NL1001687C2 - Indiumoxyde/tinoxyde-sputtertarget voor kathoden-verstuiving. - Google Patents

Indiumoxyde/tinoxyde-sputtertarget voor kathoden-verstuiving. Download PDF

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Publication number
NL1001687C2
NL1001687C2 NL1001687A NL1001687A NL1001687C2 NL 1001687 C2 NL1001687 C2 NL 1001687C2 NL 1001687 A NL1001687 A NL 1001687A NL 1001687 A NL1001687 A NL 1001687A NL 1001687 C2 NL1001687 C2 NL 1001687C2
Authority
NL
Netherlands
Prior art keywords
sputtering
tin oxide
sputtering target
oxide
powder
Prior art date
Application number
NL1001687A
Other languages
English (en)
Dutch (nl)
Other versions
NL1001687A1 (nl
Inventor
Martin Schlott
Wolfgang Dauth
Martin Kutzner
Bruce Gehman
Shawn Vahlstrom
Original Assignee
Leybold Materials Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Materials Gmbh filed Critical Leybold Materials Gmbh
Publication of NL1001687A1 publication Critical patent/NL1001687A1/xx
Application granted granted Critical
Publication of NL1001687C2 publication Critical patent/NL1001687C2/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C04B35/6455—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
NL1001687A 1995-03-11 1995-11-17 Indiumoxyde/tinoxyde-sputtertarget voor kathoden-verstuiving. NL1001687C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19508898A DE19508898A1 (de) 1995-03-11 1995-03-11 Indiumoxid/Zinnoxid Sputtertarget für die Kathodenzerstäubung
DE19508898 1995-03-11

Publications (2)

Publication Number Publication Date
NL1001687A1 NL1001687A1 (nl) 1996-09-16
NL1001687C2 true NL1001687C2 (nl) 1998-08-11

Family

ID=7756461

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1001687A NL1001687C2 (nl) 1995-03-11 1995-11-17 Indiumoxyde/tinoxyde-sputtertarget voor kathoden-verstuiving.

Country Status (5)

Country Link
US (1) US6187253B1 (de)
JP (1) JPH08260137A (de)
DE (1) DE19508898A1 (de)
FR (1) FR2731441B1 (de)
NL (1) NL1001687C2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2547091A1 (fr) * 2006-05-18 2007-11-18 Hydro Quebec Procede de preparation de ceramiques, ceramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulverisation cathodique
ES2663895T3 (es) 2006-05-18 2018-04-17 Hydro-Quebec Procedimiento de preparación de cerámicas, cerámicas obtenidas de este modo y sus utilizaciones concretamente como diana para pulverización catódica
US9885109B2 (en) * 2012-08-08 2018-02-06 Umicore ITO ceramic sputtering targets with reduced In2O3 contents and method of producing it
DE102016106370A1 (de) * 2016-03-23 2017-09-28 Degudent Gmbh Verfahren zur Herstellung eines eingefärbten Rohlings sowie Rohling

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344465A (ja) * 1989-07-13 1991-02-26 Nippon Mining Co Ltd Ｉｔｏ透明導電膜用スパッタリングターゲットの製造方法
DE4124471C1 (en) * 1991-07-24 1992-06-11 Degussa Ag, 6000 Frankfurt, De Target for cathodic sputtering - produced from partially reduced mixtures of indium oxide and tin oxide by hot pressing in inert protective gas

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3300525A1 (de) * 1983-01-10 1984-07-12 Merck Patent Gmbh, 6100 Darmstadt Targets fuer die kathodenzerstaeubung
EP0342537B1 (de) * 1988-05-16 1995-09-06 Tosoh Corporation Verfahren zur Herstellung eines Sputtertargets zur Erzeugung einer elektrisch leitenden, durchsichtigen Schicht
US5071800A (en) * 1989-02-28 1991-12-10 Tosoh Corporation Oxide powder, sintered body, process for preparation thereof and targe composed thereof
US4962071A (en) * 1989-05-01 1990-10-09 Tektronix, Inc. Method of fabricating a sintered body of indium tin oxide
JPH03207858A (ja) * 1990-01-08 1991-09-11 Nippon Mining Co Ltd Ｉｔｏスパッタリングターゲットの製造方法
US5480531A (en) * 1991-07-24 1996-01-02 Degussa Aktiengesellschaft Target for cathode sputtering and method of its production
EP0584672B1 (de) * 1992-08-19 1996-06-12 Tosoh Corporation Verfahren zur Herstellung eines Indiumoxidpulvers verwendbar für einen ITO-Sinterkörper mit hoher Dichte
US5433901A (en) * 1993-02-11 1995-07-18 Vesuvius Crucible Company Method of manufacturing an ITO sintered body
DE4407774C1 (de) 1994-03-09 1995-04-20 Leybold Materials Gmbh Target für die Kathodenzerstäubung zur Herstellung transparenter, leitfähiger Schichten und Verfahren zu seiner Herstellung
DE4413344A1 (de) * 1994-04-18 1995-10-19 Leybold Materials Gmbh Verfahren zur Herstellung teilreduzierter Indiumoxid-Zinnoxid Targets
DE4427060C1 (de) * 1994-07-29 1995-11-30 Heraeus Gmbh W C Bauteil aus Indium-Zinn-Oxid und Verfahren für seine Herstellung
KR100434646B1 (ko) * 1995-11-08 2004-09-01 도소 가부시키가이샤 소결된ito콤팩트의제조공정

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0344465A (ja) * 1989-07-13 1991-02-26 Nippon Mining Co Ltd Ｉｔｏ透明導電膜用スパッタリングターゲットの製造方法
DE4124471C1 (en) * 1991-07-24 1992-06-11 Degussa Ag, 6000 Frankfurt, De Target for cathodic sputtering - produced from partially reduced mixtures of indium oxide and tin oxide by hot pressing in inert protective gas

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
GEHMAN B L ET AL: "INFLUENCE OF MANUFACTURING PROCESS OF INDIUM TIN OXIDE SPUTTERING TARGETS ON SPUTTERING BEHAVIOR", THIN SOLID FILMS, vol. 220, no. 1 / 02, 20 November 1992 (1992-11-20), pages 333 - 336, XP000354509 *
PATENT ABSTRACTS OF JAPAN vol. 015, no. 181 (C - 0830) 9 May 1991 (1991-05-09) *

Also Published As

Publication number Publication date
FR2731441B1 (fr) 1999-08-06
US6187253B1 (en) 2001-02-13
NL1001687A1 (nl) 1996-09-16
JPH08260137A (ja) 1996-10-08
DE19508898A1 (de) 1996-09-12
FR2731441A1 (fr) 1996-09-13

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RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 19980610

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Effective date: 20050601