NL2010797C2 - Charged particle lithography system and beam generator. - Google Patents

Charged particle lithography system and beam generator. Download PDF

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Publication number
NL2010797C2
NL2010797C2 NL2010797A NL2010797A NL2010797C2 NL 2010797 C2 NL2010797 C2 NL 2010797C2 NL 2010797 A NL2010797 A NL 2010797A NL 2010797 A NL2010797 A NL 2010797A NL 2010797 C2 NL2010797 C2 NL 2010797C2
Authority
NL
Netherlands
Prior art keywords
generator
cavity
chamber
pumps
shielding device
Prior art date
Application number
NL2010797A
Other languages
English (en)
Dutch (nl)
Other versions
NL2010797A (en
Inventor
Alexander Hendrik Vincent Veen
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Publication of NL2010797A publication Critical patent/NL2010797A/en
Application granted granted Critical
Publication of NL2010797C2 publication Critical patent/NL2010797C2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0262—Shields electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0264—Shields magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Sources, Ion Sources (AREA)
NL2010797A 2012-05-14 2013-05-14 Charged particle lithography system and beam generator. NL2010797C2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261646839P 2012-05-14 2012-05-14
US201261646839 2012-05-14

Publications (2)

Publication Number Publication Date
NL2010797A NL2010797A (en) 2013-11-18
NL2010797C2 true NL2010797C2 (en) 2014-08-21

Family

ID=48463976

Family Applications (4)

Application Number Title Priority Date Filing Date
NL2010802A NL2010802C2 (en) 2012-05-14 2013-05-14 Charged particle lithography system and beam generator.
NL2010797A NL2010797C2 (en) 2012-05-14 2013-05-14 Charged particle lithography system and beam generator.
NL2013320A NL2013320C2 (en) 2012-05-14 2014-08-12 Charged particle lithography system and beam generator.
NL2013321A NL2013321C2 (en) 2012-05-14 2014-08-12 Charged particle lithography system and beam generator.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL2010802A NL2010802C2 (en) 2012-05-14 2013-05-14 Charged particle lithography system and beam generator.

Family Applications After (2)

Application Number Title Priority Date Filing Date
NL2013320A NL2013320C2 (en) 2012-05-14 2014-08-12 Charged particle lithography system and beam generator.
NL2013321A NL2013321C2 (en) 2012-05-14 2014-08-12 Charged particle lithography system and beam generator.

Country Status (8)

Country Link
US (2) US9653261B2 (enExample)
EP (1) EP2852966A1 (enExample)
JP (3) JP6219374B2 (enExample)
KR (2) KR101961914B1 (enExample)
CN (3) CN104520968B (enExample)
NL (4) NL2010802C2 (enExample)
TW (2) TWI604493B (enExample)
WO (2) WO2013171214A1 (enExample)

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JP6779788B2 (ja) * 2014-06-13 2020-11-04 インテル・コーポレーション リアルタイムアラインメント方法、カラム、コンピュータプログラム及びコンピュータ可読記憶媒体
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JP2021039880A (ja) * 2019-09-03 2021-03-11 株式会社日立ハイテク 荷電粒子線装置
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Also Published As

Publication number Publication date
CN104520968A (zh) 2015-04-15
TW201401331A (zh) 2014-01-01
US20150124229A1 (en) 2015-05-07
JP6430606B2 (ja) 2018-11-28
KR101961914B1 (ko) 2019-03-25
KR20150010994A (ko) 2015-01-29
JP2015517735A (ja) 2015-06-22
NL2010802A (en) 2013-11-18
WO2013171229A1 (en) 2013-11-21
CN104428866A (zh) 2015-03-18
NL2013320A (en) 2014-11-24
KR20150010993A (ko) 2015-01-29
NL2013321C2 (en) 2015-05-07
CN107359101A (zh) 2017-11-17
JP6239596B2 (ja) 2017-11-29
EP2852966A1 (en) 2015-04-01
CN104520968B (zh) 2017-07-07
JP2018041964A (ja) 2018-03-15
JP6219374B2 (ja) 2017-10-25
CN107359101B (zh) 2019-07-12
NL2010802C2 (en) 2014-08-25
US20170250053A1 (en) 2017-08-31
TW201401330A (zh) 2014-01-01
KR102023056B1 (ko) 2019-09-20
NL2010797A (en) 2013-11-18
JP2015516690A (ja) 2015-06-11
NL2013321A (en) 2014-11-06
NL2013320C2 (en) 2015-06-15
US10037864B2 (en) 2018-07-31
WO2013171214A1 (en) 2013-11-21
US9653261B2 (en) 2017-05-16
TWI604493B (zh) 2017-11-01

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