MX2012004913A - Abrasivo aglomerado de resina. - Google Patents

Abrasivo aglomerado de resina.

Info

Publication number
MX2012004913A
MX2012004913A MX2012004913A MX2012004913A MX2012004913A MX 2012004913 A MX2012004913 A MX 2012004913A MX 2012004913 A MX2012004913 A MX 2012004913A MX 2012004913 A MX2012004913 A MX 2012004913A MX 2012004913 A MX2012004913 A MX 2012004913A
Authority
MX
Mexico
Prior art keywords
component
oxide
continuous phase
bonded abrasive
resin bonded
Prior art date
Application number
MX2012004913A
Other languages
English (en)
Inventor
Rachana Upadhyay
Ramanujam Vedantham
Original Assignee
Saint Gobain Abrasifs Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Abrasifs Sa filed Critical Saint Gobain Abrasifs Sa
Publication of MX2012004913A publication Critical patent/MX2012004913A/es

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245—Pads with fixed abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Medicinal Preparation (AREA)

Abstract

Un producto de resina superabrasivo incluye un componente de grano superabrasivo, un componente de óxido y una fase continua que define una red de poros interconectados. El componente de óxido consiste en un óxido de un lantanoide y la fase continua incluye un componente polimérico termoplástico. El componente de grano superabrasivo y el componente de óxido se distribuyen en la fase continua.
MX2012004913A 2009-10-27 2010-10-27 Abrasivo aglomerado de resina. MX2012004913A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25525609P 2009-10-27 2009-10-27
PCT/US2010/054329 WO2011056671A2 (en) 2009-10-27 2010-10-27 Resin bonded abrasive

Publications (1)

Publication Number Publication Date
MX2012004913A true MX2012004913A (es) 2012-08-15

Family

ID=43970687

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2012004913A MX2012004913A (es) 2009-10-27 2010-10-27 Abrasivo aglomerado de resina.

Country Status (10)

Country Link
US (2) US9138866B2 (es)
EP (1) EP2493660A4 (es)
JP (1) JP5681201B2 (es)
KR (3) KR20150097811A (es)
CN (1) CN102648072A (es)
AU (1) AU2010315460B2 (es)
BR (1) BR112012009809A2 (es)
CA (1) CA2779275A1 (es)
MX (1) MX2012004913A (es)
WO (1) WO2011056671A2 (es)

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US8969833B1 (en) 2011-12-16 2015-03-03 Us Synthetic Corporation Method and system for perceiving a boundary between a first region and a second region of a superabrasive volume
CH710934A1 (de) * 2015-04-01 2016-10-14 Reishauer Ag Offenporiges, keramisch gebundenes Schleifwerkzeug, Verfahren zu seiner Herstellung sowie für seine Herstellung verwendete Porenbildnermischungen.
CN105252431A (zh) * 2015-10-09 2016-01-20 芜湖市鸿坤汽车零部件有限公司 一种聚苯乙烯粘结树脂砂轮及其制备方法
CN106891274A (zh) * 2017-04-19 2017-06-27 台山市远鹏研磨科技有限公司 一种湿式精抛轮及其制备方法
US10518387B2 (en) * 2017-07-18 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Grinding element, grinding wheel and manufacturing method of semiconductor package using the same
KR102497825B1 (ko) * 2020-09-29 2023-02-08 에스케이엔펄스 주식회사 연마 패드, 연마 패드의 제조 방법 및 이를 이용한 반도체 소자의 제조 방법

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Also Published As

Publication number Publication date
EP2493660A2 (en) 2012-09-05
AU2010315460B2 (en) 2014-11-20
CN102648072A (zh) 2012-08-22
KR20150097811A (ko) 2015-08-26
EP2493660A4 (en) 2015-08-26
KR20140103327A (ko) 2014-08-26
WO2011056671A2 (en) 2011-05-12
US20150360346A1 (en) 2015-12-17
CA2779275A1 (en) 2011-05-12
JP2013508184A (ja) 2013-03-07
US20120279139A1 (en) 2012-11-08
JP5681201B2 (ja) 2015-03-04
BR112012009809A2 (pt) 2016-11-22
KR20120085862A (ko) 2012-08-01
US9138866B2 (en) 2015-09-22
AU2010315460A1 (en) 2012-05-24
WO2011056671A3 (en) 2011-09-22

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