NL1016333C2 - Elektronenstraalschrijfwerkwijze, elektronenstraallithografie-inrichting, en masker gebruikt in de werkwijze en inrichting. - Google Patents

Elektronenstraalschrijfwerkwijze, elektronenstraallithografie-inrichting, en masker gebruikt in de werkwijze en inrichting. Download PDF

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Publication number
NL1016333C2
NL1016333C2 NL1016333A NL1016333A NL1016333C2 NL 1016333 C2 NL1016333 C2 NL 1016333C2 NL 1016333 A NL1016333 A NL 1016333A NL 1016333 A NL1016333 A NL 1016333A NL 1016333 C2 NL1016333 C2 NL 1016333C2
Authority
NL
Netherlands
Prior art keywords
electron beam
mask
sub
pattern
regions
Prior art date
Application number
NL1016333A
Other languages
English (en)
Dutch (nl)
Other versions
NL1016333A1 (nl
Inventor
Ken Nakajima
Original Assignee
Nec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Corp filed Critical Nec Corp
Publication of NL1016333A1 publication Critical patent/NL1016333A1/xx
Application granted granted Critical
Publication of NL1016333C2 publication Critical patent/NL1016333C2/nl

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31764—Dividing into sub-patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31766—Continuous moving of wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31769—Proximity effect correction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1016333A 1999-10-05 2000-10-05 Elektronenstraalschrijfwerkwijze, elektronenstraallithografie-inrichting, en masker gebruikt in de werkwijze en inrichting. NL1016333C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28451299 1999-10-05
JP28451299A JP3360662B2 (ja) 1999-10-05 1999-10-05 電子線ビーム描画方法および電子線ビーム描画用マスク

Publications (2)

Publication Number Publication Date
NL1016333A1 NL1016333A1 (nl) 2001-04-06
NL1016333C2 true NL1016333C2 (nl) 2002-10-29

Family

ID=17679469

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1016333A NL1016333C2 (nl) 1999-10-05 2000-10-05 Elektronenstraalschrijfwerkwijze, elektronenstraallithografie-inrichting, en masker gebruikt in de werkwijze en inrichting.

Country Status (6)

Country Link
US (1) US6503671B1 (ja)
JP (1) JP3360662B2 (ja)
KR (1) KR100389725B1 (ja)
CN (1) CN1290960A (ja)
NL (1) NL1016333C2 (ja)
TW (1) TW460936B (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100459697B1 (ko) * 2001-12-27 2004-12-04 삼성전자주식회사 가변적인 후방 산란 계수를 이용하는 전자빔 노광 방법 및이를 기록한 컴퓨터로 읽을 수 있는 기록 매체
FR2843462B1 (fr) 2002-08-06 2004-09-24 Thales Sa Procede de fabrication d'une matrice active, dispositifs de visualisation electro-optiques et masque correspondant
US7419894B2 (en) * 2002-08-28 2008-09-02 Fujitsu Limited Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereof
JP4614696B2 (ja) * 2004-06-24 2011-01-19 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
JP4718145B2 (ja) * 2004-08-31 2011-07-06 富士通株式会社 半導体装置及びゲート電極の製造方法
JP5063071B2 (ja) * 2006-02-14 2012-10-31 株式会社ニューフレアテクノロジー パタン作成方法及び荷電粒子ビーム描画装置
JP4378648B2 (ja) * 2006-10-06 2009-12-09 エルピーダメモリ株式会社 照射パターンデータ作成方法、マスク製造方法、及び描画システム
JP2009237001A (ja) * 2008-03-26 2009-10-15 Fujifilm Corp 電子ビーム描画方法、微細パターン描画システム、凹凸パターン担持体の製造方法および磁気ディスク媒体の製造方法
JP5258051B2 (ja) * 2009-04-03 2013-08-07 株式会社ブイ・テクノロジー 露光方法及び露光装置
JP5498106B2 (ja) * 2009-09-15 2014-05-21 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
JP5498105B2 (ja) 2009-09-15 2014-05-21 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
CN101872134B (zh) * 2010-06-09 2012-05-23 中国科学院半导体研究所 一种提高电子束曝光效率的方法
DE102010061178A1 (de) * 2010-12-13 2012-06-14 Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh Chromatischer Energiefilter
JP5797454B2 (ja) * 2011-05-20 2015-10-21 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP6107059B2 (ja) * 2012-11-02 2017-04-05 富士通セミコンダクター株式会社 レイアウトパターンの補正方法
JP5960198B2 (ja) 2013-07-02 2016-08-02 キヤノン株式会社 パターン形成方法、リソグラフィ装置、リソグラフィシステムおよび物品製造方法
JP2016154241A (ja) * 2013-07-02 2016-08-25 キヤノン株式会社 パターン形成方法、リソグラフィ装置、リソグラフィシステムおよび物品製造方法
JP7430094B2 (ja) * 2020-03-27 2024-02-09 日本電子株式会社 荷電粒子線描画装置および描画方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667923A (en) * 1993-09-08 1997-09-16 Fujitsu Limited Charged particle beam exposure compensating proximity effect
US5856677A (en) * 1995-08-14 1999-01-05 Nikon Corporation Pattern projection method with charged particle beam and charged particle beam projection system

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07106216A (ja) 1993-09-30 1995-04-21 Hitachi Ltd 偏向信号発生装置
JPH08236428A (ja) 1995-03-01 1996-09-13 Nikon Corp 荷電粒子線露光方法及びそれに用いるマスク
JP3431336B2 (ja) 1995-03-20 2003-07-28 株式会社東芝 電子ビーム露光装置および電子ビーム露光での近接効果補正方法
JPH09180978A (ja) 1995-12-27 1997-07-11 Nikon Corp 近接効果補正方法
JPH11204422A (ja) * 1998-01-14 1999-07-30 Nikon Corp 荷電粒子線転写方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667923A (en) * 1993-09-08 1997-09-16 Fujitsu Limited Charged particle beam exposure compensating proximity effect
US5856677A (en) * 1995-08-14 1999-01-05 Nikon Corporation Pattern projection method with charged particle beam and charged particle beam projection system

Also Published As

Publication number Publication date
NL1016333A1 (nl) 2001-04-06
JP2001110700A (ja) 2001-04-20
KR100389725B1 (ko) 2003-06-27
CN1290960A (zh) 2001-04-11
TW460936B (en) 2001-10-21
US6503671B1 (en) 2003-01-07
KR20010040009A (ko) 2001-05-15
JP3360662B2 (ja) 2002-12-24

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AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20020626

PD2B A search report has been drawn up
SD Assignments of patents

Owner name: NEC ELECTRONICS CORPORATION

VD1 Lapsed due to non-payment of the annual fee

Effective date: 20050501