NO20053151L - Fremgangsmate for a produsere mikrosystemer. - Google Patents

Fremgangsmate for a produsere mikrosystemer.

Info

Publication number
NO20053151L
NO20053151L NO20053151A NO20053151A NO20053151L NO 20053151 L NO20053151 L NO 20053151L NO 20053151 A NO20053151 A NO 20053151A NO 20053151 A NO20053151 A NO 20053151A NO 20053151 L NO20053151 L NO 20053151L
Authority
NO
Norway
Prior art keywords
electronic building
conductive material
building elements
ascending
direct connection
Prior art date
Application number
NO20053151A
Other languages
English (en)
Other versions
NO20053151D0 (no
Inventor
Reiner Gotzen
Original Assignee
Reiner Gotzen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Reiner Gotzen filed Critical Reiner Gotzen
Publication of NO20053151D0 publication Critical patent/NO20053151D0/no
Publication of NO20053151L publication Critical patent/NO20053151L/no

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4857Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5389Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19Manufacturing methods of high density interconnect preforms
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    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L24/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
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    • H01ELECTRIC ELEMENTS
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4867Applying pastes or inks, e.g. screen printing
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    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
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    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
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    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
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    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • H01L2224/16148Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked the bump connector connecting to a bonding area protruding from the surface
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    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
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    • H01L2224/73267Layer and HDI connectors
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    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/76Apparatus for connecting with build-up interconnects
    • H01L2224/7665Means for transporting the components to be connected
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2924/01005Boron [B]
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    • H01L2924/01013Aluminum [Al]
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    • H01L2924/01024Chromium [Cr]
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    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12042LASER
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
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    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19042Component type being an inductor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
    • Y10T29/49146Assembling to base an electrical component, e.g., capacitor, etc. with encapsulating, e.g., potting, etc.
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49158Manufacturing circuit on or in base with molding of insulated base

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Laminated Bodies (AREA)
  • Printing Methods (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Wire Bonding (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)

Abstract

Oppfinnelsen gjelder en fremgangsmåte for fremstilling av mikrosystemer med flere plan ved siden av og/eller under hverandre som sjikt av et grunnlegeme oppbygget av lysherdbart materiale, hvor det i utsparrede hulrom i denne oppbygging er lagt inn mikroelektroniske byggeelementer, som er elektrisk eller termisk ledende forbundet med hverandre, og som videre er kjennetegnet ved at etter innsetting av vedkommende elektroniske byggeelement fortsettes den sjiktvise oppbygging av grunnlegemet, hvorved kontaktområder på det elektroniske byggeelement henholdsvis er påført et oppstigende struktur av et elektrisk/termisk ledende materiale, hvor da dette ledende materialet danner en direkte forbindelse med et ytterligere elektronisk byggeelement som er anordnet i direkte forbindelse med vedkommende elektroniske element, eller ved hjelp av en horisontalt forløpende lederbane i et oppstigende ledende materialet fra kontaktflaten til ett eller flere elektroniske byggeelementer som ligger sideveis i avstand fra de anordnede ytterligere elektroniske byggeelementer.
NO20053151A 2003-01-17 2005-06-28 Fremgangsmate for a produsere mikrosystemer. NO20053151L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10301612 2003-01-17
PCT/DE2003/000419 WO2004070835A1 (de) 2003-01-17 2003-02-13 Verfahren zur herstellung von mikrosystemen

Publications (2)

Publication Number Publication Date
NO20053151D0 NO20053151D0 (no) 2005-06-28
NO20053151L true NO20053151L (no) 2005-10-14

Family

ID=32841572

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20053151A NO20053151L (no) 2003-01-17 2005-06-28 Fremgangsmate for a produsere mikrosystemer.

Country Status (13)

Country Link
US (1) US8042267B2 (no)
EP (1) EP1586117B1 (no)
JP (1) JP4567466B2 (no)
KR (1) KR100756104B1 (no)
CN (1) CN100435331C (no)
AU (1) AU2003214001B2 (no)
CA (1) CA2513127C (no)
DE (1) DE10394193D2 (no)
IS (1) IS7981A (no)
NO (1) NO20053151L (no)
RU (1) RU2323504C2 (no)
TW (1) TWI221827B (no)
WO (1) WO2004070835A1 (no)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006008332B4 (de) * 2005-07-11 2009-06-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer funktionellen Baueinheit und funktionelle Baueinheit
WO2008153674A1 (en) 2007-06-09 2008-12-18 Boris Kobrin Method and apparatus for anisotropic etching
TWI518027B (zh) * 2008-01-22 2016-01-21 羅利斯公司 大面積奈米圖案化之方法與設備
US8518633B2 (en) 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
US8182982B2 (en) 2008-04-19 2012-05-22 Rolith Inc Method and device for patterning a disk
US8192920B2 (en) * 2008-04-26 2012-06-05 Rolith Inc. Lithography method
US20110210480A1 (en) * 2008-11-18 2011-09-01 Rolith, Inc Nanostructures with anti-counterefeiting features and methods of fabricating the same
WO2012027050A2 (en) 2010-08-23 2012-03-01 Rolith, Inc. Mask for near-field lithography and fabrication the same
US9398694B2 (en) 2011-01-18 2016-07-19 Sony Corporation Method of manufacturing a package for embedding one or more electronic components
US9763370B2 (en) * 2013-03-15 2017-09-12 National Technology & Engineering Solutions Of Sandia, Llc Apparatus for assembly of microelectronic devices
RU2602835C9 (ru) * 2015-05-13 2017-02-02 Акционерное общество "Концерн радиостроения "Вега" Способ экранирования в электронном модуле

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3712735A (en) * 1970-09-25 1973-01-23 Amp Inc Apparatus for photo etching
US4069916A (en) * 1976-06-01 1978-01-24 Western Electric Co., Inc. Tape for holding electronic articles
US4383363A (en) * 1977-09-01 1983-05-17 Sharp Kabushiki Kaisha Method of making a through-hole connector
DE3925455A1 (de) * 1989-08-01 1991-02-14 Robert Hanus Belichtungsvorrichtung zum belichten eines metallkaschierten basismaterials
DE4223371A1 (de) 1992-07-16 1994-01-20 Thomson Brandt Gmbh Verfahren und Platine zur Montage von Bauelementen
JPH06140461A (ja) * 1992-10-29 1994-05-20 Fujitsu Ltd 半導体チップの実装方法および実装構造体
DE4420996C2 (de) 1994-06-16 1998-04-09 Reiner Dipl Ing Goetzen Verfahren und Vorrichtung zur Herstellung von mikromechanischen und mikrooptischen Bauelementen
JP3726985B2 (ja) * 1996-12-09 2005-12-14 ソニー株式会社 電子部品の製造方法
US5869395A (en) * 1997-01-22 1999-02-09 Lsi Logic Corporation Simplified hole interconnect process
DE19721170A1 (de) 1997-05-21 1998-11-26 Emtec Magnetics Gmbh Verfahren und Vorrichtung zum Herstellen eines Films oder einer Schicht mit beidseitiger Oberflächenstruktur
US6833613B1 (en) * 1997-12-18 2004-12-21 Micron Technology, Inc. Stacked semiconductor package having laser machined contacts
US6160714A (en) * 1997-12-31 2000-12-12 Elpac (Usa), Inc. Molded electronic package and method of preparation
DE19826971C2 (de) * 1998-06-18 2002-03-14 Reiner Goetzen Verfahren zum mechanischen und elektrischen Verbinden von Systembauteilen
DE19847088A1 (de) * 1998-10-13 2000-05-18 Ksw Microtec Ges Fuer Angewand Flächig ausgebildeter Träger für Halbleiter-Chips und Verfahren zu seiner Herstellung
FI990862A (fi) * 1999-04-16 2000-10-17 Jorma Kalevi Kivilahti Uusi elektroniikan juotteeton valmistusmenetelmä
JP2001237512A (ja) * 1999-12-14 2001-08-31 Nitto Denko Corp 両面回路基板およびこれを用いた多層配線基板ならびに両面回路基板の製造方法
JP3553043B2 (ja) * 2001-01-19 2004-08-11 松下電器産業株式会社 部品内蔵モジュールとその製造方法
DE10144579C2 (de) 2001-08-07 2003-12-04 Reiner Goetzen Verfahren und Vorrichtung zur Herstellung von Fein- bis Mikrostrukturen und/oder komplexen Mikrosystemen
WO2010144579A2 (en) 2009-06-10 2010-12-16 Baker Hughes Incorporated Source compensated formation density measurement method by using a pulsed neutron generator

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CA2513127C (en) 2010-03-30
CN100435331C (zh) 2008-11-19
AU2003214001A1 (en) 2004-08-30
US20060072295A1 (en) 2006-04-06
JP4567466B2 (ja) 2010-10-20
US8042267B2 (en) 2011-10-25
KR100756104B1 (ko) 2007-09-05
CN1735965A (zh) 2006-02-15
CA2513127A1 (en) 2004-08-19
AU2003214001B2 (en) 2007-08-02
TW200413245A (en) 2004-08-01
DE10394193D2 (de) 2005-12-01
EP1586117A1 (de) 2005-10-19
TWI221827B (en) 2004-10-11
EP1586117B1 (de) 2014-06-18
RU2005126055A (ru) 2006-01-10
WO2004070835A1 (de) 2004-08-19
KR20050091785A (ko) 2005-09-15
JP2006513581A (ja) 2006-04-20
RU2323504C2 (ru) 2008-04-27
IS7981A (is) 2005-08-15
NO20053151D0 (no) 2005-06-28

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