NL8200838A - Werkwijze voor het opbrengen van een laag door kathodeverstuiving en inrichting voor het uitvoeren van deze werkwijze. - Google Patents

Werkwijze voor het opbrengen van een laag door kathodeverstuiving en inrichting voor het uitvoeren van deze werkwijze. Download PDF

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Publication number
NL8200838A
NL8200838A NL8200838A NL8200838A NL8200838A NL 8200838 A NL8200838 A NL 8200838A NL 8200838 A NL8200838 A NL 8200838A NL 8200838 A NL8200838 A NL 8200838A NL 8200838 A NL8200838 A NL 8200838A
Authority
NL
Netherlands
Prior art keywords
electrode
cathode
magnetic field
substrate
discharge
Prior art date
Application number
NL8200838A
Other languages
English (en)
Dutch (nl)
Original Assignee
Leybold Heraeus Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Gmbh & Co Kg filed Critical Leybold Heraeus Gmbh & Co Kg
Publication of NL8200838A publication Critical patent/NL8200838A/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
NL8200838A 1981-03-02 1982-03-02 Werkwijze voor het opbrengen van een laag door kathodeverstuiving en inrichting voor het uitvoeren van deze werkwijze. NL8200838A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3107914 1981-03-02
DE19813107914 DE3107914A1 (de) 1981-03-02 1981-03-02 Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung

Publications (1)

Publication Number Publication Date
NL8200838A true NL8200838A (nl) 1982-10-01

Family

ID=6126163

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8200838A NL8200838A (nl) 1981-03-02 1982-03-02 Werkwijze voor het opbrengen van een laag door kathodeverstuiving en inrichting voor het uitvoeren van deze werkwijze.

Country Status (11)

Country Link
US (3) US4426267A (ja)
JP (1) JPS57203773A (ja)
AT (1) AT378971B (ja)
BE (1) BE892326A (ja)
CH (1) CH657381A5 (ja)
DE (1) DE3107914A1 (ja)
FR (1) FR2500852B1 (ja)
GB (1) GB2093866B (ja)
IT (1) IT1150221B (ja)
NL (1) NL8200838A (ja)
SE (1) SE455602B (ja)

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JP2643149B2 (ja) * 1987-06-03 1997-08-20 株式会社ブリヂストン 表面処理方法
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US4963524A (en) * 1987-09-24 1990-10-16 Semiconductor Energy Laboratory Co., Ltd. Sputtering device for manufacturing superconducting oxide material and method therefor
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US4872905A (en) * 1988-05-11 1989-10-10 The United States Of America As Represented By The United States Department Of Energy Method of producing non-agglomerating submicron size particles
US4911810A (en) * 1988-06-21 1990-03-27 Brown University Modular sputtering apparatus
DE3837487A1 (de) * 1988-11-04 1990-05-10 Leybold Ag Verfahren und vorrichtung zum aetzen von substraten mit einer magnetfeldunterstuetzten niederdruck-entladung
JPH02217467A (ja) * 1989-02-17 1990-08-30 Pioneer Electron Corp 対向ターゲット型スパッタリング装置
US5075181A (en) * 1989-05-05 1991-12-24 Kennametal Inc. High hardness/high compressive stress multilayer coated tool
US5234560A (en) * 1989-08-14 1993-08-10 Hauzer Holdings Bv Method and device for sputtering of films
DE4009151A1 (de) * 1990-03-22 1991-09-26 Leybold Ag Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
DE4011515C1 (en) * 1990-04-10 1990-12-13 W.C. Heraeus Gmbh, 6450 Hanau, De Coating substrate with metal (alloy) - by magnetic sputtering, with substrate mounted on surface held at negative voltage
US5045166A (en) * 1990-05-21 1991-09-03 Mcnc Magnetron method and apparatus for producing high density ionic gas discharge
JPH06501888A (ja) * 1990-09-17 1994-03-03 ケンナメタル インコーポレイテッド Ｃｖｄ及ｐｖｄによりコートされた切削工具
US5232318A (en) * 1990-09-17 1993-08-03 Kennametal Inc. Coated cutting tools
US5250367A (en) * 1990-09-17 1993-10-05 Kennametal Inc. Binder enriched CVD and PVD coated cutting tool
US5266388A (en) * 1990-09-17 1993-11-30 Kennametal Inc. Binder enriched coated cutting tool
US5325747A (en) * 1990-09-17 1994-07-05 Kennametal Inc. Method of machining using coated cutting tools
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten
US5407548A (en) * 1990-10-26 1995-04-18 Leybold Aktiengesellschaft Method for coating a substrate of low resistance to corrosion
DE4123274C2 (de) * 1991-07-13 1996-12-19 Leybold Ag Vorrichtung zum Beschichten von Bauteilen bzw. Formteilen durch Kathodenzerstäubung
DE4203080A1 (de) * 1991-07-31 1993-08-05 Leybold Ag Vorrichtung fuer die waermebehandlung und den transport von substraten
US5244559A (en) * 1991-07-31 1993-09-14 Leybold Aktiengesellschaft Apparatus for transport and heat treatment of substrates
DE4125334C2 (de) * 1991-07-31 1999-08-19 Leybold Ag Vorrichtung für den Transport von Substraten
DE4205017A1 (de) * 1992-02-19 1993-08-26 Leybold Ag Verfahren zur erzeugung einer dekorativen goldlegierungsschicht
CA2137471A1 (en) 1992-06-26 1994-01-06 Tugrul Yasar Transport system for wafer processing line
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5279723A (en) * 1992-07-30 1994-01-18 As Represented By The United States Department Of Energy Filtered cathodic arc source
EP1029945A1 (de) * 1999-02-17 2000-08-23 Balzers Aktiengesellschaft Verfahren zum Beschichten von Werkzeugen
US6245435B1 (en) 1999-03-01 2001-06-12 Moen Incorporated Decorative corrosion and abrasion resistant coating
US6352626B1 (en) 1999-04-19 2002-03-05 Von Zweck Heimart Sputter ion source for boron and other targets
US6998331B2 (en) * 2000-09-15 2006-02-14 Technology Ventures, Llc Methods for fabricating three dimensional anisotropic thin films and products produced thereby
US6541392B2 (en) * 2000-09-15 2003-04-01 Technology Ventures, L.L.C. Method for fabricating three dimensional anisotropic thin films
US7026057B2 (en) 2002-01-23 2006-04-11 Moen Incorporated Corrosion and abrasion resistant decorative coating
SE526857C2 (sv) * 2003-12-22 2005-11-08 Seco Tools Ab Sätt att belägga ett skärverktyg med användning av reaktiv magnetronsputtering
KR101083110B1 (ko) * 2004-08-30 2011-11-11 엘지디스플레이 주식회사 가스 분사 어셈블리를 구비한 스퍼터링 장비
US8759084B2 (en) * 2010-01-22 2014-06-24 Michael J. Nichols Self-sterilizing automated incubator
JP2019052371A (ja) 2017-09-14 2019-04-04 エフ・ハー・エル・アンラーゲンバウ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング ３ｄサブストレートを均一にコーティングするための方法及び装置

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FR2329763A1 (fr) * 1975-10-30 1977-05-27 Physique Appliquee Ind Perfectionnements apportes aux procedes de depot de films minces sur des supports
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Also Published As

Publication number Publication date
DE3107914C2 (ja) 1992-03-12
IT8219920A0 (it) 1982-03-02
ATA47082A (de) 1985-03-15
DE3107914A1 (de) 1982-09-16
FR2500852A1 (ja) 1982-09-03
FR2500852B1 (ja) 1988-07-22
US4544468A (en) 1985-10-01
JPH0211669B2 (ja) 1990-03-15
CH657381A5 (de) 1986-08-29
GB2093866B (en) 1985-07-10
IT1150221B (it) 1986-12-10
GB2093866A (en) 1982-09-08
US4426267A (en) 1984-01-17
JPS57203773A (en) 1982-12-14
SE455602B (sv) 1988-07-25
USRE33530E (en) 1991-02-05
SE8200697L (sv) 1982-09-03
BE892326A (fr) 1982-09-01
AT378971B (de) 1985-10-25

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Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: LEYBOLD AKTIENGESELLSCHAFT TE HANAU A.D. MAIN

BN A decision not to publish the application has become irrevocable