MX2022007618A - Ba?o de chapado compuesto de zinc-niquel-silice y metodo para chapar usando el ba?o de chapado. - Google Patents
Ba?o de chapado compuesto de zinc-niquel-silice y metodo para chapar usando el ba?o de chapado.Info
- Publication number
- MX2022007618A MX2022007618A MX2022007618A MX2022007618A MX2022007618A MX 2022007618 A MX2022007618 A MX 2022007618A MX 2022007618 A MX2022007618 A MX 2022007618A MX 2022007618 A MX2022007618 A MX 2022007618A MX 2022007618 A MX2022007618 A MX 2022007618A
- Authority
- MX
- Mexico
- Prior art keywords
- plating bath
- nickel
- zinc
- plating
- silica composite
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
El propósito de la presente invención es proporcionar un baño de chapado compuesto de zinc-níquel-sílice que se ha mejorado en términos de: poder cubriente para artículos que tienen una conformación compleja; y resistencia a la corrosión de una porción de densidad de baja corriente donde el espesor de película es pequeño. La presente invención pertenece a un baño de chapado compuesto de zinc-níquel-sílice, el baño de chapado que tiene un pH de 3.5 a 6.9, y que contiene iones de zinc, iones de níquel, sílice coloidal e iones de cloruro. La sílice coloidal es una sílice coloidal catiónica que tiene en la superficie de la misma por lo menos una especie de catión de metal seleccionada del grupo que consiste de cationes de metal trivalentes a heptavalentes.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019231534 | 2019-12-23 | ||
PCT/JP2020/041349 WO2021131339A1 (ja) | 2019-12-23 | 2020-11-05 | 亜鉛-ニッケル-シリカ複合めっき浴及び該浴を用いるめっき方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2022007618A true MX2022007618A (es) | 2022-09-12 |
Family
ID=76574936
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2022007618A MX2022007618A (es) | 2019-12-23 | 2020-11-05 | Ba?o de chapado compuesto de zinc-niquel-silice y metodo para chapar usando el ba?o de chapado. |
Country Status (7)
Country | Link |
---|---|
US (1) | US20230041195A1 (es) |
EP (1) | EP4083269A4 (es) |
JP (1) | JP7427264B2 (es) |
CN (1) | CN114867891A (es) |
MX (1) | MX2022007618A (es) |
TW (1) | TW202126862A (es) |
WO (1) | WO2021131339A1 (es) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117940615A (zh) | 2021-11-18 | 2024-04-26 | Dic株式会社 | 复合硬质铬镀覆 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS513298B2 (es) * | 1971-11-16 | 1976-02-02 | ||
US3956171A (en) | 1973-07-30 | 1976-05-11 | E. I. Du Pont De Nemours And Company | Process for preparing stable positively charged alumina coated silica sols and product thereof |
US4075066A (en) * | 1977-01-27 | 1978-02-21 | R. O. Hull & Company, Inc. | Electroplating zinc, ammonia-free acid zinc plating bath therefor and additive composition therefor |
JPS6038480B2 (ja) * | 1978-06-08 | 1985-08-31 | 新日本製鐵株式会社 | 耐食性電気亜鉛複合めつき鋼材の製造方法 |
JPS61127900A (ja) * | 1984-11-22 | 1986-06-16 | Kawasaki Steel Corp | 複合めつき方法 |
JPS61130498A (ja) * | 1984-11-28 | 1986-06-18 | Kawasaki Steel Corp | 無塗装および塗装後の耐食性に優れた複合めつき鋼板 |
JPS62278298A (ja) * | 1985-08-28 | 1987-12-03 | Kawasaki Steel Corp | クロメート処理Zn系めっき鋼板 |
JPH0718040B2 (ja) * | 1985-09-02 | 1995-03-01 | 川崎製鉄株式会社 | スポツト溶接性および耐食性に優れた複合めつき鋼板およびその製造方法 |
JPS62287093A (ja) * | 1986-06-05 | 1987-12-12 | Okuno Seiyaku Kogyo Kk | 電気亜鉛−ニツケル合金めつき浴 |
JPS6311695A (ja) * | 1986-06-30 | 1988-01-19 | Nippon Steel Corp | 高耐食性亜鉛系複合めっき鋼板の製造法 |
JPS63123807A (ja) | 1986-11-13 | 1988-05-27 | Catalysts & Chem Ind Co Ltd | 酸性シリカゾルの製造法 |
JPS63199899A (ja) * | 1987-02-12 | 1988-08-18 | Nkk Corp | 高耐食性分散亜鉛系めつき鋼板の製造方法 |
JPH07258895A (ja) * | 1994-03-23 | 1995-10-09 | Kawasaki Steel Corp | プレス加工性および耐食性に優れた複層亜鉛系めっき鋼板 |
EP1719825A4 (en) * | 2003-12-09 | 2007-07-18 | Kansai Paint Co Ltd | GALVANIC ZINC ALLOY COATING WITH EXCELLENT CORROSION RESISTANCE AND GALVANICALLY COATED METAL MATERIAL THEREWITH |
US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
JP4738910B2 (ja) * | 2005-06-21 | 2011-08-03 | 日本表面化学株式会社 | 亜鉛−ニッケル合金めっき方法 |
KR20090082913A (ko) | 2006-11-08 | 2009-07-31 | 닛산 가가쿠 고교 가부시키 가이샤 | 실리카 알루미나 복합 졸 및 이의 제조방법 |
US7785674B2 (en) * | 2007-07-12 | 2010-08-31 | Kimberly-Clark Worldwide, Inc. | Delivery systems for delivering functional compounds to substrates and processes of using the same |
WO2009101974A1 (ja) | 2008-02-12 | 2009-08-20 | Nissan Chemical Industries, Ltd. | シリカコロイド粒子及びその製造方法、並びにその有機溶媒分散シリカゾル、重合性化合物分散シリカゾル及びジカルボン酸無水物分散シリカゾル |
EP2357269A1 (en) | 2008-11-14 | 2011-08-17 | Yuken Industry Co., Ltd. | Acidic zinc plating bath |
JP6047702B2 (ja) * | 2013-03-27 | 2016-12-21 | 日本表面化学株式会社 | 亜鉛ニッケル合金めっき液及びめっき方法 |
JP6427541B2 (ja) * | 2016-09-16 | 2018-11-21 | 本田技研工業株式会社 | 亜鉛−ニッケル複合めっき浴及びめっき方法 |
-
2020
- 2020-11-05 EP EP20905408.9A patent/EP4083269A4/en active Pending
- 2020-11-05 WO PCT/JP2020/041349 patent/WO2021131339A1/ja unknown
- 2020-11-05 US US17/787,858 patent/US20230041195A1/en active Pending
- 2020-11-05 JP JP2021566884A patent/JP7427264B2/ja active Active
- 2020-11-05 CN CN202080088049.0A patent/CN114867891A/zh active Pending
- 2020-11-05 MX MX2022007618A patent/MX2022007618A/es unknown
- 2020-11-18 TW TW109140341A patent/TW202126862A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US20230041195A1 (en) | 2023-02-09 |
JPWO2021131339A1 (es) | 2021-07-01 |
TW202126862A (zh) | 2021-07-16 |
WO2021131339A1 (ja) | 2021-07-01 |
JP7427264B2 (ja) | 2024-02-05 |
EP4083269A1 (en) | 2022-11-02 |
EP4083269A4 (en) | 2024-01-03 |
CN114867891A (zh) | 2022-08-05 |
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