DE69805322D1 - Verfahren zur herstellung einer matrize zur erzeugung optischer platten, so erhaltene matrize sowie dadurch erzeugte optische platte - Google Patents

Verfahren zur herstellung einer matrize zur erzeugung optischer platten, so erhaltene matrize sowie dadurch erzeugte optische platte

Info

Publication number
DE69805322D1
DE69805322D1 DE69805322T DE69805322T DE69805322D1 DE 69805322 D1 DE69805322 D1 DE 69805322D1 DE 69805322 T DE69805322 T DE 69805322T DE 69805322 T DE69805322 T DE 69805322T DE 69805322 D1 DE69805322 D1 DE 69805322D1
Authority
DE
Germany
Prior art keywords
matrice
producing
produced
optical disc
optical disks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69805322T
Other languages
English (en)
Other versions
DE69805322T2 (de
Inventor
Wilhelmus Engelen
Theodorus Stals
Joannes Vermeijlen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Singulus Mastering BV
Original Assignee
OTB Group BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OTB Group BV filed Critical OTB Group BV
Application granted granted Critical
Publication of DE69805322D1 publication Critical patent/DE69805322D1/de
Publication of DE69805322T2 publication Critical patent/DE69805322T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
    • G11B23/0064—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material
    • G11B23/0085—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture mediums or carriers characterised by the selection of the material intermediate mediums using a photosensitive material, e.g. photo-resist
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69805322T 1997-10-07 1998-10-07 Verfahren zur herstellung einer matrize zur erzeugung optischer platten, so erhaltene matrize sowie dadurch erzeugte optische platte Expired - Lifetime DE69805322T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1007216A NL1007216C2 (nl) 1997-10-07 1997-10-07 Werkwijze voor het vervaardigen van een stamper voor het voortbrengen van optische schijven, aldus verkregen stamper en optische schijf verkregen onder toepassing van een dergelijke stamper.
PCT/NL1998/000576 WO1999018572A1 (en) 1997-10-07 1998-10-07 A method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper

Publications (2)

Publication Number Publication Date
DE69805322D1 true DE69805322D1 (de) 2002-06-13
DE69805322T2 DE69805322T2 (de) 2002-11-21

Family

ID=19765797

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69805322T Expired - Lifetime DE69805322T2 (de) 1997-10-07 1998-10-07 Verfahren zur herstellung einer matrize zur erzeugung optischer platten, so erhaltene matrize sowie dadurch erzeugte optische platte

Country Status (6)

Country Link
US (2) US6423477B1 (de)
EP (1) EP1027702B1 (de)
AU (1) AU9560698A (de)
DE (1) DE69805322T2 (de)
NL (1) NL1007216C2 (de)
WO (1) WO1999018572A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1009106C2 (nl) 1998-05-08 1999-11-09 Od & Me Bv Werkwijze voor het vervaardigen van een stamper, stamper verkregen volgens een dergelijke werkwijze alsmede optische schijf verkregen onder toepassing van een dergelijke stamper.
JP3104699B1 (ja) 1999-06-01 2000-10-30 株式会社ニコン 細溝付き成形基板の製造方法
NL1015524C2 (nl) * 2000-06-26 2001-12-28 Otb Group Bv Werkwijze ter vervaardiging van een substraat om te worden toegepast in een stampervervaardigingsproces, alsmede substraat verkregen volgens een dergelijke werkwijze.
FR2826494B1 (fr) * 2001-06-26 2003-10-10 Francois Xavier Pirot Procede de fabrication d'une matrice de disques optiques
US7344825B2 (en) 2002-04-04 2008-03-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device, and developing apparatus using the method
US6943124B1 (en) * 2002-07-17 2005-09-13 Taiwan Semiconductor Manufacturing Company Two step exposure to strengthen structure of polyimide or negative tone photosensitive material
US7875419B2 (en) * 2002-10-29 2011-01-25 Semiconductor Energy Laboratory Co., Ltd. Method for removing resist pattern and method for manufacturing semiconductor device
EP1513144A2 (de) * 2003-08-26 2005-03-09 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung einer Masterplatte eines Aufzeichnungsmediums, Verfahren zur Herstellung einer Matrize, Verfahren zur Herstellung eines Aufzeichnungsmediums, Masterplatte eines Aufzeichnungsmediums, Matrize eines Aufzeichnungsmediums, und Aufzeichnungsmedium
US7115488B2 (en) * 2003-08-29 2006-10-03 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173285A (ja) * 1988-12-24 1990-07-04 Nippon Columbia Co Ltd スタンパの製造方法
JP3428064B2 (ja) * 1993-04-20 2003-07-22 ソニー株式会社 光ディスク基板の製造方法
NL9400225A (nl) * 1994-02-14 1995-09-01 Od & Me Bv Werkwijze voor het zonder tussenkomst van een master vervaardigen van een stamper voor het voortbrengen van optische schijven.

Also Published As

Publication number Publication date
DE69805322T2 (de) 2002-11-21
WO1999018572A1 (en) 1999-04-15
AU9560698A (en) 1999-04-27
NL1007216C2 (nl) 1999-04-08
EP1027702B1 (de) 2002-05-08
US6423477B1 (en) 2002-07-23
USRE39434E1 (en) 2006-12-19
EP1027702A1 (de) 2000-08-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SINGULUS MASTERING B.V., EINDHOVEN, NL

8328 Change in the person/name/address of the agent

Representative=s name: VOSSIUS & PARTNER, 81675 MUENCHEN