MX380827B - Blanco de pulverización. - Google Patents

Blanco de pulverización.

Info

Publication number
MX380827B
MX380827B MX2016016573A MX2016016573A MX380827B MX 380827 B MX380827 B MX 380827B MX 2016016573 A MX2016016573 A MX 2016016573A MX 2016016573 A MX2016016573 A MX 2016016573A MX 380827 B MX380827 B MX 380827B
Authority
MX
Mexico
Prior art keywords
target
sputtering
target plate
relates
plate
Prior art date
Application number
MX2016016573A
Other languages
English (en)
Spanish (es)
Other versions
MX2016016573A (es
Inventor
Juerg Hagmann
Peter Polcik
Sabine Wörle
Siegfried Krassnitzer
Original Assignee
Plansee Composite Mat Gmbh
Oerlikon Surface Solutions Ag Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plansee Composite Mat Gmbh, Oerlikon Surface Solutions Ag Pfaeffikon filed Critical Plansee Composite Mat Gmbh
Publication of MX2016016573A publication Critical patent/MX2016016573A/es
Publication of MX380827B publication Critical patent/MX380827B/es

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
MX2016016573A 2014-06-27 2015-06-26 Blanco de pulverización. MX380827B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462017909P 2014-06-27 2014-06-27
PCT/EP2015/001298 WO2015197196A1 (de) 2014-06-27 2015-06-26 Sputtering target

Publications (2)

Publication Number Publication Date
MX2016016573A MX2016016573A (es) 2017-08-18
MX380827B true MX380827B (es) 2025-03-12

Family

ID=53717965

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016016573A MX380827B (es) 2014-06-27 2015-06-26 Blanco de pulverización.

Country Status (10)

Country Link
US (1) US10109468B2 (enExample)
EP (1) EP3161180B1 (enExample)
JP (1) JP6567048B2 (enExample)
KR (2) KR20180135120A (enExample)
CN (1) CN106471151B (enExample)
BR (1) BR112016029142A2 (enExample)
MX (1) MX380827B (enExample)
RU (1) RU2696910C2 (enExample)
TW (1) TWI713457B (enExample)
WO (1) WO2015197196A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT15050U1 (de) * 2015-12-18 2016-11-15 Plansee Composite Mat Gmbh Beschichtungsquelle mit Strukturierung
CN110670030A (zh) * 2019-09-29 2020-01-10 洛阳丰联科绑定技术有限公司 一种ito拼接型靶材的粘结方法
CN111118459A (zh) * 2019-12-30 2020-05-08 有研亿金新材料有限公司 一种高性能铁磁性靶材的制备方法
KR102707659B1 (ko) * 2021-11-17 2024-09-19 바짐테크놀로지 주식회사 스퍼터링 타겟 접합체
CN114434107A (zh) * 2022-02-15 2022-05-06 株洲火炬安泰新材料有限公司 一种提高ito靶材焊合率的生产加工方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209375A (en) * 1979-08-02 1980-06-24 The United States Of America As Represented By The United States Department Of Energy Sputter target
DE2933835C2 (de) * 1979-08-21 1987-02-19 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Befestigen von in Scheiben- oder Plattenform vorliegenden Targetmaterialien auf Kühlteller für Aufstäubanlagen
US4740429A (en) * 1985-07-22 1988-04-26 Ngk Insulators, Ltd. Metal-ceramic joined articles
JPS62278261A (ja) * 1986-05-26 1987-12-03 Seiko Epson Corp スパツタ用タ−ゲツトの製造方法
JPS63216969A (ja) * 1987-03-05 1988-09-09 Daido Steel Co Ltd 加工方法
JPS63241167A (ja) 1987-03-30 1988-10-06 Seiko Epson Corp スパツタリング用タ−ゲツト
RU2091501C1 (ru) * 1991-04-22 1997-09-27 Акционерное общество открытого типа "Всероссийский алюминиево-магниевый институт" Способ изготовления мишени для магнетронного распыления из алюминия особой чистоты
RU2068459C1 (ru) * 1991-06-03 1996-10-27 Центральный научно-исследовательский институт технологии судостроения Способ обработки поверхности изделий из стали и сплавов на основе меди
JPH05214518A (ja) * 1992-02-04 1993-08-24 Hitachi Metals Ltd スパッタリングターゲットとバッキングプレートの接合体の矯正方法およびスパッタリングターゲット材
US7063773B2 (en) * 2000-08-17 2006-06-20 Tosoh Smd, Inc. High purity sputter targets with target end-of-life indication and method of manufacture
AT4240U1 (de) 2000-11-20 2001-04-25 Plansee Ag Verfahren zur herstellung einer verdampfungsquelle
US20050072668A1 (en) * 2003-10-06 2005-04-07 Heraeus, Inc. Sputter target having modified surface texture
MY138584A (en) * 2003-10-06 2009-07-31 Heraeus Inc Sputter target having modified surface texture
JP4562400B2 (ja) * 2004-01-28 2010-10-13 京セラ株式会社 活性金属を含むロウ材を用いた接合体及びその製造方法
RU2305717C2 (ru) * 2005-11-14 2007-09-10 Государственное образовательное учреждение высшего профессионального образования "Московский государственный институт стали и сплавов" (технологический университет) Мишень для получения функциональных покрытий и способ ее изготовления
SE533395C2 (sv) * 2007-06-08 2010-09-14 Sandvik Intellectual Property Sätt att göra PVD-beläggningar
EP2072637B1 (en) * 2007-12-21 2018-08-15 Sandvik Intellectual Property AB Coated cutting tool and a method of making a coated cutting tool
CN101518851B (zh) 2009-02-19 2011-07-20 宁波江丰电子材料有限公司 靶材与背板的焊接结构及方法
CN101879640B (zh) * 2009-05-06 2012-07-25 光洋应用材料科技股份有限公司 陶瓷溅镀靶材组件及其焊合方法
EP2484493B1 (en) * 2009-09-30 2021-01-20 Sintokogio, Ltd. Shot peening treatment method for steel product
CN101745710A (zh) 2010-01-07 2010-06-23 宁波江丰电子材料有限公司 靶材组件的焊接方法
JP5437919B2 (ja) 2010-06-04 2014-03-12 三井金属鉱業株式会社 Ｉｔｏスパッタリングターゲットおよびその製造方法
CN102039459B (zh) 2010-11-18 2012-09-19 宁波江丰电子材料有限公司 一种靶材焊接方法
US20130029178A1 (en) 2011-07-27 2013-01-31 Shih-Ying Chang Active solder

Also Published As

Publication number Publication date
RU2016147509A (ru) 2018-07-27
TWI713457B (zh) 2020-12-21
US20170133209A1 (en) 2017-05-11
CN106471151A (zh) 2017-03-01
KR20180135120A (ko) 2018-12-19
MX2016016573A (es) 2017-08-18
EP3161180A1 (de) 2017-05-03
CN106471151B (zh) 2019-06-18
WO2015197196A1 (de) 2015-12-30
RU2696910C2 (ru) 2019-08-07
BR112016029142A2 (pt) 2017-08-22
JP2017524831A (ja) 2017-08-31
JP6567048B2 (ja) 2019-08-28
EP3161180B1 (de) 2019-02-06
US10109468B2 (en) 2018-10-23
TW201615875A (zh) 2016-05-01
KR102111833B1 (ko) 2020-05-18
KR20170017936A (ko) 2017-02-15
RU2016147509A3 (enExample) 2018-11-15

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