AT354084B - Photopolymerisierbare massen - Google Patents

Photopolymerisierbare massen

Info

Publication number
AT354084B
AT354084B AT224576A AT224576A AT354084B AT 354084 B AT354084 B AT 354084B AT 224576 A AT224576 A AT 224576A AT 224576 A AT224576 A AT 224576A AT 354084 B AT354084 B AT 354084B
Authority
AT
Austria
Prior art keywords
photopolymerizable
masses
photopolymerizable masses
Prior art date
Application number
AT224576A
Other languages
English (en)
Other versions
ATA224576A (de
Inventor
B C Benson
D R Dixon
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of ATA224576A publication Critical patent/ATA224576A/de
Application granted granted Critical
Publication of AT354084B publication Critical patent/AT354084B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F271/00—Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00
    • C08F271/02—Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00 on to polymers of monomers containing heterocyclic nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
AT224576A 1975-03-26 1976-03-26 Photopolymerisierbare massen AT354084B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB12676/75A GB1547998A (en) 1975-03-26 1975-03-26 Photopolymersisable compositions

Publications (2)

Publication Number Publication Date
ATA224576A ATA224576A (de) 1979-05-15
AT354084B true AT354084B (de) 1979-12-27

Family

ID=10009084

Family Applications (1)

Application Number Title Priority Date Filing Date
AT224576A AT354084B (de) 1975-03-26 1976-03-26 Photopolymerisierbare massen

Country Status (20)

Country Link
JP (1) JPS51120802A (de)
AT (1) AT354084B (de)
AU (1) AU1234276A (de)
BE (1) BE840110A (de)
CA (1) CA1079561A (de)
CH (1) CH603745A5 (de)
DE (1) DE2612525A1 (de)
DK (1) DK131876A (de)
ES (1) ES446395A1 (de)
FI (1) FI760797A (de)
FR (1) FR2305443A1 (de)
GB (1) GB1547998A (de)
LU (1) LU74634A1 (de)
MC (1) MC1098A1 (de)
NL (1) NL7603121A (de)
NO (1) NO761006L (de)
NZ (1) NZ180383A (de)
PT (1) PT64948B (de)
SE (1) SE7603634L (de)
ZA (1) ZA761700B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3215513C3 (de) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photoempfindliche Harzmasse
US4454219A (en) * 1981-04-27 1984-06-12 Hitachi Chemical Company, Ltd. Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer
JPH066603B2 (ja) * 1984-08-13 1994-01-26 日本合成化学工業株式会社 硬化性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3961961A (en) * 1972-11-20 1976-06-08 Minnesota Mining And Manufacturing Company Positive or negative developable photosensitive composition

Also Published As

Publication number Publication date
SE7603634L (sv) 1976-09-27
ES446395A1 (es) 1977-06-16
NO761006L (de) 1976-09-28
DK131876A (da) 1976-09-27
MC1098A1 (fr) 1977-02-04
CH603745A5 (de) 1978-08-31
GB1547998A (en) 1979-07-04
CA1079561A (en) 1980-06-17
DE2612525A1 (de) 1976-10-14
ZA761700B (en) 1977-04-27
PT64948B (en) 1977-08-25
FR2305443A1 (fr) 1976-10-22
NL7603121A (nl) 1976-09-28
NZ180383A (en) 1978-09-20
PT64948A (en) 1976-04-01
JPS51120802A (en) 1976-10-22
LU74634A1 (de) 1977-05-06
FI760797A (de) 1976-09-27
AU1234276A (en) 1977-10-20
BE840110A (fr) 1976-09-27
ATA224576A (de) 1979-05-15
FR2305443B1 (de) 1980-04-30

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Legal Events

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