NL1007216C2 - Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper. - Google Patents

Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper. Download PDF

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Publication number
NL1007216C2
NL1007216C2 NL1007216A NL1007216A NL1007216C2 NL 1007216 C2 NL1007216 C2 NL 1007216C2 NL 1007216 A NL1007216 A NL 1007216A NL 1007216 A NL1007216 A NL 1007216A NL 1007216 C2 NL1007216 C2 NL 1007216C2
Authority
NL
Netherlands
Prior art keywords
exposure step
stamper
photoresist
additional
additional exposure
Prior art date
Application number
NL1007216A
Other languages
English (en)
Dutch (nl)
Inventor
Walter Theodorus Matheus Stals
Thomas Wilhelmus Engelen
Jacobus Joannes Tho Vermeijlen
Original Assignee
Od & Me Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Od & Me Bv filed Critical Od & Me Bv
Priority to NL1007216A priority Critical patent/NL1007216C2/nl
Priority to PCT/NL1998/000576 priority patent/WO1999018572A1/fr
Priority to US09/529,011 priority patent/US6423477B1/en
Priority to EP98949249A priority patent/EP1027702B1/fr
Priority to AU95606/98A priority patent/AU9560698A/en
Priority to US10/608,502 priority patent/USRE39434E1/en
Priority to DE69805322T priority patent/DE69805322T2/de
Application granted granted Critical
Publication of NL1007216C2 publication Critical patent/NL1007216C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
    • G11B23/0064—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material
    • G11B23/0085—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material intermediate mediums using a photosensitive material, e.g. photo-resist
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
NL1007216A 1997-10-07 1997-10-07 Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper. NL1007216C2 (nl)

Priority Applications (7)

Application Number Priority Date Filing Date Title
NL1007216A NL1007216C2 (nl) 1997-10-07 1997-10-07 Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper.
PCT/NL1998/000576 WO1999018572A1 (fr) 1997-10-07 1998-10-07 Procede de fabrication d'une matrice de pressage permettant de produire des disques optiques, matrice de pressage fabriquee selon ce procede, et disque optique fabrique au moyen de cette matrice
US09/529,011 US6423477B1 (en) 1997-10-07 1998-10-07 Method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper
EP98949249A EP1027702B1 (fr) 1997-10-07 1998-10-07 Procede de fabrication d'une matrice de pressage permettant de produire des disques optiques, matrice de pressage fabriquee selon ce procede, et disque optique fabrique au moyen de cette matrice
AU95606/98A AU9560698A (en) 1997-10-07 1998-10-07 Method of manufacturing a stamper for producing optical discs, a stamper th us obtained and an optical disc obtained by using such stamper
US10/608,502 USRE39434E1 (en) 1997-10-07 1998-10-07 Method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper
DE69805322T DE69805322T2 (de) 1997-10-07 1998-10-07 Verfahren zur herstellung einer matrize zur erzeugung optischer platten, so erhaltene matrize sowie dadurch erzeugte optische platte

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1007216A NL1007216C2 (nl) 1997-10-07 1997-10-07 Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper.
NL1007216 1997-10-07

Publications (1)

Publication Number Publication Date
NL1007216C2 true NL1007216C2 (nl) 1999-04-08

Family

ID=19765797

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1007216A NL1007216C2 (nl) 1997-10-07 1997-10-07 Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper.

Country Status (6)

Country Link
US (2) US6423477B1 (fr)
EP (1) EP1027702B1 (fr)
AU (1) AU9560698A (fr)
DE (1) DE69805322T2 (fr)
NL (1) NL1007216C2 (fr)
WO (1) WO1999018572A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1009106C2 (nl) 1998-05-08 1999-11-09 Od & Me Bv Werkwijze voor het vervaardigen van een stamper, stamper verkregen volgens een dergelijke werkwijze alsmede optische schijf verkregen onder toepassing van een dergelijke stamper.
JP3104699B1 (ja) 1999-06-01 2000-10-30 株式会社ニコン 細溝付き成形基板の製造方法
NL1015524C2 (nl) 2000-06-26 2001-12-28 Otb Group Bv Werkwijze ter vervaardiging van een substraat om te worden toegepast in een stampervervaardigingsproces, alsmede substraat verkregen volgens een dergelijke werkwijze.
FR2826494B1 (fr) 2001-06-26 2003-10-10 Francois Xavier Pirot Procede de fabrication d'une matrice de disques optiques
US7344825B2 (en) * 2002-04-04 2008-03-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device, and developing apparatus using the method
US6943124B1 (en) * 2002-07-17 2005-09-13 Taiwan Semiconductor Manufacturing Company Two step exposure to strengthen structure of polyimide or negative tone photosensitive material
US7875419B2 (en) * 2002-10-29 2011-01-25 Semiconductor Energy Laboratory Co., Ltd. Method for removing resist pattern and method for manufacturing semiconductor device
EP1513144A2 (fr) * 2003-08-26 2005-03-09 Matsushita Electric Industrial Co., Ltd. Procédé de fabrication d'un disque maítre pour support d'enregistrement, procédé de fabrication d'une matrice, procédé de fabrication de support d'enregistrement, disque maítre pour support d'enregistrement, matrice pour support d'enregistrement, et support d'enregistrement
US7115488B2 (en) * 2003-08-29 2006-10-03 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0667608A1 (fr) * 1994-02-14 1995-08-16 ODME International B.V. Procédé pour la fabrication d'une matrice pour la préparation des disques optiques sans intervention d'un disque maître

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173285A (ja) * 1988-12-24 1990-07-04 Nippon Columbia Co Ltd スタンパの製造方法
JP3428064B2 (ja) * 1993-04-20 2003-07-22 ソニー株式会社 光ディスク基板の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0667608A1 (fr) * 1994-02-14 1995-08-16 ODME International B.V. Procédé pour la fabrication d'une matrice pour la préparation des disques optiques sans intervention d'un disque maître
NL9400225A (nl) * 1994-02-14 1995-09-01 Od & Me Bv Werkwijze voor het zonder tussenkomst van een master vervaardigen van een stamper voor het voortbrengen van optische schijven.

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
"Photoresist Stabilization System", SOLID STATE TECHNOLOGY, vol. 27, no. 7, June 1984 (1984-06-01), WASHINGTON, NEW YORK, USA, pages 45 - 46, XP002067936 *
ALLEN R ET AL: "DEEP U.V. HARDENING OF POSITIVE POLTORESIST PATTERNS", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 29, no. 6, June 1982 (1982-06-01), pages 1379 - 1381, XP002047660 *
HIRAOKA & PACANSKY: "UV-Hardening of Resist Patterns", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 24, no. 3, August 1981 (1981-08-01), pages 1468, XP002067935 *

Also Published As

Publication number Publication date
DE69805322D1 (de) 2002-06-13
DE69805322T2 (de) 2002-11-21
USRE39434E1 (en) 2006-12-19
WO1999018572A1 (fr) 1999-04-15
US6423477B1 (en) 2002-07-23
EP1027702A1 (fr) 2000-08-16
EP1027702B1 (fr) 2002-05-08
AU9560698A (en) 1999-04-27

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Effective date: 20040501