SE455602B - Forfarande och anordning for beskiktning av en eller flera formdelar genom katodforstoftning - Google Patents

Forfarande och anordning for beskiktning av en eller flera formdelar genom katodforstoftning

Info

Publication number
SE455602B
SE455602B SE8200697A SE8200697A SE455602B SE 455602 B SE455602 B SE 455602B SE 8200697 A SE8200697 A SE 8200697A SE 8200697 A SE8200697 A SE 8200697A SE 455602 B SE455602 B SE 455602B
Authority
SE
Sweden
Prior art keywords
target
cathode
sputtering
substrate
magnetic field
Prior art date
Application number
SE8200697A
Other languages
English (en)
Swedish (sv)
Other versions
SE8200697L (sv
Inventor
W-D Munz
G Hessberger
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Publication of SE8200697L publication Critical patent/SE8200697L/
Publication of SE455602B publication Critical patent/SE455602B/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE8200697A 1981-03-02 1982-02-08 Forfarande och anordning for beskiktning av en eller flera formdelar genom katodforstoftning SE455602B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813107914 DE3107914A1 (de) 1981-03-02 1981-03-02 Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung

Publications (2)

Publication Number Publication Date
SE8200697L SE8200697L (sv) 1982-09-03
SE455602B true SE455602B (sv) 1988-07-25

Family

ID=6126163

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8200697A SE455602B (sv) 1981-03-02 1982-02-08 Forfarande och anordning for beskiktning av en eller flera formdelar genom katodforstoftning

Country Status (11)

Country Link
US (3) US4426267A (ja)
JP (1) JPS57203773A (ja)
AT (1) AT378971B (ja)
BE (1) BE892326A (ja)
CH (1) CH657381A5 (ja)
DE (1) DE3107914A1 (ja)
FR (1) FR2500852B1 (ja)
GB (1) GB2093866B (ja)
IT (1) IT1150221B (ja)
NL (1) NL8200838A (ja)
SE (1) SE455602B (ja)

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DE3107914A1 (de) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung
FR2558485B1 (fr) * 1984-01-25 1990-07-13 Rech Applic Electrochimique Structure metallique poreuse, son procede de fabrication et applications
JPS60221563A (ja) * 1984-04-17 1985-11-06 Ulvac Corp バイアススパッタ方法
DE3426795A1 (de) * 1984-07-20 1986-01-23 Battelle-Institut E.V., 6000 Frankfurt Verfahren zur herstellung von hochverschleissfesten titannitrid-schichten
JPS6134177A (ja) * 1984-07-25 1986-02-18 Tokuda Seisakusho Ltd マグネツト駆動装置
US4591418A (en) * 1984-10-26 1986-05-27 The Parker Pen Company Microlaminated coating
JPS61168922A (ja) 1985-01-17 1986-07-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション プラズマ・エツチング装置
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AT388752B (de) * 1986-04-30 1989-08-25 Plansee Metallwerk Verfahren zur herstellung eines targets fuer die kathodenzerstaeubung
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US4738761A (en) * 1986-10-06 1988-04-19 Microelectronics Center Of North Carolina Shared current loop, multiple field apparatus and process for plasma processing
JP2613201B2 (ja) * 1987-01-23 1997-05-21 株式会社日立製作所 スパツタリング方法
DE3706218A1 (de) * 1987-02-26 1988-09-08 Werner Prof Dr Weisweiler Vorrichtung und verfahren zur kontinuierlichen beschichtung der einzelnen fasern eines faserbuendels mit oberflaechenschuetzenden und haftvermittelnden carbid- oder plasmapolymer-filmen
FR2612204A1 (fr) * 1987-03-12 1988-09-16 Vac Tec Syst Procede et appareil pour le depot par un plasma d'arc electrique sous vide de revetements decoratifs et de revetements resistant a l'usure
US4820393A (en) * 1987-05-11 1989-04-11 Tosoh Smd, Inc. Titanium nitride sputter targets
JP2643149B2 (ja) * 1987-06-03 1997-08-20 株式会社ブリヂストン 表面処理方法
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
EP0308680A1 (de) * 1987-09-21 1989-03-29 THELEN, Alfred, Dr. Vorrichtung zum Kathodenzerstäuben
US4963524A (en) * 1987-09-24 1990-10-16 Semiconductor Energy Laboratory Co., Ltd. Sputtering device for manufacturing superconducting oxide material and method therefor
DE3802852A1 (de) * 1988-02-01 1989-08-03 Leybold Ag Einrichtung fuer die beschichtung eines substrats mit einem material, das aus einem plasma gewonnen wird
US4872905A (en) * 1988-05-11 1989-10-10 The United States Of America As Represented By The United States Department Of Energy Method of producing non-agglomerating submicron size particles
US4911810A (en) * 1988-06-21 1990-03-27 Brown University Modular sputtering apparatus
DE3837487A1 (de) * 1988-11-04 1990-05-10 Leybold Ag Verfahren und vorrichtung zum aetzen von substraten mit einer magnetfeldunterstuetzten niederdruck-entladung
JPH02217467A (ja) * 1989-02-17 1990-08-30 Pioneer Electron Corp 対向ターゲット型スパッタリング装置
US5075181A (en) * 1989-05-05 1991-12-24 Kennametal Inc. High hardness/high compressive stress multilayer coated tool
US5234560A (en) * 1989-08-14 1993-08-10 Hauzer Holdings Bv Method and device for sputtering of films
DE4009151A1 (de) * 1990-03-22 1991-09-26 Leybold Ag Vorrichtung zum beschichten von substraten durch katodenzerstaeubung
DE4011515C1 (en) * 1990-04-10 1990-12-13 W.C. Heraeus Gmbh, 6450 Hanau, De Coating substrate with metal (alloy) - by magnetic sputtering, with substrate mounted on surface held at negative voltage
US5045166A (en) * 1990-05-21 1991-09-03 Mcnc Magnetron method and apparatus for producing high density ionic gas discharge
US5232318A (en) * 1990-09-17 1993-08-03 Kennametal Inc. Coated cutting tools
US5266388A (en) * 1990-09-17 1993-11-30 Kennametal Inc. Binder enriched coated cutting tool
US5325747A (en) * 1990-09-17 1994-07-05 Kennametal Inc. Method of machining using coated cutting tools
DE69129857T2 (de) * 1990-09-17 1999-01-14 Kennametal Inc Cvd- und pvd-beschichtete schneidwerkzeuge
US5250367A (en) * 1990-09-17 1993-10-05 Kennametal Inc. Binder enriched CVD and PVD coated cutting tool
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten
US5407548A (en) * 1990-10-26 1995-04-18 Leybold Aktiengesellschaft Method for coating a substrate of low resistance to corrosion
DE4123274C2 (de) * 1991-07-13 1996-12-19 Leybold Ag Vorrichtung zum Beschichten von Bauteilen bzw. Formteilen durch Kathodenzerstäubung
DE4125334C2 (de) * 1991-07-31 1999-08-19 Leybold Ag Vorrichtung für den Transport von Substraten
US5244559A (en) * 1991-07-31 1993-09-14 Leybold Aktiengesellschaft Apparatus for transport and heat treatment of substrates
DE4203080A1 (de) * 1991-07-31 1993-08-05 Leybold Ag Vorrichtung fuer die waermebehandlung und den transport von substraten
DE4205017A1 (de) * 1992-02-19 1993-08-26 Leybold Ag Verfahren zur erzeugung einer dekorativen goldlegierungsschicht
JPH07508617A (ja) 1992-06-26 1995-09-21 マティリアルズ　リサーチ　コーポレイション ウエハ処理工程ラインのための輸送装置
US5279723A (en) * 1992-07-30 1994-01-18 As Represented By The United States Department Of Energy Filtered cathodic arc source
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
EP1029945A1 (de) * 1999-02-17 2000-08-23 Balzers Aktiengesellschaft Verfahren zum Beschichten von Werkzeugen
US6245435B1 (en) 1999-03-01 2001-06-12 Moen Incorporated Decorative corrosion and abrasion resistant coating
US6352626B1 (en) 1999-04-19 2002-03-05 Von Zweck Heimart Sputter ion source for boron and other targets
US6541392B2 (en) * 2000-09-15 2003-04-01 Technology Ventures, L.L.C. Method for fabricating three dimensional anisotropic thin films
US6998331B2 (en) * 2000-09-15 2006-02-14 Technology Ventures, Llc Methods for fabricating three dimensional anisotropic thin films and products produced thereby
US7026057B2 (en) 2002-01-23 2006-04-11 Moen Incorporated Corrosion and abrasion resistant decorative coating
SE526857C2 (sv) * 2003-12-22 2005-11-08 Seco Tools Ab Sätt att belägga ett skärverktyg med användning av reaktiv magnetronsputtering
KR101083110B1 (ko) * 2004-08-30 2011-11-11 엘지디스플레이 주식회사 가스 분사 어셈블리를 구비한 스퍼터링 장비
US8759084B2 (en) * 2010-01-22 2014-06-24 Michael J. Nichols Self-sterilizing automated incubator
JP2019052371A (ja) 2017-09-14 2019-04-04 エフ・ハー・エル・アンラーゲンバウ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング ３ｄサブストレートを均一にコーティングするための方法及び装置

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US3400066A (en) * 1965-11-15 1968-09-03 Ibm Sputtering processes for depositing thin films of controlled thickness
DK120734B (da) * 1969-03-17 1971-07-05 Disa Elektronik As Fremgangsmåde til pålægning af tyndfilm ved ionforstøvning på et tyndt, trådformet, elektrisk isolerende substrat samt apparat til udøvelse af fremgangsmåden.
FR2098563A5 (ja) * 1970-07-10 1972-03-10 Progil
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DE2541719C3 (de) * 1975-09-18 1980-10-16 Vjatscheslav Michajlovitsch Goljanov Einrichtung zur Herstellung von Schichten durch Kathodenzerstäubung von Werkstoffen mittels Ionen
FR2329763A1 (fr) * 1975-10-30 1977-05-27 Physique Appliquee Ind Perfectionnements apportes aux procedes de depot de films minces sur des supports
CH611938A5 (ja) * 1976-05-19 1979-06-29 Battelle Memorial Institute
DE2705225C2 (de) * 1976-06-07 1983-03-24 Nobuo Tokyo Nishida Ornamentteil für Uhren usw.
US4151064A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Apparatus for sputtering cylinders
DE2842993C2 (de) * 1978-10-02 1986-06-19 Pfaff Industriemaschinen Gmbh, 6750 Kaiserslautern Vorrichtung mit einer Nähmaschine zum kantenparallelen Umnähen der Kanten langgestreckter Werkstücke
DE2844491C2 (de) * 1978-10-12 1983-04-14 Leybold-Heraeus GmbH, 5000 Köln Vakuum-Beschichtungsanlage mit einer Einrichtung zum kontinuierlichen Substrattransport
US4183797A (en) * 1978-12-22 1980-01-15 International Business Machines Corporation Two-sided bias sputter deposition method and apparatus
DE3002194A1 (de) 1980-01-22 1981-07-23 Berna AG Olten, Olten Vorrichtung zur (teil) beschichtung eines substrates durch kathodenzerstaeubung, vefahren zur beschichtung und deren anwendung
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DE3107914A1 (de) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung

Also Published As

Publication number Publication date
USRE33530E (en) 1991-02-05
IT1150221B (it) 1986-12-10
DE3107914C2 (ja) 1992-03-12
GB2093866A (en) 1982-09-08
CH657381A5 (de) 1986-08-29
JPS57203773A (en) 1982-12-14
IT8219920A0 (it) 1982-03-02
US4544468A (en) 1985-10-01
FR2500852A1 (ja) 1982-09-03
JPH0211669B2 (ja) 1990-03-15
AT378971B (de) 1985-10-25
DE3107914A1 (de) 1982-09-16
GB2093866B (en) 1985-07-10
NL8200838A (nl) 1982-10-01
ATA47082A (de) 1985-03-15
SE8200697L (sv) 1982-09-03
BE892326A (fr) 1982-09-01
US4426267A (en) 1984-01-17
FR2500852B1 (ja) 1988-07-22

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