MC1098A1 - Composition photopolymerisable et son application - Google Patents
Composition photopolymerisable et son applicationInfo
- Publication number
- MC1098A1 MC1098A1 MC761184A MC1184A MC1098A1 MC 1098 A1 MC1098 A1 MC 1098A1 MC 761184 A MC761184 A MC 761184A MC 1184 A MC1184 A MC 1184A MC 1098 A1 MC1098 A1 MC 1098A1
- Authority
- MC
- Monaco
- Prior art keywords
- application
- photopolymerisable composition
- photopolymerisable
- composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F271/00—Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00
- C08F271/02—Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00 on to polymers of monomers containing heterocyclic nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB12676/75A GB1547998A (en) | 1975-03-26 | 1975-03-26 | Photopolymersisable compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MC1098A1 true MC1098A1 (fr) | 1977-02-04 |
Family
ID=10009084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MC761184A MC1098A1 (fr) | 1975-03-26 | 1976-03-25 | Composition photopolymerisable et son application |
Country Status (20)
| Country | Link |
|---|---|
| JP (1) | JPS51120802A (xx) |
| AT (1) | AT354084B (xx) |
| AU (1) | AU1234276A (xx) |
| BE (1) | BE840110A (xx) |
| CA (1) | CA1079561A (xx) |
| CH (1) | CH603745A5 (xx) |
| DE (1) | DE2612525A1 (xx) |
| DK (1) | DK131876A (xx) |
| ES (1) | ES446395A1 (xx) |
| FI (1) | FI760797A (xx) |
| FR (1) | FR2305443A1 (xx) |
| GB (1) | GB1547998A (xx) |
| LU (1) | LU74634A1 (xx) |
| MC (1) | MC1098A1 (xx) |
| NL (1) | NL7603121A (xx) |
| NO (1) | NO761006L (xx) |
| NZ (1) | NZ180383A (xx) |
| PT (1) | PT64948B (xx) |
| SE (1) | SE7603634L (xx) |
| ZA (1) | ZA761700B (xx) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4454219A (en) * | 1981-04-27 | 1984-06-12 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer |
| DE3215513C3 (de) * | 1981-04-27 | 1994-07-14 | Hitachi Chemical Co Ltd | Photoempfindliche Harzmasse |
| JPH066603B2 (ja) * | 1984-08-13 | 1994-01-26 | 日本合成化学工業株式会社 | 硬化性樹脂組成物 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3961961A (en) * | 1972-11-20 | 1976-06-08 | Minnesota Mining And Manufacturing Company | Positive or negative developable photosensitive composition |
-
1975
- 1975-03-26 GB GB12676/75A patent/GB1547998A/en not_active Expired
-
1976
- 1976-03-19 ZA ZA761700A patent/ZA761700B/xx unknown
- 1976-03-22 NZ NZ180383A patent/NZ180383A/xx unknown
- 1976-03-22 NO NO761006A patent/NO761006L/no unknown
- 1976-03-24 LU LU74634A patent/LU74634A1/xx unknown
- 1976-03-24 DE DE19762612525 patent/DE2612525A1/de not_active Withdrawn
- 1976-03-25 FR FR7608729A patent/FR2305443A1/fr active Granted
- 1976-03-25 SE SE7603634A patent/SE7603634L/xx unknown
- 1976-03-25 MC MC761184A patent/MC1098A1/xx unknown
- 1976-03-25 FI FI760797A patent/FI760797A/fi not_active Application Discontinuation
- 1976-03-25 NL NL7603121A patent/NL7603121A/xx not_active Application Discontinuation
- 1976-03-25 PT PT64948A patent/PT64948B/pt unknown
- 1976-03-25 AU AU12342/76A patent/AU1234276A/en not_active Expired
- 1976-03-25 DK DK131876A patent/DK131876A/da unknown
- 1976-03-26 AT AT224576A patent/AT354084B/de not_active IP Right Cessation
- 1976-03-26 CH CH382176A patent/CH603745A5/xx not_active IP Right Cessation
- 1976-03-26 CA CA249,121A patent/CA1079561A/en not_active Expired
- 1976-03-26 JP JP51033430A patent/JPS51120802A/ja active Pending
- 1976-03-26 BE BE165629A patent/BE840110A/xx unknown
- 1976-03-26 ES ES446395A patent/ES446395A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NZ180383A (en) | 1978-09-20 |
| ATA224576A (de) | 1979-05-15 |
| DK131876A (da) | 1976-09-27 |
| CH603745A5 (xx) | 1978-08-31 |
| ES446395A1 (es) | 1977-06-16 |
| ZA761700B (en) | 1977-04-27 |
| NO761006L (xx) | 1976-09-28 |
| NL7603121A (nl) | 1976-09-28 |
| FI760797A (xx) | 1976-09-27 |
| AT354084B (de) | 1979-12-27 |
| PT64948A (en) | 1976-04-01 |
| FR2305443A1 (fr) | 1976-10-22 |
| BE840110A (fr) | 1976-09-27 |
| AU1234276A (en) | 1977-10-20 |
| GB1547998A (en) | 1979-07-04 |
| LU74634A1 (xx) | 1977-05-06 |
| FR2305443B1 (xx) | 1980-04-30 |
| CA1079561A (en) | 1980-06-17 |
| PT64948B (en) | 1977-08-25 |
| JPS51120802A (en) | 1976-10-22 |
| DE2612525A1 (de) | 1976-10-14 |
| SE7603634L (sv) | 1976-09-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| YP | Annual fee paid |