NL1001338A1 - 2-Hydroxyfenyltriazinen, werkwijze ter bereiding daarvan alsmede de toepassing van UV-absorbeermiddelen. - Google Patents

2-Hydroxyfenyltriazinen, werkwijze ter bereiding daarvan alsmede de toepassing van UV-absorbeermiddelen.

Info

Publication number
NL1001338A1
NL1001338A1 NL1001338A NL1001338A NL1001338A1 NL 1001338 A1 NL1001338 A1 NL 1001338A1 NL 1001338 A NL1001338 A NL 1001338A NL 1001338 A NL1001338 A NL 1001338A NL 1001338 A1 NL1001338 A1 NL 1001338A1
Authority
NL
Netherlands
Prior art keywords
hydroxyphenyltriazines
absorbers
preparation
Prior art date
Application number
NL1001338A
Other languages
English (en)
Other versions
NL1001338C2 (nl
Inventor
Vien Van Toan
David George Leppard
Gerhard Rytz
Norbert Wuerms
Pascal Hayoz
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of NL1001338A1 publication Critical patent/NL1001338A1/nl
Application granted granted Critical
Publication of NL1001338C2 publication Critical patent/NL1001338C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/26—Nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C08F220/44—Acrylonitrile
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/52—Amides or imides
    • C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F220/56—Acrylamide; Methacrylamide
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F226/08—N-Vinyl-pyrrolidine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F226/10—N-Vinyl-pyrrolidone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C08K5/34926—Triazines also containing heterocyclic groups other than triazine groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Hydrogenated Pyridines (AREA)
NL1001338A 1994-10-04 1995-10-04 2-Hydroxyfenyltriazinen, werkwijze ter bereiding daarvan alsmede de toepassing van UV-absorbeermiddelen. NL1001338C2 (nl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH298994 1994-10-04
CH303994 1994-10-10
CH36495 1995-02-08

Publications (2)

Publication Number Publication Date
NL1001338A1 true NL1001338A1 (nl) 1996-04-04
NL1001338C2 NL1001338C2 (nl) 1996-04-12

Family

ID=27172042

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1001338A NL1001338C2 (nl) 1994-10-04 1995-10-04 2-Hydroxyfenyltriazinen, werkwijze ter bereiding daarvan alsmede de toepassing van UV-absorbeermiddelen.

Country Status (17)

Country Link
US (2) US5672704A (nl)
JP (1) JP4126400B2 (nl)
KR (2) KR960014109A (nl)
CN (1) CN1070186C (nl)
AT (1) AT405515B (nl)
AU (1) AU698297B2 (nl)
BE (1) BE1008871A5 (nl)
BR (1) BR9504276A (nl)
CA (1) CA2159694A1 (nl)
CZ (1) CZ255695A3 (nl)
DE (1) DE19536730A1 (nl)
ES (1) ES2106684B1 (nl)
FR (1) FR2725204B1 (nl)
GB (1) GB2293823B (nl)
IT (1) IT1281195B1 (nl)
NL (1) NL1001338C2 (nl)
SK (1) SK123095A3 (nl)

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DE19735901A1 (de) * 1997-08-19 1999-02-25 Beiersdorf Ag Kosmetische oder dermatologische Lichtschutzmittel, welche als Festkörper vorliegende UV-Filtersubstanzen und polymere UV-Filtersubstanzen auf Siliconbasis enthalten
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US6297377B1 (en) 1998-06-22 2001-10-02 Cytec Technology Corporation Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers
EP1089986B1 (en) 1998-06-22 2005-03-30 Ciba SC Holding AG Poly-trisaryl-1,3,5-triazine carbamate ultraviolet light absorbers
US6239276B1 (en) 1998-06-22 2001-05-29 Cytec Technology Corporation Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers
BR9911448A (pt) * 1998-06-22 2001-03-20 Ciba Sc Holding Ag Absorventes de luz ultravioleta de trisaril-1,3,5-triazinas substituìdas por fenol impedido
AU5907399A (en) * 1998-09-04 2000-03-27 Ciba Specialty Chemicals Holding Inc. Process for making 2,4-dihydroxyphenyl and 2-hydroxy-4-alkoxyphenyl substituted triazine compounds
TWI259182B (en) 1998-11-17 2006-08-01 Cytec Tech Corp Process for preparing triazines using a combination of Lewis acids with reaction promoters
CA2353908A1 (en) * 1998-12-23 2000-07-06 Ciba Specialty Chemicals Holding Inc. Polymeric stabilizers having low polydispersity
US6500887B1 (en) 1999-04-12 2002-12-31 Asahi Denka Kogyo K.K. Polymeric material composition
US6191199B1 (en) * 1999-05-03 2001-02-20 Ciba Speciatly Chemicals Corporation Stabilized adhesive compositions containing highly soluble, high extinction photostable hydroxyphenyl-s-triazine UV absorbers and laminated articles derived therefrom
US6867250B1 (en) 2000-10-30 2005-03-15 Cytec Technology Corp. Non-yellowing ortho-dialkyl aryl substituted triazine ultraviolet light absorbers
US6855269B2 (en) 2001-11-09 2005-02-15 Cytec Technology Corp. Phenyl ether-substituted hydroxyphenyl triazine ultraviolet light absorbers
JP2005510611A (ja) * 2001-11-30 2005-04-21 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド ポリマーネットワーク用２−ヒドロキシフェニル−ｓ−トリアジン架橋剤
JP2004099115A (ja) * 2002-07-16 2004-04-02 Misawa Homes Co Ltd 木質様成形品、製造装置及び製造方法
JP2006513291A (ja) * 2003-01-09 2006-04-20 アルコン，インコーポレイテッド 眼科用レンズ材料のための二重機能性ｕｖ吸収材
US7279527B2 (en) * 2005-04-22 2007-10-09 Bridgestone Corporation Method of converting anionic living end to protected free radical living end and applications thereof
PL1888539T3 (pl) * 2005-06-10 2014-03-31 Basf Se Hydroksyfenylotriazyny z układem skondensowanych aromatycznych pierścieni karbocyklicznych
US20080008620A1 (en) * 2006-06-23 2008-01-10 Alkis Alexiadis Bimodal light bulb and devices for sterilizing and cleansing
US7737218B2 (en) * 2006-12-29 2010-06-15 Bridgestone Corporation Method for generating free radical capable polymers using tin or silicon halide compounds
US7396887B1 (en) * 2006-12-29 2008-07-08 Bridgestone Corporation Insitu removal of chelator from anionic polymerization reactions
US7560509B2 (en) * 2006-12-29 2009-07-14 Bridgestone Corporation Method of directing grafting by controlling the location of high vinyl segments in a polymer
US8030410B2 (en) * 2006-12-29 2011-10-04 Bridgestone Corporation Method for generating free radical capable polymers using carbonyl-containing compounds
US20080157641A1 (en) * 2006-12-31 2008-07-03 Rachael Wren Grout Multi-use Free Standing Seating and Storage Unit
CN101743261B (zh) * 2007-07-13 2013-04-03 昭和电工株式会社 含有三嗪环的高分子化合物和使用该高分子化合物的有机发光元件
JP5675647B2 (ja) 2009-01-19 2015-02-25 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 有機黒色顔料およびその製造
JP5613481B2 (ja) * 2009-07-29 2014-10-22 富士フイルム株式会社 新規なトリアジン誘導体、紫外線吸収剤
JP2012114125A (ja) * 2010-11-19 2012-06-14 Fujifilm Corp 太陽電池封止材及びそれを用いた太陽電池モジュール
WO2013083565A1 (en) * 2011-12-05 2013-06-13 Arizona Chemical Company, Llc Uv-protecting rosin
CN104736258A (zh) 2012-08-23 2015-06-24 拜尔材料科学股份公司 有机uv吸收剂在塑料基底上的气相沉积
KR102194159B1 (ko) 2012-12-20 2020-12-22 쓰리엠 이노베이티브 프로퍼티즈 캄파니 자외선 흡수 기를 갖는 올리고머를 포함하는 플루오로중합체 조성물
WO2014118251A1 (de) 2013-02-01 2014-08-07 Bayer Materialscience Ag Uv-härtbare beschichtungszusammensetzung
WO2014118233A1 (de) * 2013-02-01 2014-08-07 Bayer Material Science Ag Verfahren zur herstellung eines polymerisierbaren uv-absorbers
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
CN106661400B (zh) * 2014-06-25 2018-11-13 3M创新有限公司 包括紫外光吸收低聚物的压敏粘合剂组合物
CN106661365B (zh) 2014-06-25 2019-03-01 3M创新有限公司 包含至少一种低聚物的含氟聚合物组合物
US10519350B2 (en) 2015-06-25 2019-12-31 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same
CN110678448A (zh) * 2017-05-25 2020-01-10 株式会社Adeka 三嗪化合物、固化性组合物、固化物的制造方法及其固化物
CN107935952B (zh) * 2017-12-01 2019-11-15 北京天罡助剂有限责任公司 一种三嗪-5的制备方法

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CH484695A (de) * 1962-10-30 1970-01-31 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Ultraviolettschutzmittel ausserhalb der Textilindustrie
NL130993C (nl) * 1963-02-07
CH469053A (de) * 1963-07-26 1969-02-28 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviolettstrahlung für nichttextile organische Materialien
CH481954A (de) * 1965-11-09 1969-11-30 Ciba Geigy Verfahren zur Herstellung von gegen die Einwirkung ultravioletter Strahlen geschützten Polymeren
CH485484A (de) * 1964-12-04 1970-02-15 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviollettstrahlung für organische Materialien ausserhalb der Textilindustrie
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DE69030362T2 (de) * 1989-12-05 1997-10-23 Ciba Geigy Ag Stabilisiertes organisches Material
ES2077052T3 (es) * 1989-12-21 1995-11-16 Ciba Geigy Ag Procedimiento para la incorporacion de o-hidroxifenil-s-triazinas a polimeros organicos.
US5189084A (en) * 1989-12-21 1993-02-23 Ciba-Geigy Corporation Process for incorporating o-hydroxyphenyl-s-triazines in organic polymers
EP0520938B1 (de) * 1991-06-03 1997-09-24 Ciba SC Holding AG UV-Absorber enthaltendes photographisches Material
EP0530135A1 (de) * 1991-06-03 1993-03-03 Ciba-Geigy Ag UV-Absorber enthaltendes photographisches Material
EP0531258B1 (de) * 1991-09-05 1997-09-10 Ciba SC Holding AG UV-Absorber enthaltendes photographisches Material

Also Published As

Publication number Publication date
CA2159694A1 (en) 1996-04-05
CN1130625A (zh) 1996-09-11
ES2106684B1 (es) 1998-07-01
AU698297B2 (en) 1998-10-29
KR960014109A (ko) 1996-05-22
BR9504276A (pt) 1996-10-01
ATA163695A (de) 1999-01-15
CN1070186C (zh) 2001-08-29
AT405515B (de) 1999-09-27
JP4126400B2 (ja) 2008-07-30
ES2106684A1 (es) 1997-11-01
FR2725204A1 (fr) 1996-04-05
IT1281195B1 (it) 1998-02-17
ITMI952019A1 (it) 1997-04-03
DE19536730A1 (de) 1996-04-11
NL1001338C2 (nl) 1996-04-12
US5869588A (en) 1999-02-09
KR100496131B1 (ko) 2005-06-17
GB9520046D0 (en) 1995-12-06
US5672704A (en) 1997-09-30
JPH08259545A (ja) 1996-10-08
SK123095A3 (en) 1996-06-05
ITMI952019A0 (nl) 1995-10-03
GB2293823B (en) 1997-01-22
BE1008871A5 (fr) 1996-08-06
AU3304995A (en) 1996-04-18
GB2293823A (en) 1996-04-10
CZ255695A3 (en) 1996-04-17
FR2725204B1 (fr) 1997-06-06

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