JPS5965432A - 半導体デバイスの製造方法 - Google Patents

半導体デバイスの製造方法

Info

Publication number
JPS5965432A
JPS5965432A JP58164282A JP16428283A JPS5965432A JP S5965432 A JPS5965432 A JP S5965432A JP 58164282 A JP58164282 A JP 58164282A JP 16428283 A JP16428283 A JP 16428283A JP S5965432 A JPS5965432 A JP S5965432A
Authority
JP
Japan
Prior art keywords
irradiation
layer
lacquer layer
lacquer
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58164282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0452937B2 (enExample
Inventor
フランシスカス・アントニウス・フオレンブロツク
エリザベス・ヤコバ・スピエルツ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPS5965432A publication Critical patent/JPS5965432A/ja
Publication of JPH0452937B2 publication Critical patent/JPH0452937B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP58164282A 1982-09-10 1983-09-08 半導体デバイスの製造方法 Granted JPS5965432A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8203521A NL8203521A (nl) 1982-09-10 1982-09-10 Werkwijze voor het vervaardigen van een inrichting.
NL8203521 1982-09-10

Publications (2)

Publication Number Publication Date
JPS5965432A true JPS5965432A (ja) 1984-04-13
JPH0452937B2 JPH0452937B2 (enExample) 1992-08-25

Family

ID=19840255

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58164282A Granted JPS5965432A (ja) 1982-09-10 1983-09-08 半導体デバイスの製造方法

Country Status (5)

Country Link
US (1) US4499177A (enExample)
EP (1) EP0103337B1 (enExample)
JP (1) JPS5965432A (enExample)
DE (1) DE3365143D1 (enExample)
NL (1) NL8203521A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61220328A (ja) * 1985-03-22 1986-09-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リフト・オフ・マスクの製造方法
JPS6313035A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd パタ−ン形成方法
JPH01149040A (ja) * 1987-12-07 1989-06-12 Matsushita Electric Ind Co Ltd パターン形成方法
JPH0769616B2 (ja) * 1984-08-13 1995-07-31 エイ・ティ・アンド・ティ グローバル インフォメーション ソルーションズ インターナショナル インコーポレイテッド ホトレジスト層の形成方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
US4859573A (en) * 1984-08-13 1989-08-22 Ncr Corporation Multiple photoresist layer process using selective hardening
DE3524411A1 (de) * 1985-07-09 1987-01-15 Kernforschungsz Karlsruhe Verfahren zum herstellen von spinnduesenplatten
ZA872295B (enExample) * 1986-03-13 1987-09-22
WO1988007705A1 (en) * 1987-03-27 1988-10-06 Horsell Graphic Industries Limited Processing of exposed lithographic printing plates
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
US4826754A (en) * 1987-04-27 1989-05-02 Microelectronics Center Of North Carolina Method for anisotropically hardening a protective coating for integrated circuit manufacture
US5064748A (en) * 1987-04-27 1991-11-12 Mcnc Method for anisotropically hardening a protective coating for integrated circuit manufacture

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492801A (en) * 1977-12-30 1979-07-23 Ibm Photolithographic method
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
NL8001561A (nl) * 1980-03-17 1981-10-16 Philips Nv Werkwijze voor het vervaardigen van een inrichting met behulp van een maskerpatroon.
DE3028308A1 (de) * 1980-07-25 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von reliefstrukturen aus strahlungsempfindlichen lacken auf einem substrat, insbesondere fuer die herstellung von integrierten halbleiterschaltungen
GB2082339B (en) * 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5492801A (en) * 1977-12-30 1979-07-23 Ibm Photolithographic method
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0769616B2 (ja) * 1984-08-13 1995-07-31 エイ・ティ・アンド・ティ グローバル インフォメーション ソルーションズ インターナショナル インコーポレイテッド ホトレジスト層の形成方法
JPS61220328A (ja) * 1985-03-22 1986-09-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リフト・オフ・マスクの製造方法
JPS6313035A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd パタ−ン形成方法
JPH01149040A (ja) * 1987-12-07 1989-06-12 Matsushita Electric Ind Co Ltd パターン形成方法

Also Published As

Publication number Publication date
EP0103337A1 (en) 1984-03-21
DE3365143D1 (en) 1986-09-11
JPH0452937B2 (enExample) 1992-08-25
EP0103337B1 (en) 1986-08-06
NL8203521A (nl) 1984-04-02
US4499177A (en) 1985-02-12

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