MC1098A1 - Composition photopolymerisable et son application - Google Patents

Composition photopolymerisable et son application

Info

Publication number
MC1098A1
MC1098A1 MC761184A MC1184A MC1098A1 MC 1098 A1 MC1098 A1 MC 1098A1 MC 761184 A MC761184 A MC 761184A MC 1184 A MC1184 A MC 1184A MC 1098 A1 MC1098 A1 MC 1098A1
Authority
MC
Monaco
Prior art keywords
application
photopolymerisable composition
photopolymerisable
composition
Prior art date
Application number
MC761184A
Other languages
English (en)
French (fr)
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of MC1098A1 publication Critical patent/MC1098A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F271/00Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00
    • C08F271/02Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00 on to polymers of monomers containing heterocyclic nitrogen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
MC761184A 1975-03-26 1976-03-25 Composition photopolymerisable et son application MC1098A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB12676/75A GB1547998A (en) 1975-03-26 1975-03-26 Photopolymersisable compositions

Publications (1)

Publication Number Publication Date
MC1098A1 true MC1098A1 (fr) 1977-02-04

Family

ID=10009084

Family Applications (1)

Application Number Title Priority Date Filing Date
MC761184A MC1098A1 (fr) 1975-03-26 1976-03-25 Composition photopolymerisable et son application

Country Status (20)

Country Link
JP (1) JPS51120802A (de)
AT (1) AT354084B (de)
AU (1) AU1234276A (de)
BE (1) BE840110A (de)
CA (1) CA1079561A (de)
CH (1) CH603745A5 (de)
DE (1) DE2612525A1 (de)
DK (1) DK131876A (de)
ES (1) ES446395A1 (de)
FI (1) FI760797A (de)
FR (1) FR2305443A1 (de)
GB (1) GB1547998A (de)
LU (1) LU74634A1 (de)
MC (1) MC1098A1 (de)
NL (1) NL7603121A (de)
NO (1) NO761006L (de)
NZ (1) NZ180383A (de)
PT (1) PT64948B (de)
SE (1) SE7603634L (de)
ZA (1) ZA761700B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3215513C3 (de) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photoempfindliche Harzmasse
US4454219A (en) * 1981-04-27 1984-06-12 Hitachi Chemical Company, Ltd. Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer
JPH066603B2 (ja) * 1984-08-13 1994-01-26 日本合成化学工業株式会社 硬化性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3961961A (en) * 1972-11-20 1976-06-08 Minnesota Mining And Manufacturing Company Positive or negative developable photosensitive composition

Also Published As

Publication number Publication date
NL7603121A (nl) 1976-09-28
DK131876A (da) 1976-09-27
GB1547998A (en) 1979-07-04
NZ180383A (en) 1978-09-20
CA1079561A (en) 1980-06-17
ATA224576A (de) 1979-05-15
PT64948A (en) 1976-04-01
ES446395A1 (es) 1977-06-16
JPS51120802A (en) 1976-10-22
CH603745A5 (de) 1978-08-31
AT354084B (de) 1979-12-27
SE7603634L (sv) 1976-09-27
PT64948B (en) 1977-08-25
AU1234276A (en) 1977-10-20
BE840110A (fr) 1976-09-27
ZA761700B (en) 1977-04-27
LU74634A1 (de) 1977-05-06
FR2305443A1 (fr) 1976-10-22
FR2305443B1 (de) 1980-04-30
DE2612525A1 (de) 1976-10-14
NO761006L (de) 1976-09-28
FI760797A (de) 1976-09-27

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