DE3365143D1 - Method of manufacturing a semiconductor device - Google Patents

Method of manufacturing a semiconductor device

Info

Publication number
DE3365143D1
DE3365143D1 DE8383201285T DE3365143T DE3365143D1 DE 3365143 D1 DE3365143 D1 DE 3365143D1 DE 8383201285 T DE8383201285 T DE 8383201285T DE 3365143 T DE3365143 T DE 3365143T DE 3365143 D1 DE3365143 D1 DE 3365143D1
Authority
DE
Germany
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383201285T
Other languages
German (de)
English (en)
Inventor
Franciscus Antoniu Vollenbroek
Elisabeth Jacoba Spiertz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3365143D1 publication Critical patent/DE3365143D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE8383201285T 1982-09-10 1983-09-06 Method of manufacturing a semiconductor device Expired DE3365143D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8203521A NL8203521A (nl) 1982-09-10 1982-09-10 Werkwijze voor het vervaardigen van een inrichting.

Publications (1)

Publication Number Publication Date
DE3365143D1 true DE3365143D1 (en) 1986-09-11

Family

ID=19840255

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383201285T Expired DE3365143D1 (en) 1982-09-10 1983-09-06 Method of manufacturing a semiconductor device

Country Status (5)

Country Link
US (1) US4499177A (enExample)
EP (1) EP0103337B1 (enExample)
JP (1) JPS5965432A (enExample)
DE (1) DE3365143D1 (enExample)
NL (1) NL8203521A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
WO1986001313A1 (en) * 1984-08-13 1986-02-27 Ncr Corporation Process for forming a layer of patterned photoresist
US4859573A (en) * 1984-08-13 1989-08-22 Ncr Corporation Multiple photoresist layer process using selective hardening
EP0195106B1 (de) * 1985-03-22 1989-06-21 Ibm Deutschland Gmbh Herstellung einer Abhebemaske und ihre Anwendung
DE3524411A1 (de) * 1985-07-09 1987-01-15 Kernforschungsz Karlsruhe Verfahren zum herstellen von spinnduesenplatten
ZA872295B (enExample) * 1986-03-13 1987-09-22
WO1988007705A1 (en) * 1987-03-27 1988-10-06 Horsell Graphic Industries Limited Processing of exposed lithographic printing plates
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
JPH07113773B2 (ja) * 1986-07-04 1995-12-06 株式会社日立製作所 パタ−ン形成方法
JP2653072B2 (ja) * 1987-12-07 1997-09-10 松下電器産業株式会社 パターン形成方法
US4826754A (en) * 1987-04-27 1989-05-02 Microelectronics Center Of North Carolina Method for anisotropically hardening a protective coating for integrated circuit manufacture
US5064748A (en) * 1987-04-27 1991-11-12 Mcnc Method for anisotropically hardening a protective coating for integrated circuit manufacture

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern
NL8001561A (nl) * 1980-03-17 1981-10-16 Philips Nv Werkwijze voor het vervaardigen van een inrichting met behulp van een maskerpatroon.
DE3028308A1 (de) * 1980-07-25 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von reliefstrukturen aus strahlungsempfindlichen lacken auf einem substrat, insbesondere fuer die herstellung von integrierten halbleiterschaltungen
GB2082339B (en) * 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing

Also Published As

Publication number Publication date
EP0103337A1 (en) 1984-03-21
JPH0452937B2 (enExample) 1992-08-25
EP0103337B1 (en) 1986-08-06
NL8203521A (nl) 1984-04-02
JPS5965432A (ja) 1984-04-13
US4499177A (en) 1985-02-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee