MC1098A1 - Composition photopolymerisable et son application - Google Patents
Composition photopolymerisable et son applicationInfo
- Publication number
- MC1098A1 MC1098A1 MC761184A MC1184A MC1098A1 MC 1098 A1 MC1098 A1 MC 1098A1 MC 761184 A MC761184 A MC 761184A MC 1184 A MC1184 A MC 1184A MC 1098 A1 MC1098 A1 MC 1098A1
- Authority
- MC
- Monaco
- Prior art keywords
- composition
- groups
- constituent
- photosensitizer
- polymer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F271/00—Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00
- C08F271/02—Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00 on to polymers of monomers containing heterocyclic nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB12676/75A GB1547998A (en) | 1975-03-26 | 1975-03-26 | Photopolymersisable compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MC1098A1 true MC1098A1 (fr) | 1977-02-04 |
Family
ID=10009084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MC761184A MC1098A1 (fr) | 1975-03-26 | 1976-03-25 | Composition photopolymerisable et son application |
Country Status (20)
| Country | Link |
|---|---|
| JP (1) | JPS51120802A (enExample) |
| AT (1) | AT354084B (enExample) |
| AU (1) | AU1234276A (enExample) |
| BE (1) | BE840110A (enExample) |
| CA (1) | CA1079561A (enExample) |
| CH (1) | CH603745A5 (enExample) |
| DE (1) | DE2612525A1 (enExample) |
| DK (1) | DK131876A (enExample) |
| ES (1) | ES446395A1 (enExample) |
| FI (1) | FI760797A7 (enExample) |
| FR (1) | FR2305443A1 (enExample) |
| GB (1) | GB1547998A (enExample) |
| LU (1) | LU74634A1 (enExample) |
| MC (1) | MC1098A1 (enExample) |
| NL (1) | NL7603121A (enExample) |
| NO (1) | NO761006L (enExample) |
| NZ (1) | NZ180383A (enExample) |
| PT (1) | PT64948B (enExample) |
| SE (1) | SE7603634L (enExample) |
| ZA (1) | ZA761700B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4454219A (en) * | 1981-04-27 | 1984-06-12 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer |
| DE3215513C3 (de) * | 1981-04-27 | 1994-07-14 | Hitachi Chemical Co Ltd | Photoempfindliche Harzmasse |
| JPH066603B2 (ja) * | 1984-08-13 | 1994-01-26 | 日本合成化学工業株式会社 | 硬化性樹脂組成物 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3961961A (en) * | 1972-11-20 | 1976-06-08 | Minnesota Mining And Manufacturing Company | Positive or negative developable photosensitive composition |
-
1975
- 1975-03-26 GB GB12676/75A patent/GB1547998A/en not_active Expired
-
1976
- 1976-03-19 ZA ZA761700A patent/ZA761700B/xx unknown
- 1976-03-22 NZ NZ180383A patent/NZ180383A/xx unknown
- 1976-03-22 NO NO761006A patent/NO761006L/no unknown
- 1976-03-24 DE DE19762612525 patent/DE2612525A1/de not_active Withdrawn
- 1976-03-24 LU LU74634A patent/LU74634A1/xx unknown
- 1976-03-25 AU AU12342/76A patent/AU1234276A/en not_active Expired
- 1976-03-25 MC MC761184A patent/MC1098A1/fr unknown
- 1976-03-25 PT PT64948A patent/PT64948B/pt unknown
- 1976-03-25 FI FI760797A patent/FI760797A7/fi not_active Application Discontinuation
- 1976-03-25 DK DK131876A patent/DK131876A/da unknown
- 1976-03-25 NL NL7603121A patent/NL7603121A/xx not_active Application Discontinuation
- 1976-03-25 SE SE7603634A patent/SE7603634L/xx unknown
- 1976-03-25 FR FR7608729A patent/FR2305443A1/fr active Granted
- 1976-03-26 AT AT224576A patent/AT354084B/de not_active IP Right Cessation
- 1976-03-26 BE BE165629A patent/BE840110A/xx unknown
- 1976-03-26 JP JP51033430A patent/JPS51120802A/ja active Pending
- 1976-03-26 CH CH382176A patent/CH603745A5/xx not_active IP Right Cessation
- 1976-03-26 CA CA249,121A patent/CA1079561A/en not_active Expired
- 1976-03-26 ES ES446395A patent/ES446395A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DK131876A (da) | 1976-09-27 |
| BE840110A (fr) | 1976-09-27 |
| AT354084B (de) | 1979-12-27 |
| SE7603634L (sv) | 1976-09-27 |
| DE2612525A1 (de) | 1976-10-14 |
| NZ180383A (en) | 1978-09-20 |
| NL7603121A (nl) | 1976-09-28 |
| PT64948B (en) | 1977-08-25 |
| JPS51120802A (en) | 1976-10-22 |
| ATA224576A (de) | 1979-05-15 |
| AU1234276A (en) | 1977-10-20 |
| ES446395A1 (es) | 1977-06-16 |
| LU74634A1 (enExample) | 1977-05-06 |
| NO761006L (enExample) | 1976-09-28 |
| FI760797A7 (enExample) | 1976-09-27 |
| ZA761700B (en) | 1977-04-27 |
| FR2305443B1 (enExample) | 1980-04-30 |
| CA1079561A (en) | 1980-06-17 |
| GB1547998A (en) | 1979-07-04 |
| PT64948A (en) | 1976-04-01 |
| CH603745A5 (enExample) | 1978-08-31 |
| FR2305443A1 (fr) | 1976-10-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0119162B1 (de) | Photopolymerisierbare Zusammensetzung, damit beschichtetes Material und Verfahren zur Herstellung von Reliefabbildungen | |
| DE2934758C2 (de) | Lichtempfindliches Gemisch und Druckplatte mit dem lichtempfindlichen Gemisch | |
| EP0224164B1 (de) | Photoempfindliche Aufzeichnungsmaterialien mit elastomeren Pfropfcopolymerisat-Bindemitteln sowie Reliefformen daraus | |
| JP2509288B2 (ja) | 重合可能な化合物、これを含有する放射線重合可能な混合物及び放射線重合可能な記録材料 | |
| DE69822401T2 (de) | Zusammensetzung für antireflexions- oder lichtabsorbierende filme sowie verbindungen hierfür | |
| DE2851641C2 (de) | Photopolymerisierbare Massen | |
| US3615629A (en) | Photosensitive compositions for production of relief-bearing plates sheets or films | |
| CH618990A5 (enExample) | ||
| JPH01249809A (ja) | 高感度光重合開始剤組成物 | |
| DE3820498A1 (de) | Dentalwerkstoffe | |
| DE2055157A1 (de) | Fotopolymerisierbare Masse | |
| BE897694A (fr) | Composition d'initiateur de photopolymerisation de grande sensibilite | |
| FR2788062A1 (fr) | Monomeres de reticulation pour photoresist, et procede pour preparer des polymeres de photoresist en utilisant ceux-ci | |
| EP0136186B1 (en) | Photocurable resin composition | |
| DE2747231B2 (de) | Vorbeschichtete Druckplatte für den Trockenflachdruck | |
| JPH01319504A (ja) | 光開始剤としての共重合体 | |
| MC1098A1 (fr) | Composition photopolymerisable et son application | |
| DE69609136T2 (de) | Schwer-flüchtige substituierte 2-phenyl-4,6-bis(halomethyl)-1,3,5-triazine für lithographische druckplatten | |
| JPS6045415B2 (ja) | レリーフ版木を製造するための光重合性物質 | |
| BE1005918A5 (fr) | Composition dentaire adhesive. | |
| JPS61228002A (ja) | 高感度光硬化性樹脂組成物 | |
| EP0360151A2 (de) | Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial | |
| MC1037A1 (fr) | Nouvelles compositions photopolymérisables, leur préparation et leurs applications | |
| JPH08283199A (ja) | フラーレン誘導体、樹脂組成物及びその硬化物 | |
| JPH0273810A (ja) | 光重合性樹脂組成物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| YP | Annual fee paid |