NO910101L - Fremgangsmaate og anordning for loddingsformfeste av integrert krets. - Google Patents

Fremgangsmaate og anordning for loddingsformfeste av integrert krets.

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Publication number
NO910101L
NO910101L NO91910101A NO910101A NO910101L NO 910101 L NO910101 L NO 910101L NO 91910101 A NO91910101 A NO 91910101A NO 910101 A NO910101 A NO 910101A NO 910101 L NO910101 L NO 910101L
Authority
NO
Norway
Prior art keywords
layer
semiconductor wafer
metallization system
solder
integrated circuit
Prior art date
Application number
NO91910101A
Other languages
English (en)
Other versions
NO910101D0 (no
Inventor
Michael J Shannon
Randolf C Turnidge
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of NO910101D0 publication Critical patent/NO910101D0/no
Publication of NO910101L publication Critical patent/NO910101L/no

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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    • H01L23/481Internal lead connections, e.g. via connections, feedthrough structures
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Die Bonding (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Photovoltaic Devices (AREA)

Abstract

Det er beskrevet en forbedret halvlederanordning som er tilpasset til å være metallurgisk bundet til et substrat. I særdeleshet innbefatter monolltisk mikrobølgeintegrert krets (MMIC) anordning (10) en halvlederskive (12) som har første og andre hovedover-flater og som definerer minst en gjennomgangsforblnd-else (34) som strekker seg derigjennom. En elektrisk krets anbragt på den første overflate av halvlederskiven (12). I henhold til denne oppfinnelse innbefatter MMIC anordningen (10) et Jord-plan metalliserings-system (32) som er tilveiebragt på den andre overflaten av halvlederskiven (12). Baksidemetalliseringssystemet (32) fremmer foretrukket "avfukting" av loddemiddel innenfor gjennomgangsforbindelser (34) for å redusere loddemiddelfeil knyttet til form-festebehandling. Baksidemetalliseringssystemet (32) innbefatter et Jord-planlag (36) og et andre lag (38) som er fremstilt av et ikke-fuktbart materiale som er avsatt innenfor gjennomgangsforbindelse (34). Tredje lag (42) er avsatt på andre lag (36), men avsluttes hosliggende en ytterkant av gjennomgangsforbindelsen (34). Det tredje laget (42) fremmer fukting utenfor gjennomgangsforbindelsen (34) under loddingsform-festebehandling.
NO91910101A 1990-01-10 1991-01-09 Fremgangsmaate og anordning for loddingsformfeste av integrert krets. NO910101L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/463,186 US5027189A (en) 1990-01-10 1990-01-10 Integrated circuit solder die-attach design and method

Publications (2)

Publication Number Publication Date
NO910101D0 NO910101D0 (no) 1991-01-09
NO910101L true NO910101L (no) 1991-07-11

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NO91910101A NO910101L (no) 1990-01-10 1991-01-09 Fremgangsmaate og anordning for loddingsformfeste av integrert krets.

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US (1) US5027189A (no)
EP (1) EP0436912A1 (no)
JP (1) JPH04211137A (no)
KR (1) KR940008380B1 (no)
AU (1) AU629438B2 (no)
CA (1) CA2032266C (no)
IL (1) IL96673A (no)
NO (1) NO910101L (no)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3181283B2 (ja) * 1989-08-07 2001-07-03 株式会社日立製作所 はんだ接続された電子回路装置とはんだ接続方法並びに金メッキ接続端子用はんだ
US5202752A (en) * 1990-05-16 1993-04-13 Nec Corporation Monolithic integrated circuit device
JP3031966B2 (ja) * 1990-07-02 2000-04-10 株式会社東芝 集積回路装置
FR2665574B1 (fr) * 1990-08-03 1997-05-30 Thomson Composants Microondes Procede d'interconnexion entre un circuit integre et un circuit support, et circuit integre adapte a ce procede.
US5198695A (en) * 1990-12-10 1993-03-30 Westinghouse Electric Corp. Semiconductor wafer with circuits bonded to a substrate
US5156998A (en) * 1991-09-30 1992-10-20 Hughes Aircraft Company Bonding of integrated circuit chip to carrier using gold/tin eutectic alloy and refractory metal barrier layer to block migration of tin through via holes
JPH06209058A (ja) * 1993-01-12 1994-07-26 Mitsubishi Electric Corp 半導体装置及びその製造方法,並びにその実装方法
US5635762A (en) * 1993-05-18 1997-06-03 U.S. Philips Corporation Flip chip semiconductor device with dual purpose metallized ground conductor
US5482897A (en) * 1994-07-19 1996-01-09 Lsi Logic Corporation Integrated circuit with on-chip ground plane
DE19606101A1 (de) * 1996-02-19 1997-08-21 Siemens Ag Halbleiterkörper mit Lotmaterialschicht
DE69712562T2 (de) * 1996-02-28 2002-12-19 Koninkl Philips Electronics Nv Halbleiteranordnung mit einem auf einen Träger gelöteten Chip mit Durchgangsleitungen und Herstellungsverfahren dafür
JP2853692B2 (ja) * 1997-02-07 1999-02-03 日本電気株式会社 半導体装置
JP3724110B2 (ja) 1997-04-24 2005-12-07 三菱電機株式会社 半導体装置の製造方法
US6297531B2 (en) 1998-01-05 2001-10-02 International Business Machines Corporation High performance, low power vertical integrated CMOS devices
US6137129A (en) * 1998-01-05 2000-10-24 International Business Machines Corporation High performance direct coupled FET memory cell
JP2003045875A (ja) * 2001-07-30 2003-02-14 Nec Kagobutsu Device Kk 半導体装置およびその製造方法
US7868472B2 (en) * 2004-04-08 2011-01-11 Avago Technologies General Ip (Singapore) Pte. Ltd. Thermal dissipation in integrated circuit systems
US7339267B2 (en) * 2005-05-26 2008-03-04 Freescale Semiconductor, Inc. Semiconductor package and method for forming the same
US7387958B2 (en) 2005-07-08 2008-06-17 Raytheon Company MMIC having back-side multi-layer signal routing
EP1959502A1 (fr) * 2007-02-14 2008-08-20 Imphy Alloys Module photovoltaïque et modules de production d'énergie ou de lumière
US7639104B1 (en) * 2007-03-09 2009-12-29 Silicon Clocks, Inc. Method for temperature compensation in MEMS resonators with isolated regions of distinct material
US20090026619A1 (en) * 2007-07-24 2009-01-29 Northrop Grumman Space & Mission Systems Corp. Method for Backside Metallization for Semiconductor Substrate
JP2010003796A (ja) * 2008-06-19 2010-01-07 Mitsubishi Electric Corp 半導体装置及びその製造方法
JP5532743B2 (ja) * 2009-08-20 2014-06-25 三菱電機株式会社 半導体装置及びその製造方法
JP2011060807A (ja) * 2009-09-07 2011-03-24 Renesas Electronics Corp 導電性接合層付き半導体チップ及びその製造方法、並びに半導体装置の製造方法
DE102009044086A1 (de) * 2009-09-23 2011-03-24 United Monolithic Semiconductors Gmbh Verfahren zur Herstellung eines elektronischen Bauteils und nach diesem Verfahren hergestelltes elektronisches Bauteil
JP2011096918A (ja) * 2009-10-30 2011-05-12 Oki Semiconductor Co Ltd 半導体装置および半導体装置の製造方法
JP5621334B2 (ja) * 2010-06-10 2014-11-12 富士電機株式会社 半導体装置および半導体装置の製造方法
US8963305B2 (en) 2012-09-21 2015-02-24 Freescale Semiconductor, Inc. Method and apparatus for multi-chip structure semiconductor package
JP6173994B2 (ja) * 2014-10-16 2017-08-02 ウシオオプトセミコンダクター株式会社 光半導体装置
US10861792B2 (en) * 2019-03-25 2020-12-08 Raytheon Company Patterned wafer solder diffusion barrier
US11610861B2 (en) * 2020-09-14 2023-03-21 Infineon Technologies Austria Ag Diffusion soldering with contaminant protection

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3429040A (en) * 1965-06-18 1969-02-25 Ibm Method of joining a component to a substrate
US3871014A (en) * 1969-08-14 1975-03-11 Ibm Flip chip module with non-uniform solder wettable areas on the substrate
DE2332822B2 (de) * 1973-06-28 1978-04-27 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen von diffundierten, kontaktierten und oberflächenpassivierten Halbleiterbauelementen aus Halbleiterscheiben aus Silizium
US3893156A (en) * 1973-06-29 1975-07-01 Ibm Novel beam lead integrated circuit structure and method for making the same including automatic registration of beam leads with corresponding dielectric substrate leads
US3986196A (en) * 1975-06-30 1976-10-12 Varian Associates Through-substrate source contact for microwave FET
US4290079A (en) * 1979-06-29 1981-09-15 International Business Machines Corporation Improved solder interconnection between a semiconductor device and a supporting substrate
GB2102833B (en) * 1981-07-31 1984-08-01 Philips Electronic Associated Lead-indium-silver alloy for use in semiconductor devices
JPH0693466B2 (ja) * 1986-06-04 1994-11-16 日本電気株式会社 シリコン半導体装置の製造方法
US4827610A (en) * 1987-08-31 1989-05-09 Texas Instruments Incorporated Method of creating solder or brazing barriers
JPH01108730A (ja) * 1987-10-21 1989-04-26 Nec Corp 半導体装置
JP2703908B2 (ja) * 1987-11-20 1998-01-26 日本電気株式会社 化合物半導体装置
US4840302A (en) * 1988-04-15 1989-06-20 International Business Machines Corporation Chromium-titanium alloy

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IL96673A0 (en) 1991-09-16
KR910014996A (ko) 1991-08-31
CA2032266C (en) 1993-04-06
JPH04211137A (ja) 1992-08-03
AU6819990A (en) 1991-07-11
US5027189A (en) 1991-06-25
NO910101D0 (no) 1991-01-09
EP0436912A1 (en) 1991-07-17
AU629438B2 (en) 1992-10-01
CA2032266A1 (en) 1993-04-06
IL96673A (en) 1993-03-15

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