NL1036292A1 - Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. - Google Patents
Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. Download PDFInfo
- Publication number
- NL1036292A1 NL1036292A1 NL1036292A NL1036292A NL1036292A1 NL 1036292 A1 NL1036292 A1 NL 1036292A1 NL 1036292 A NL1036292 A NL 1036292A NL 1036292 A NL1036292 A NL 1036292A NL 1036292 A1 NL1036292 A1 NL 1036292A1
- Authority
- NL
- Netherlands
- Prior art keywords
- positioning device
- controller
- controlling
- apparatus provided
- lithographic apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G16—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS
- G16Z—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS, NOT OTHERWISE PROVIDED FOR
- G16Z99/00—Subject matter not provided for in other main groups of this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7092—Signal processing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US814607P | 2007-12-19 | 2007-12-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL1036292A1 true NL1036292A1 (nl) | 2009-06-22 |
Family
ID=40908278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1036292A NL1036292A1 (nl) | 2007-12-19 | 2008-12-08 | Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. |
Country Status (3)
Country | Link |
---|---|
US (2) | US8135488B2 (nl) |
JP (2) | JP4891307B2 (nl) |
NL (1) | NL1036292A1 (nl) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1036292A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. |
US20120319637A1 (en) * | 2011-06-20 | 2012-12-20 | Nikon Corporation | Synchronization control devices and methods |
EP3415988A1 (en) * | 2017-06-14 | 2018-12-19 | ASML Netherlands B.V. | Device manufacturing methods |
KR102698693B1 (ko) * | 2019-04-17 | 2024-08-23 | 에이에스엠엘 네델란즈 비.브이. | 디바이스 제조 프로세스를 위한 방법 |
CN110221626B (zh) * | 2019-06-06 | 2022-03-25 | 睿魔智能科技(深圳)有限公司 | 一种跟拍控制方法、装置、计算机设备及存储介质 |
CN111367073B (zh) * | 2020-04-29 | 2022-03-29 | 中国科学院光电技术研究所 | 一种基于位置修正模式的单检测复合轴控制系统设计方法 |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2264904B1 (nl) * | 1974-03-21 | 1977-08-19 | Inst Textile De France | |
JPH0738136B2 (ja) * | 1988-08-22 | 1995-04-26 | 三菱電機株式会社 | 位置決め制御装置 |
JP2566033B2 (ja) * | 1990-02-08 | 1996-12-25 | 三菱電機株式会社 | 外乱抑圧制御システム |
US5302158A (en) * | 1992-11-24 | 1994-04-12 | Eaton Corporation | Lubricant pumping in tandem drive axles |
JP3823417B2 (ja) * | 1997-02-06 | 2006-09-20 | 株式会社ニコン | 露光装置及び露光方法 |
JPH11168048A (ja) * | 1997-12-03 | 1999-06-22 | Nikon Corp | 露光方法及び露光装置 |
JP2000021738A (ja) * | 1998-06-26 | 2000-01-21 | Nikon Corp | 位置検出装置及び該装置を用いた位置検出方法 |
JP2000100721A (ja) * | 1998-07-21 | 2000-04-07 | Nikon Corp | 走査露光方法および走査型露光装置ならびにデバイスの製造方法 |
JP2000347741A (ja) * | 1999-06-07 | 2000-12-15 | Nikon Corp | ステージ制御装置、ステージ装置、及び露光装置 |
US6618219B1 (en) * | 1999-10-12 | 2003-09-09 | Seagate Technology Llc | Method and apparatus for feedforward cancellation using a peak detector |
JP2002112585A (ja) * | 2000-09-29 | 2002-04-12 | Nikon Corp | モータ駆動装置および露光装置 |
JP2002126964A (ja) * | 2000-10-23 | 2002-05-08 | Hitachi Ltd | 位置決めステージの制御装置 |
US6766339B2 (en) * | 2001-01-11 | 2004-07-20 | Asml Holding N.V. | Method and system for efficient and accurate filtering and interpolation |
US6732004B2 (en) * | 2001-02-26 | 2004-05-04 | Asml Netherlands B.V. | Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured thereby |
EP1243969A1 (en) * | 2001-03-20 | 2002-09-25 | Asm Lithography B.V. | Lithographic projection apparatus and positioning system |
EP1265104A1 (en) * | 2001-06-06 | 2002-12-11 | ASML Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2003141833A (ja) * | 2001-11-05 | 2003-05-16 | Matsushita Electric Ind Co Ltd | ヘッド位置決め装置、およびこれを用いたディスク装置 |
JP2003264134A (ja) * | 2002-03-08 | 2003-09-19 | Nikon Corp | ステージ制御装置、露光装置、及びデバイス製造方法 |
KR100545294B1 (ko) * | 2002-05-10 | 2006-01-24 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치, 디바이스 제조방법, 성능측정방법,캘리브레이션 방법 및 컴퓨터 프로그램 |
JP3970091B2 (ja) * | 2002-05-15 | 2007-09-05 | キヤノン株式会社 | 制御装置 |
JP4106487B2 (ja) * | 2002-10-24 | 2008-06-25 | 株式会社日立グローバルストレージテクノロジーズ | 位置決め制御装置 |
US7209219B2 (en) * | 2003-03-06 | 2007-04-24 | Asml Netherlands B.V. | System for controlling a position of a mass |
JP2004311904A (ja) * | 2003-04-10 | 2004-11-04 | Nikon Corp | ステージ制御装置及び露光装置 |
US7181296B2 (en) * | 2003-08-06 | 2007-02-20 | Asml Netherlands B.V. | Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method |
US7113256B2 (en) * | 2004-02-18 | 2006-09-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method with feed-forward focus control |
US7084958B2 (en) * | 2004-04-14 | 2006-08-01 | Asml Netherlands B.V. | Lithographic apparatus, control system and device manufacturing method |
US7289858B2 (en) * | 2004-05-25 | 2007-10-30 | Asml Netherlands B.V. | Lithographic motion control system and method |
US7307262B2 (en) * | 2004-12-23 | 2007-12-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7265813B2 (en) * | 2004-12-28 | 2007-09-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7468782B2 (en) * | 2005-04-25 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus, position quantity controller and control method with feedforward signal |
KR20080033401A (ko) * | 2005-07-15 | 2008-04-16 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 에러 보정 방법 및 시스템 |
JP2007081078A (ja) * | 2005-09-14 | 2007-03-29 | Nikon Corp | 制御システム及び露光装置 |
US7446854B2 (en) * | 2006-02-07 | 2008-11-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7774287B2 (en) * | 2006-03-14 | 2010-08-10 | Asml Netherlands B.V. | System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method |
US7453228B2 (en) * | 2006-04-07 | 2008-11-18 | Asml Netherlands B.V. | Method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device |
US7818073B2 (en) | 2006-04-20 | 2010-10-19 | Asml Netherlands B.V. | Method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method |
NL1036292A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device. |
-
2008
- 2008-12-08 NL NL1036292A patent/NL1036292A1/nl active Search and Examination
- 2008-12-10 US US12/331,829 patent/US8135488B2/en active Active
- 2008-12-17 JP JP2008320578A patent/JP4891307B2/ja active Active
-
2011
- 2011-11-21 JP JP2011254107A patent/JP5483480B2/ja active Active
-
2012
- 2012-02-08 US US13/369,163 patent/US8452442B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012074718A (ja) | 2012-04-12 |
US8452442B2 (en) | 2013-05-28 |
US8135488B2 (en) | 2012-03-13 |
JP4891307B2 (ja) | 2012-03-07 |
US20120143367A1 (en) | 2012-06-07 |
JP5483480B2 (ja) | 2014-05-07 |
JP2009152604A (ja) | 2009-07-09 |
US20090244767A1 (en) | 2009-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BRPI0820623A2 (pt) | Método e aparelho para controlar um teclado de um dispositivo | |
EP2220807A4 (en) | SYSTEM AND METHOD FOR CONTROLLING CHARACTERISTICS ON A DEVICE | |
HK1152149A1 (en) | Stage apparatus, patterning apparatus, exposure apparatus, stage drive apparatus, exposure method, and device fabrication method | |
EP2219206A4 (en) | CONTROL DEVICE, EXPOSURE METHOD AND EXPOSURE DEVICE | |
EP2066077A4 (en) | SYSTEM, DEVICE AND METHOD FOR CONTROLLING TRANSMISSION MODE CHANGE | |
FI20050279A0 (fi) | Menetelmä kuljetusjärjestelmän hallitsemiseksi | |
EP2213224A4 (en) | DIAGNOSTIC SUPPORT DEVICE, METHOD FOR CONTROLLING DIAGNOSTIC SUPPORT DEVICE, AND PROGRAM THEREOF | |
IL207506A0 (en) | Metrology method and apparatus, lithographic apparatus, and device manufacturing method | |
NL2003256A1 (nl) | Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. | |
FI20085758A0 (fi) | Ohjelmallisesti määritetty radiolaite, menetelmä ohjelmiston korjaamiseksi ja ohjelmallisesti määritetty radiojärjestelmä | |
EP2093015A4 (en) | PART POSITIONING METHOD AND POSITIONING DEVICE | |
NL1032598A1 (nl) | Inrichting, systeem en werkwijze voor het besturen van een verwarmingssysteem. | |
NL2003157A1 (nl) | Radiation source, lithographic apparatus, and device manufacturing method. | |
BRPI0916285A2 (pt) | dispositivo de controle para controlar a localização de um animal, e, método para controlar a localização de um animal. | |
IL194580A0 (en) | Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method | |
NL2003310A1 (nl) | Radiation source, lithographic apparatus and device manufacturing method. | |
NL1035770A1 (nl) | Lithographic apparatus and thermal optical manipulator control method. | |
NL2003084A1 (nl) | Correction method for non-uniform reticle heating in a lithographic apparatus. | |
TWI369588B (en) | Stage apparatus, method for controlling the same, exposure apparatus, and method for manufacturing device | |
NL1036277A1 (nl) | Lithographic apparatus, stage system and stage control method. | |
NL2002016A1 (nl) | Exposure apparatus and method for photolithography process. | |
BRPI0918102A2 (pt) | método para controlar um sistema para produzir oxigênio líquido, dispositivo para produzir oxigênio líquido | |
NL2003152A1 (nl) | Radiation source, lithographic apparatus and device manufacturing method. | |
WO2009025271A2 (ja) | ロボットの制御装置および制御方法 | |
NL2002999A1 (nl) | Lithographic apparatus and device manufacturing method. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed |