MX2016016573A - Blanco de pulverizacion. - Google Patents
Blanco de pulverizacion.Info
- Publication number
- MX2016016573A MX2016016573A MX2016016573A MX2016016573A MX2016016573A MX 2016016573 A MX2016016573 A MX 2016016573A MX 2016016573 A MX2016016573 A MX 2016016573A MX 2016016573 A MX2016016573 A MX 2016016573A MX 2016016573 A MX2016016573 A MX 2016016573A
- Authority
- MX
- Mexico
- Prior art keywords
- target
- sputtering
- target plate
- relates
- plate
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
La presente invención se relaciona con un blanco, en particular con un blanco de pulverización el cual comprende una placa de blanco de una materia frágil y una placa de respaldo, la placa de respaldo siendo conectada con la placa de blanco en forma plana y la placa de blanco teniendo microfisuras que pasan de la cara frontal a la cara posterior de la placa de blanco y dividen la placa de blanco en fragmentos adyacentes. La invención se relaciona además con un método para la producción de semejante blanco. Un blanco según la invención es apropiado en particular para el uso de densidades de potencia extremadamente altas. La invención se relaciona además con un método de recubrimiento al vacío en el cual se usa al menos un blanco de acuerdo a la invención como blanco de pulverización, y como resultado se pueden usar densidades de poder particularmente altas en el blanco durante la pulverización.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462017909P | 2014-06-27 | 2014-06-27 | |
PCT/EP2015/001298 WO2015197196A1 (de) | 2014-06-27 | 2015-06-26 | Sputtering target |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2016016573A true MX2016016573A (es) | 2017-08-18 |
Family
ID=53717965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2016016573A MX2016016573A (es) | 2014-06-27 | 2015-06-26 | Blanco de pulverizacion. |
Country Status (10)
Country | Link |
---|---|
US (1) | US10109468B2 (es) |
EP (1) | EP3161180B1 (es) |
JP (1) | JP6567048B2 (es) |
KR (2) | KR102111833B1 (es) |
CN (1) | CN106471151B (es) |
BR (1) | BR112016029142A2 (es) |
MX (1) | MX2016016573A (es) |
RU (1) | RU2696910C2 (es) |
TW (1) | TWI713457B (es) |
WO (1) | WO2015197196A1 (es) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT15050U1 (de) | 2015-12-18 | 2016-11-15 | Plansee Composite Mat Gmbh | Beschichtungsquelle mit Strukturierung |
CN110670030A (zh) * | 2019-09-29 | 2020-01-10 | 洛阳丰联科绑定技术有限公司 | 一种ito拼接型靶材的粘结方法 |
CN111118459A (zh) * | 2019-12-30 | 2020-05-08 | 有研亿金新材料有限公司 | 一种高性能铁磁性靶材的制备方法 |
CN114434107A (zh) * | 2022-02-15 | 2022-05-06 | 株洲火炬安泰新材料有限公司 | 一种提高ito靶材焊合率的生产加工方法 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4209375A (en) * | 1979-08-02 | 1980-06-24 | The United States Of America As Represented By The United States Department Of Energy | Sputter target |
DE2933835A1 (de) * | 1979-08-21 | 1981-03-26 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum befestigen von in scheiben- oder plattenform vorliegenden targetmaterialien auf kuehlteller fuer aufstaeubanlagen |
US4740429A (en) * | 1985-07-22 | 1988-04-26 | Ngk Insulators, Ltd. | Metal-ceramic joined articles |
JPS62278261A (ja) | 1986-05-26 | 1987-12-03 | Seiko Epson Corp | スパツタ用タ−ゲツトの製造方法 |
JPS63216969A (ja) * | 1987-03-05 | 1988-09-09 | Daido Steel Co Ltd | 加工方法 |
JPS63241167A (ja) | 1987-03-30 | 1988-10-06 | Seiko Epson Corp | スパツタリング用タ−ゲツト |
RU2091501C1 (ru) * | 1991-04-22 | 1997-09-27 | Акционерное общество открытого типа "Всероссийский алюминиево-магниевый институт" | Способ изготовления мишени для магнетронного распыления из алюминия особой чистоты |
RU2068459C1 (ru) * | 1991-06-03 | 1996-10-27 | Центральный научно-исследовательский институт технологии судостроения | Способ обработки поверхности изделий из стали и сплавов на основе меди |
JPH05214518A (ja) * | 1992-02-04 | 1993-08-24 | Hitachi Metals Ltd | スパッタリングターゲットとバッキングプレートの接合体の矯正方法およびスパッタリングターゲット材 |
US7063773B2 (en) * | 2000-08-17 | 2006-06-20 | Tosoh Smd, Inc. | High purity sputter targets with target end-of-life indication and method of manufacture |
AT4240U1 (de) | 2000-11-20 | 2001-04-25 | Plansee Ag | Verfahren zur herstellung einer verdampfungsquelle |
MY138584A (en) * | 2003-10-06 | 2009-07-31 | Heraeus Inc | Sputter target having modified surface texture |
US20050072668A1 (en) * | 2003-10-06 | 2005-04-07 | Heraeus, Inc. | Sputter target having modified surface texture |
JP4562400B2 (ja) * | 2004-01-28 | 2010-10-13 | 京セラ株式会社 | 活性金属を含むロウ材を用いた接合体及びその製造方法 |
RU2305717C2 (ru) * | 2005-11-14 | 2007-09-10 | Государственное образовательное учреждение высшего профессионального образования "Московский государственный институт стали и сплавов" (технологический университет) | Мишень для получения функциональных покрытий и способ ее изготовления |
SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
EP2072637B1 (en) * | 2007-12-21 | 2018-08-15 | Sandvik Intellectual Property AB | Coated cutting tool and a method of making a coated cutting tool |
CN101518851B (zh) * | 2009-02-19 | 2011-07-20 | 宁波江丰电子材料有限公司 | 靶材与背板的焊接结构及方法 |
CN101879640B (zh) | 2009-05-06 | 2012-07-25 | 光洋应用材料科技股份有限公司 | 陶瓷溅镀靶材组件及其焊合方法 |
KR101237915B1 (ko) | 2009-09-30 | 2013-02-27 | 신토고교 가부시키가이샤 | 강재 제품의 쇼트 피닝 처리법 |
CN101745710A (zh) | 2010-01-07 | 2010-06-23 | 宁波江丰电子材料有限公司 | 靶材组件的焊接方法 |
JP5437919B2 (ja) | 2010-06-04 | 2014-03-12 | 三井金属鉱業株式会社 | Itoスパッタリングターゲットおよびその製造方法 |
CN102039459B (zh) | 2010-11-18 | 2012-09-19 | 宁波江丰电子材料有限公司 | 一种靶材焊接方法 |
US20130029178A1 (en) * | 2011-07-27 | 2013-01-31 | Shih-Ying Chang | Active solder |
-
2015
- 2015-06-26 KR KR1020167035948A patent/KR102111833B1/ko active IP Right Grant
- 2015-06-26 MX MX2016016573A patent/MX2016016573A/es unknown
- 2015-06-26 KR KR1020187036111A patent/KR20180135120A/ko not_active Application Discontinuation
- 2015-06-26 WO PCT/EP2015/001298 patent/WO2015197196A1/de active Application Filing
- 2015-06-26 US US15/319,022 patent/US10109468B2/en active Active
- 2015-06-26 EP EP15741114.1A patent/EP3161180B1/de active Active
- 2015-06-26 RU RU2016147509A patent/RU2696910C2/ru active
- 2015-06-26 JP JP2017519788A patent/JP6567048B2/ja active Active
- 2015-06-26 CN CN201580034987.1A patent/CN106471151B/zh active Active
- 2015-06-26 BR BR112016029142A patent/BR112016029142A2/pt not_active Application Discontinuation
- 2015-06-29 TW TW104120685A patent/TWI713457B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN106471151B (zh) | 2019-06-18 |
KR20180135120A (ko) | 2018-12-19 |
KR102111833B1 (ko) | 2020-05-18 |
TW201615875A (zh) | 2016-05-01 |
US20170133209A1 (en) | 2017-05-11 |
US10109468B2 (en) | 2018-10-23 |
BR112016029142A2 (pt) | 2017-08-22 |
EP3161180A1 (de) | 2017-05-03 |
KR20170017936A (ko) | 2017-02-15 |
JP2017524831A (ja) | 2017-08-31 |
WO2015197196A1 (de) | 2015-12-30 |
RU2016147509A3 (es) | 2018-11-15 |
CN106471151A (zh) | 2017-03-01 |
EP3161180B1 (de) | 2019-02-06 |
JP6567048B2 (ja) | 2019-08-28 |
TWI713457B (zh) | 2020-12-21 |
RU2696910C2 (ru) | 2019-08-07 |
RU2016147509A (ru) | 2018-07-27 |
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