NL1014997C2 - Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan. - Google Patents

Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan. Download PDF

Info

Publication number
NL1014997C2
NL1014997C2 NL1014997A NL1014997A NL1014997C2 NL 1014997 C2 NL1014997 C2 NL 1014997C2 NL 1014997 A NL1014997 A NL 1014997A NL 1014997 A NL1014997 A NL 1014997A NL 1014997 C2 NL1014997 C2 NL 1014997C2
Authority
NL
Netherlands
Prior art keywords
chemical formula
anthracene
acrylate
polymer
methyl
Prior art date
Application number
NL1014997A
Other languages
English (en)
Dutch (nl)
Other versions
NL1014997A1 (nl
Inventor
Min-Ho Jung
Sung-Eun Hong
Ki-Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of NL1014997A1 publication Critical patent/NL1014997A1/xx
Application granted granted Critical
Publication of NL1014997C2 publication Critical patent/NL1014997C2/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/017—Esters of hydroxy compounds having the esterified hydroxy group bound to a carbon atom of a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/24—Anthracenes; Hydrogenated anthracenes
NL1014997A 1999-04-23 2000-04-20 Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan. NL1014997C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-1999-0014763A KR100395904B1 (ko) 1999-04-23 1999-04-23 유기 반사방지 중합체 및 그의 제조방법
KR19990014763 1999-07-23

Publications (2)

Publication Number Publication Date
NL1014997A1 NL1014997A1 (nl) 2000-10-24
NL1014997C2 true NL1014997C2 (nl) 2001-06-26

Family

ID=19582078

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1014997A NL1014997C2 (nl) 1999-04-23 2000-04-20 Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan.

Country Status (10)

Country Link
US (2) US6368768B1 (US06368768-20020409-C00052.png)
JP (1) JP3851476B2 (US06368768-20020409-C00052.png)
KR (1) KR100395904B1 (US06368768-20020409-C00052.png)
CN (1) CN1215094C (US06368768-20020409-C00052.png)
DE (2) DE19962784A1 (US06368768-20020409-C00052.png)
FR (4) FR2792633B1 (US06368768-20020409-C00052.png)
GB (1) GB2349148B (US06368768-20020409-C00052.png)
IT (1) IT1308674B1 (US06368768-20020409-C00052.png)
NL (1) NL1014997C2 (US06368768-20020409-C00052.png)
TW (1) TW546318B (US06368768-20020409-C00052.png)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6528235B2 (en) 1991-11-15 2003-03-04 Shipley Company, L.L.C. Antihalation compositions
US6773864B1 (en) * 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
US6472128B2 (en) * 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법
KR100427440B1 (ko) * 1999-12-23 2004-04-17 주식회사 하이닉스반도체 유기 반사방지 화합물 및 그의 제조방법
KR100355604B1 (ko) * 1999-12-23 2002-10-12 주식회사 하이닉스반도체 난반사 방지막용 중합체와 그 제조방법
KR100549574B1 (ko) * 1999-12-30 2006-02-08 주식회사 하이닉스반도체 유기 반사 방지막용 중합체 및 그의 제조방법
US6686124B1 (en) * 2000-03-14 2004-02-03 International Business Machines Corporation Multifunctional polymeric materials and use thereof
KR100687851B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687850B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100574486B1 (ko) * 2000-06-30 2006-04-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
TW576949B (en) 2000-08-17 2004-02-21 Shipley Co Llc Antireflective coatings with increased etch rates
KR100734249B1 (ko) * 2000-09-07 2007-07-02 삼성전자주식회사 축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
US6605394B2 (en) 2001-05-03 2003-08-12 Applied Materials, Inc. Organic bottom antireflective coating for high performance mask making using optical imaging
KR20020090489A (ko) * 2001-05-28 2002-12-05 금호석유화학 주식회사 화학증폭형 레지스트용 중합체 및 이를 함유한 화학증폭형레지스트 조성물
KR100351459B1 (ko) * 2001-05-30 2002-09-05 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100351458B1 (ko) * 2001-05-30 2002-09-05 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
US6703169B2 (en) 2001-07-23 2004-03-09 Applied Materials, Inc. Method of preparing optically imaged high performance photomasks
JP2004206082A (ja) * 2002-11-20 2004-07-22 Rohm & Haas Electronic Materials Llc 多層フォトレジスト系
EP1422566A1 (en) * 2002-11-20 2004-05-26 Shipley Company, L.L.C. Multilayer photoresist systems
US7361447B2 (en) 2003-07-30 2008-04-22 Hynix Semiconductor Inc. Photoresist polymer and photoresist composition containing the same
KR100636938B1 (ko) * 2003-09-29 2006-10-19 주식회사 하이닉스반도체 포토레지스트 조성물
JP2005314453A (ja) * 2004-04-27 2005-11-10 Sumitomo Chemical Co Ltd アクリル樹脂及び該樹脂を含有する粘着剤
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
EP1762895B1 (en) * 2005-08-29 2016-02-24 Rohm and Haas Electronic Materials, L.L.C. Antireflective Hard Mask Compositions
KR100703007B1 (ko) 2005-11-17 2007-04-06 삼성전자주식회사 감광성 유기 반사 방지막 형성용 조성물 및 이를 이용한패턴 형성 방법
KR100871770B1 (ko) * 2007-09-12 2008-12-05 주식회사 효성 안트라세닐 벤질기 발색단을 포함하는 공중합체, 상기공중합체의 제조방법, 상기 공중합체를 포함하는유기반사방지막 조성물 및 상기 조성물을 포함하는유기반사방지막
KR100920886B1 (ko) * 2007-12-13 2009-10-09 주식회사 효성 현상 가능한 유기 반사방지막 형성용 조성물 및 이로부터형성된 유기 반사방지막
KR100952465B1 (ko) * 2007-12-18 2010-04-13 제일모직주식회사 방향족 (메타)아크릴레이트 화합물 및 감광성 고분자, 및레지스트 조성물
KR101585992B1 (ko) * 2007-12-20 2016-01-19 삼성전자주식회사 반사방지 코팅용 고분자, 반사방지 코팅용 조성물 및 이를 이용한 반도체 장치의 패턴 형성 방법
KR100975913B1 (ko) * 2008-10-31 2010-08-13 한국전자통신연구원 유기 박막 트랜지스터용 조성물, 이를 이용하여 형성된 유기 박막 트랜지스터 및 그 형성방법
CN105732883B (zh) * 2016-03-01 2018-07-03 中国科学技术大学 一种发射室温磷光的水性聚丙烯酸酯的制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2013214A (en) * 1978-01-27 1979-08-08 Eastman Kodak Co Photocrosslinkable Composition
US4315089A (en) * 1978-11-11 1982-02-09 Basf Aktiengesellschaft Polymers containing aromatic aldehyde groups
EP0418917A2 (en) * 1989-09-22 1991-03-27 National Starch and Chemical Investment Holding Corporation Monomers and polymers containing acetal and aldehyde groups
US5558978A (en) * 1993-12-21 1996-09-24 Ocg Microelectronic Materials, Inc. Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
FR2736061A1 (fr) * 1995-06-27 1997-01-03 Thomson Csf Materiau electroluminescent a base de polymere, procede de fabrication et diode electroluminescente utilisant ce materiau
EP0813114A2 (en) * 1996-06-11 1997-12-17 Shipley Company LLC Antireflective coating compositions
EP0834770A2 (en) * 1996-10-07 1998-04-08 Shipley Company LLC Dyed photoresists and methods and articles of manufacture comprising same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822718A (en) 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
US5674648A (en) 1984-08-06 1997-10-07 Brewer Science, Inc. Anti-reflective coating
DE3528930A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch
US5258477A (en) * 1989-09-22 1993-11-02 National Starch And Chemical Investment Holding Corporation Monomers and polymers containing acetal and aldehyde groups
JP2881969B2 (ja) * 1990-06-05 1999-04-12 富士通株式会社 放射線感光レジストとパターン形成方法
JP3579946B2 (ja) * 1995-02-13 2004-10-20 Ｊｓｒ株式会社 化学増幅型感放射線性樹脂組成物
CA2205099A1 (en) * 1996-05-24 1997-11-24 Patricia Marie Lesko Fluorescent polymers and coating compositions
US5981145A (en) * 1997-04-30 1999-11-09 Clariant Finance (Bvi) Limited Light absorbing polymers
TW457403B (en) * 1998-07-03 2001-10-01 Clariant Int Ltd Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2013214A (en) * 1978-01-27 1979-08-08 Eastman Kodak Co Photocrosslinkable Composition
US4315089A (en) * 1978-11-11 1982-02-09 Basf Aktiengesellschaft Polymers containing aromatic aldehyde groups
EP0418917A2 (en) * 1989-09-22 1991-03-27 National Starch and Chemical Investment Holding Corporation Monomers and polymers containing acetal and aldehyde groups
US5558978A (en) * 1993-12-21 1996-09-24 Ocg Microelectronic Materials, Inc. Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
FR2736061A1 (fr) * 1995-06-27 1997-01-03 Thomson Csf Materiau electroluminescent a base de polymere, procede de fabrication et diode electroluminescente utilisant ce materiau
EP0813114A2 (en) * 1996-06-11 1997-12-17 Shipley Company LLC Antireflective coating compositions
EP0834770A2 (en) * 1996-10-07 1998-04-08 Shipley Company LLC Dyed photoresists and methods and articles of manufacture comprising same

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
DATABASE CHEMABS [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; ISHII, TADAHIRO ET AL: "Photodecomposition of copolymers between 9-anthrylmethyl methacrylate and methyl methacrylate by XeF excimer laser irradiation", XP002151923, retrieved from STN Database accession no. 122:42486 *
DATABASE COMPENDEX [online] ENGINEERING INFORMATION, INC., NEW YORK, NY, US; PADMANABAN MUNIRATHNA ET AL: "Bottom anti-reflective coatings for ArF, KrF, and i-line applications: A comparison of theory, design, and lithographic aspects", XP002151924, Database accession no. EIX99404758530 *
HARGREAVES J. S., WEBBER S. E.: "Photophysics of Anthracene Polymers: Fluorescence, Singlet Energy Migration, and photodegradation", MACROMOLECULES, vol. 17, no. 1, 1984, pages 235 - 240, XP002151922 *
J. PHOTOCHEM. PHOTOBIOL., A (1994), 83(1), 55-62 *
PROCEEDINGS OF THE 1999 MICROLITHOGRAPHY - ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI;SANTA CLARA, CA, USA MAR 15-MAR 17 1999, vol. 3678, no. I, 1999, Proc SPIE Int Soc Opt Eng;Proceedings of SPIE - The International Society for Optical Engineering 1999 Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, USA, pages 550 - 561 *

Also Published As

Publication number Publication date
JP2001098024A (ja) 2001-04-10
ITTO991099A0 (it) 1999-12-15
US6368768B1 (en) 2002-04-09
DE19964382B4 (de) 2008-08-14
FR2793254A1 (fr) 2000-11-10
ITTO991099A1 (it) 2001-06-15
US20020132183A1 (en) 2002-09-19
GB9927833D0 (en) 2000-01-26
KR100395904B1 (ko) 2003-08-27
DE19962784A1 (de) 2000-10-26
IT1308674B1 (it) 2002-01-09
FR2792633A1 (fr) 2000-10-27
FR2793254B1 (fr) 2006-09-22
GB2349148B (en) 2004-08-04
FR2793244A1 (fr) 2000-11-10
CN1215094C (zh) 2005-08-17
GB2349148A (en) 2000-10-25
TW546318B (en) 2003-08-11
FR2793255B1 (fr) 2006-09-22
NL1014997A1 (nl) 2000-10-24
FR2792633B1 (fr) 2007-06-08
CN1271720A (zh) 2000-11-01
FR2793255A1 (fr) 2000-11-10
JP3851476B2 (ja) 2006-11-29
KR20000067184A (ko) 2000-11-15

Similar Documents

Publication Publication Date Title
NL1014997C2 (nl) Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan.
NL1014639C2 (nl) Organisch anti-reflecterend deklaagmateriaal en de bereiding hiervan.
NL1015471C2 (nl) Organisch anti-reflecterend polymeer en werkwijze voor de bereiding hiervan.
JP3860411B2 (ja) 乱反射防止膜用重合体とその製造方法
KR20010057923A (ko) 난반사 방지막용 중합체와 그 제조방법
KR100549574B1 (ko) 유기 반사 방지막용 중합체 및 그의 제조방법
NL1016942C2 (nl) Organisch antireflecterend deklaagpolymeer en bereiding hiervan.
US6803172B2 (en) Organic anti-reflective coating material and preparation thereof
US6599678B2 (en) Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof
US6486283B2 (en) Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof
US6602650B2 (en) Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
KR100687851B1 (ko) 유기반사방지막 조성물 및 그의 제조방법
TW593365B (en) Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and preparation methods thereof
KR100351458B1 (ko) 유기 반사방지 중합체 및 그의 제조방법
FR2803850A1 (fr) Composition de revetement anti-reflechissant, procede de preparation et dispositif a semiconducteur
KR100400242B1 (ko) 유기난반사방지중합체및그의제조방법
KR100351459B1 (ko) 유기 반사방지 중합체 및 그의 제조방법
TWI302537B (en) Organic anti-reflective coating compound, anti-reflective coating composition comprising the same and preparation methods thereof
JP2009179648A (ja) 屈折率変化性組成物、屈折率パターンの形成方法、屈折率パターンおよび光学材料
KR20030070417A (ko) Ｎ-히드록시페닐말레이미드 함유 내열성 고분자, 이를포함하는 반사 방지막 조성물 및 이들의 제조방법

Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20010423

PD2B A search report has been drawn up
V1 Lapsed because of non-payment of the annual fee

Effective date: 20101101