BR112016029142A2 - alvos de pulverização catódica - Google Patents

alvos de pulverização catódica

Info

Publication number
BR112016029142A2
BR112016029142A2 BR112016029142A BR112016029142A BR112016029142A2 BR 112016029142 A2 BR112016029142 A2 BR 112016029142A2 BR 112016029142 A BR112016029142 A BR 112016029142A BR 112016029142 A BR112016029142 A BR 112016029142A BR 112016029142 A2 BR112016029142 A2 BR 112016029142A2
Authority
BR
Brazil
Prior art keywords
target
plate
relates
power densities
spray
Prior art date
Application number
BR112016029142A
Other languages
English (en)
Inventor
Hagmann Juerg
Polcik Peter
WÖRLE Sabine
Krassnitzer Siegfried
Original Assignee
Oerlikon Surface Solutions Ag Pfaeffikon
Plansee Composite Mat Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Pfaeffikon, Plansee Composite Mat Gmbh filed Critical Oerlikon Surface Solutions Ag Pfaeffikon
Publication of BR112016029142A2 publication Critical patent/BR112016029142A2/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Abstract

a presente invenção refere-se a um alvo, particularmente alvo de pulverização, que compreende uma placa de alvo de um material frágil, e uma placa traseira, sendo que a placa traseira está conectada em sua superfície com a placa de alvo, e a placa de alvo apresenta microfissuras, que passam do lado anterior para o lado posterior da placa de alvo e dividem a placa de alvo em fragmentos adjacentes. similarmente, a invenção refere-se a um processo para produção desse alvo. um alvo de acordo com a invenção é particularmente apropriado para a aplicação das mais altas densidades de potência. a invenção refere-se igualmente a um processo de revestimento a vácuo, no qual é usado pelo menos um alvo de acordo com a invenção como alvo de pulverização, e, como resultado, densidades de potência especialmente altas podem ser usadas no alvo durante a pulverização.
BR112016029142A 2014-06-27 2015-06-26 alvos de pulverização catódica BR112016029142A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462017909P 2014-06-27 2014-06-27
PCT/EP2015/001298 WO2015197196A1 (de) 2014-06-27 2015-06-26 Sputtering target

Publications (1)

Publication Number Publication Date
BR112016029142A2 true BR112016029142A2 (pt) 2017-08-22

Family

ID=53717965

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112016029142A BR112016029142A2 (pt) 2014-06-27 2015-06-26 alvos de pulverização catódica

Country Status (10)

Country Link
US (1) US10109468B2 (pt)
EP (1) EP3161180B1 (pt)
JP (1) JP6567048B2 (pt)
KR (2) KR102111833B1 (pt)
CN (1) CN106471151B (pt)
BR (1) BR112016029142A2 (pt)
MX (1) MX2016016573A (pt)
RU (1) RU2696910C2 (pt)
TW (1) TWI713457B (pt)
WO (1) WO2015197196A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT15050U1 (de) 2015-12-18 2016-11-15 Plansee Composite Mat Gmbh Beschichtungsquelle mit Strukturierung
CN110670030A (zh) * 2019-09-29 2020-01-10 洛阳丰联科绑定技术有限公司 一种ito拼接型靶材的粘结方法
CN111118459A (zh) * 2019-12-30 2020-05-08 有研亿金新材料有限公司 一种高性能铁磁性靶材的制备方法
CN114434107A (zh) * 2022-02-15 2022-05-06 株洲火炬安泰新材料有限公司 一种提高ito靶材焊合率的生产加工方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209375A (en) * 1979-08-02 1980-06-24 The United States Of America As Represented By The United States Department Of Energy Sputter target
DE2933835A1 (de) * 1979-08-21 1981-03-26 Siemens AG, 1000 Berlin und 8000 München Verfahren zum befestigen von in scheiben- oder plattenform vorliegenden targetmaterialien auf kuehlteller fuer aufstaeubanlagen
US4740429A (en) * 1985-07-22 1988-04-26 Ngk Insulators, Ltd. Metal-ceramic joined articles
JPS62278261A (ja) 1986-05-26 1987-12-03 Seiko Epson Corp スパツタ用タ−ゲツトの製造方法
JPS63216969A (ja) * 1987-03-05 1988-09-09 Daido Steel Co Ltd 加工方法
JPS63241167A (ja) 1987-03-30 1988-10-06 Seiko Epson Corp スパツタリング用タ−ゲツト
RU2091501C1 (ru) * 1991-04-22 1997-09-27 Акционерное общество открытого типа "Всероссийский алюминиево-магниевый институт" Способ изготовления мишени для магнетронного распыления из алюминия особой чистоты
RU2068459C1 (ru) * 1991-06-03 1996-10-27 Центральный научно-исследовательский институт технологии судостроения Способ обработки поверхности изделий из стали и сплавов на основе меди
JPH05214518A (ja) * 1992-02-04 1993-08-24 Hitachi Metals Ltd スパッタリングターゲットとバッキングプレートの接合体の矯正方法およびスパッタリングターゲット材
US7063773B2 (en) * 2000-08-17 2006-06-20 Tosoh Smd, Inc. High purity sputter targets with target end-of-life indication and method of manufacture
AT4240U1 (de) 2000-11-20 2001-04-25 Plansee Ag Verfahren zur herstellung einer verdampfungsquelle
MY138584A (en) * 2003-10-06 2009-07-31 Heraeus Inc Sputter target having modified surface texture
US20050072668A1 (en) * 2003-10-06 2005-04-07 Heraeus, Inc. Sputter target having modified surface texture
JP4562400B2 (ja) * 2004-01-28 2010-10-13 京セラ株式会社 活性金属を含むロウ材を用いた接合体及びその製造方法
RU2305717C2 (ru) * 2005-11-14 2007-09-10 Государственное образовательное учреждение высшего профессионального образования "Московский государственный институт стали и сплавов" (технологический университет) Мишень для получения функциональных покрытий и способ ее изготовления
SE533395C2 (sv) * 2007-06-08 2010-09-14 Sandvik Intellectual Property Sätt att göra PVD-beläggningar
EP2072637B1 (en) * 2007-12-21 2018-08-15 Sandvik Intellectual Property AB Coated cutting tool and a method of making a coated cutting tool
CN101518851B (zh) * 2009-02-19 2011-07-20 宁波江丰电子材料有限公司 靶材与背板的焊接结构及方法
CN101879640B (zh) 2009-05-06 2012-07-25 光洋应用材料科技股份有限公司 陶瓷溅镀靶材组件及其焊合方法
KR101237915B1 (ko) 2009-09-30 2013-02-27 신토고교 가부시키가이샤 강재 제품의 쇼트 피닝 처리법
CN101745710A (zh) 2010-01-07 2010-06-23 宁波江丰电子材料有限公司 靶材组件的焊接方法
JP5437919B2 (ja) 2010-06-04 2014-03-12 三井金属鉱業株式会社 Ｉｔｏスパッタリングターゲットおよびその製造方法
CN102039459B (zh) 2010-11-18 2012-09-19 宁波江丰电子材料有限公司 一种靶材焊接方法
US20130029178A1 (en) * 2011-07-27 2013-01-31 Shih-Ying Chang Active solder

Also Published As

Publication number Publication date
CN106471151B (zh) 2019-06-18
KR20180135120A (ko) 2018-12-19
KR102111833B1 (ko) 2020-05-18
TW201615875A (zh) 2016-05-01
US20170133209A1 (en) 2017-05-11
US10109468B2 (en) 2018-10-23
MX2016016573A (es) 2017-08-18
EP3161180A1 (de) 2017-05-03
KR20170017936A (ko) 2017-02-15
JP2017524831A (ja) 2017-08-31
WO2015197196A1 (de) 2015-12-30
RU2016147509A3 (pt) 2018-11-15
CN106471151A (zh) 2017-03-01
EP3161180B1 (de) 2019-02-06
JP6567048B2 (ja) 2019-08-28
TWI713457B (zh) 2020-12-21
RU2696910C2 (ru) 2019-08-07
RU2016147509A (ru) 2018-07-27

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Legal Events

Date Code Title Description
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B12B Appeal against refusal [chapter 12.2 patent gazette]