの製造方法 |
JP4640193B2 (ja) * | 2006-01-26 | 2011-03-02 | パナソニック電工株式会社 | エピスルフィド系樹脂組成物及びそれを用いた電子部品 |
WO2007102470A1 (ja) * | 2006-03-09 | 2007-09-13 | Nippon Steel Chemical Co., Ltd. | 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 |
JP5031578B2 (ja) * | 2006-03-29 | 2012-09-19 | 太陽ホールディングス株式会社 | 光硬化性・熱硬化性樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板 |
JP5402266B2 (ja) * | 2008-06-10 | 2014-01-29 | 三菱化学株式会社 | 光反応性組成物、光学材料、ホログラム記録層形成用組成物、ホログラム記録材料およびホログラム記録媒体 |
-
2008
- 2008-07-22 WO PCT/JP2008/063118 patent/WO2009014112A1/ja active Application Filing
- 2008-07-22 JP JP2009524484A patent/JP5037616B2/ja not_active Expired - Fee Related
- 2008-07-22 US US12/670,577 patent/US8399156B2/en not_active Expired - Fee Related
- 2008-07-23 TW TW097127976A patent/TWI460562B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003167331A (ja) * | 2001-12-03 | 2003-06-13 | Japan U-Pica Co Ltd | 樹脂組成物及びその硬化物 |
JP2005084262A (ja) * | 2003-09-05 | 2005-03-31 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
JP2007017601A (ja) * | 2005-07-06 | 2007-01-25 | Dainippon Printing Co Ltd | 体積型ホログラム感光性組成物 |
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