NL8203521A - Werkwijze voor het vervaardigen van een inrichting. - Google Patents

Werkwijze voor het vervaardigen van een inrichting. Download PDF

Info

Publication number
NL8203521A
NL8203521A NL8203521A NL8203521A NL8203521A NL 8203521 A NL8203521 A NL 8203521A NL 8203521 A NL8203521 A NL 8203521A NL 8203521 A NL8203521 A NL 8203521A NL 8203521 A NL8203521 A NL 8203521A
Authority
NL
Netherlands
Prior art keywords
irradiation
lacquer layer
lacquer
radiation
layer
Prior art date
Application number
NL8203521A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8203521A priority Critical patent/NL8203521A/nl
Priority to US06/517,611 priority patent/US4499177A/en
Priority to DE8383201285T priority patent/DE3365143D1/de
Priority to EP83201285A priority patent/EP0103337B1/en
Priority to JP58164282A priority patent/JPS5965432A/ja
Publication of NL8203521A publication Critical patent/NL8203521A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
NL8203521A 1982-09-10 1982-09-10 Werkwijze voor het vervaardigen van een inrichting. NL8203521A (nl)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL8203521A NL8203521A (nl) 1982-09-10 1982-09-10 Werkwijze voor het vervaardigen van een inrichting.
US06/517,611 US4499177A (en) 1982-09-10 1983-07-27 Method of manufacturing a semiconductor device
DE8383201285T DE3365143D1 (en) 1982-09-10 1983-09-06 Method of manufacturing a semiconductor device
EP83201285A EP0103337B1 (en) 1982-09-10 1983-09-06 Method of manufacturing a semiconductor device
JP58164282A JPS5965432A (ja) 1982-09-10 1983-09-08 半導体デバイスの製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8203521A NL8203521A (nl) 1982-09-10 1982-09-10 Werkwijze voor het vervaardigen van een inrichting.
NL8203521 1982-09-10

Publications (1)

Publication Number Publication Date
NL8203521A true NL8203521A (nl) 1984-04-02

Family

ID=19840255

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8203521A NL8203521A (nl) 1982-09-10 1982-09-10 Werkwijze voor het vervaardigen van een inrichting.

Country Status (5)

Country Link
US (1) US4499177A (enExample)
EP (1) EP0103337B1 (enExample)
JP (1) JPS5965432A (enExample)
DE (1) DE3365143D1 (enExample)
NL (1) NL8203521A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
WO1986001313A1 (en) * 1984-08-13 1986-02-27 Ncr Corporation Process for forming a layer of patterned photoresist
US4859573A (en) * 1984-08-13 1989-08-22 Ncr Corporation Multiple photoresist layer process using selective hardening
EP0195106B1 (de) * 1985-03-22 1989-06-21 Ibm Deutschland Gmbh Herstellung einer Abhebemaske und ihre Anwendung
DE3524411A1 (de) * 1985-07-09 1987-01-15 Kernforschungsz Karlsruhe Verfahren zum herstellen von spinnduesenplatten
ZA872295B (enExample) * 1986-03-13 1987-09-22
WO1988007705A1 (en) * 1987-03-27 1988-10-06 Horsell Graphic Industries Limited Processing of exposed lithographic printing plates
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
JPH07113773B2 (ja) * 1986-07-04 1995-12-06 株式会社日立製作所 パタ−ン形成方法
JP2653072B2 (ja) * 1987-12-07 1997-09-10 松下電器産業株式会社 パターン形成方法
US4826754A (en) * 1987-04-27 1989-05-02 Microelectronics Center Of North Carolina Method for anisotropically hardening a protective coating for integrated circuit manufacture
US5064748A (en) * 1987-04-27 1991-11-12 Mcnc Method for anisotropically hardening a protective coating for integrated circuit manufacture

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern
NL8001561A (nl) * 1980-03-17 1981-10-16 Philips Nv Werkwijze voor het vervaardigen van een inrichting met behulp van een maskerpatroon.
DE3028308A1 (de) * 1980-07-25 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von reliefstrukturen aus strahlungsempfindlichen lacken auf einem substrat, insbesondere fuer die herstellung von integrierten halbleiterschaltungen
GB2082339B (en) * 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing

Also Published As

Publication number Publication date
EP0103337A1 (en) 1984-03-21
DE3365143D1 (en) 1986-09-11
JPH0452937B2 (enExample) 1992-08-25
EP0103337B1 (en) 1986-08-06
JPS5965432A (ja) 1984-04-13
US4499177A (en) 1985-02-12

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Legal Events

Date Code Title Description
A1B A search report has been drawn up
A85 Still pending on 85-01-01
BV The patent application has lapsed