KR970704664A - 2,6-디니트로벤질기를 기재로하는 양성 광합성 화합물(positive photoactive compounds based on 2,6-dinitrobenzyl groups) - Google Patents
2,6-디니트로벤질기를 기재로하는 양성 광합성 화합물(positive photoactive compounds based on 2,6-dinitrobenzyl groups) Download PDFInfo
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Abstract
광활성 화합물은 2,5- 또는 2,6-디니트로벤질기로부터 합성된다. 또한 본 발명은 2,5- 또는 2,6-디니트로벤질기를 함유하는 반응성 단량체를 합성하는 방법에 관한 것이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (20)
- 하기 구조를 포함하는 광활성 화합물:상기 식에서, X 및 Y는 할로겐, -OH, -OR, -O-SO2R, -SR 및 -NRR'로 이루어지는 그룹으로부터 선택되는 동일하거나 다른 구성원일 수 있고; R 및 R'는 수소 또는 치환되거나 미치환된 알킬, 아릴 또는 아르알킬 치환제이다.
- 제1항에 있어서, X 및 Y가 할로겐 및 하이드록실기로 이루어지는 그룹으로부터 선택되는 화합물.
- 제2항에 있어서, X 및 Y가 동일한 화합물.
- 제2항에 있어서, X 및 Y가 서로 다른 화합물.
- 제2항에 있어서, X 및 Y가 할로겐인 화합물.
- 제5항에 있어서, X 및 Y가 염화물인 화합물.
- 제1항에 있어서, X 및 Y가 하이드록실기인 화합물.
- 제1항에 있어서, R이 반응기를 포함하는 화합물.
- 제1항에 있어서, 하나 이상의 X 및 Y가 우레탄, 카보네이트, 에스테르, 에테르, 아민 또는 설파이드인 화합물.
- 제1항에 있어서, 우레탄, 카보네이트, 에스테르, 에테르, 아민 또는 설파이드의 반복단위를 갖는 중합체를 포함하는 화합물.
- 제10항에 있어서, 제1항의 구조의 반복단위를 갖는 중합체를 포함하는 화합물.
- 제1항에 있어서, 2,6-디니트로 치환제를 갖고, X 및 Y가 염화물기인 화합물.
- 제1항에 있어서, 2,6-디니트로 치환제를 갖고, X 및 Y가 하이드록실기인 화합물.
- α,α'-디클로로크실렌을 제조하고; α,α'-디클로로크실렌을 질화하여 디니트로-비스(클로로메틸)벤젠을 형성하는 것을 포함함을 특징으로 하는 디니트로비스(클로로메틸)벤젠의 제조방법.
- (a) α,α'-디클로로크실렌을 질화하여 디니트로비스(클로로메틸)벤젠을 형성하고; (b) (a)의 생성물 또는 그의 유도체를 가수분해하여 디니트로비스(하이드록시메틸)벤젠을 형성하는 것을 포함함을 특징으로 하는 디니트로비스(하이드록시메틸)벤젠의 제조방법.
- 제4항에 있어서, 단계 (a)의 반응물이 α,α'-디클로로-p-크실렌이고, 단계 (b)의 생성물이 디니트로-1,4-비스(하이드록시메틸)벤젠인 방법.
- 하기 구조를 갖는 그룹들을 함유하는 광활성 화합물, 상기 광활성 화합물과 동일한 화합물 또는 다른 화합물인 염 형성기 그룹을 갖는 화합물 및 물을 포함함을 특징으로 하는 전착가능한 포토레지스트 조성물 :상기 식에서, X 및 Y는 할로겐, -OH, -OR, -O-SO2R, -SR 및 -NRR'로 이루어지는 그룹으로부터 선택되는 동일하거나 다른 구성원일 수 있고; R 및 R'는 수소 또는 치환되거나 미치환된 알킬, 아릴 또는 아르알킬 치환제이다.
- 제17항에 있어서, 상기 염 형성 그룹이 수성 매질중에서 음이온을 형성하는 포토레지스트 조성물.
- 제17항에 있어서, 상기 염 형성 그룹이 수성 매질중에서 양이온을 형성하는 포토레지스트 조성물.
- 제17항에 있어서, 상기 염 형성 그룹을 갖는 중합체가 에폭시-아민 수지를 포함하는 포토레지스트 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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KR1019997002616A KR100231955B1 (ko) | 1994-07-13 | 1999-03-26 | 2,6-디니트로벤질기를 기재로한 광활성 중합체를 포함하는 포토레지스트 조성물 |
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US8/274,614 | 1994-07-13 | ||
US08/274,614 | 1994-07-13 | ||
US08/274,614 US5600035A (en) | 1994-07-13 | 1994-07-13 | Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups |
PCT/US1995/008121 WO1996002491A1 (en) | 1994-07-13 | 1995-06-29 | Positive photoactive compounds based on 2,6-dinitrobenzyl groups |
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KR1019997002616A KR100231955B1 (ko) | 1994-07-13 | 1999-03-26 | 2,6-디니트로벤질기를 기재로한 광활성 중합체를 포함하는 포토레지스트 조성물 |
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EP (1) | EP0770053B1 (ko) |
JP (1) | JP2871859B2 (ko) |
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WO1997048677A1 (en) * | 1996-06-17 | 1997-12-24 | Ppg Industries, Inc. | Non-ionic photoacid generators with improved quantum efficiency |
GB9727186D0 (en) * | 1997-12-24 | 1998-02-25 | Du Pont Uk | Photoactive materials applicable to imaging systems |
US6100008A (en) * | 1998-09-14 | 2000-08-08 | Ppg Industries Ohio, Inc. | Positive photoresist with improved contrast ratio and photospeed |
US8065795B2 (en) | 2001-03-08 | 2011-11-29 | Ppg Industries Ohio, Inc | Multi-layer circuit assembly and process for preparing the same |
US6951707B2 (en) * | 2001-03-08 | 2005-10-04 | Ppg Industries Ohio, Inc. | Process for creating vias for circuit assemblies |
US7000313B2 (en) * | 2001-03-08 | 2006-02-21 | Ppg Industries Ohio, Inc. | Process for fabricating circuit assemblies using electrodepositable dielectric coating compositions |
US6671950B2 (en) | 2001-03-08 | 2004-01-06 | Ppg Industries Ohio, Inc. | Multi-layer circuit assembly and process for preparing the same |
US6713587B2 (en) | 2001-03-08 | 2004-03-30 | Ppg Industries Ohio, Inc. | Electrodepositable dielectric coating compositions and methods related thereto |
FR2838048B1 (fr) * | 2002-04-03 | 2005-05-27 | Prod Dentaires Pierre Rolland | Produit dentaire reticulable/dereticulable |
US20050215054A1 (en) * | 2002-06-07 | 2005-09-29 | Rasmussen Frank E | Feed-through process and amplifier with feed-through |
US6824959B2 (en) | 2002-06-27 | 2004-11-30 | Ppg Industries Ohio, Inc. | Process for creating holes in polymeric substrates |
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SU150832A1 (ru) * | 1962-01-17 | 1962-11-30 | Л.С. Блинова | Способ получени 2,4-динитробензальдегида |
US3325568A (en) * | 1963-06-10 | 1967-06-13 | Velsicol Chemical Corp | Diphosphates of xylylene |
AR204859A1 (es) * | 1974-03-28 | 1976-03-05 | Bayer Ag | Procedimiento para la produccion de 2-nitrobenzaldehido |
US4551416A (en) * | 1981-05-22 | 1985-11-05 | At&T Bell Laboratories | Process for preparing semiconductors using photosensitive bodies |
US4666820A (en) * | 1983-04-29 | 1987-05-19 | American Telephone And Telegraph Company, At&T Laboratories | Photosensitive element comprising a substrate and an alkaline soluble mixture |
EP0155231B2 (de) * | 1984-03-07 | 1997-01-15 | Ciba-Geigy Ag | Verfahren zur Herstellung von Abbildungen |
JPS63146029A (ja) * | 1986-12-10 | 1988-06-18 | Toshiba Corp | 感光性組成物 |
JPS63247749A (ja) * | 1987-04-02 | 1988-10-14 | Konica Corp | 感光性組成物および感光性平版印刷版 |
DE3728926A1 (de) * | 1987-08-29 | 1989-03-09 | Bayer Ag | Verfahren zur reinigung von nitrobenzaldehyd |
JPH07119374B2 (ja) * | 1987-11-06 | 1995-12-20 | 関西ペイント株式会社 | ポジ型感光性カチオン電着塗料組成物 |
CA1334897C (en) * | 1988-08-02 | 1995-03-28 | Mamoru Seio | Electrodeposition coating composition and image-forming method using the same |
JP2804579B2 (ja) * | 1989-02-14 | 1998-09-30 | 関西ペイント株式会社 | ポジ型感光性電着塗料組成物及びこれを用いた回路板の製造方法 |
JPH03131626A (ja) * | 1989-10-17 | 1991-06-05 | Kanegafuchi Chem Ind Co Ltd | 感光性両親媒性高分子化合物とその製法 |
JPH03141357A (ja) * | 1989-10-27 | 1991-06-17 | Kanegafuchi Chem Ind Co Ltd | 感光性両親媒性高分子化合物とその製法 |
DE3939759A1 (de) * | 1989-12-01 | 1991-06-06 | Bayer Ag | Verfahren zur herstellung von benzaldehyden |
JPH0539444A (ja) * | 1990-11-30 | 1993-02-19 | Hitachi Chem Co Ltd | ポジ型感光性アニオン電着塗料樹脂組成物、これを用いた電着塗装浴、電着塗装法及びプリント回路板の製造方法 |
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1994
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1995
- 1995-06-29 AT AT95924728T patent/ATE183494T1/de not_active IP Right Cessation
- 1995-06-29 JP JP8505035A patent/JP2871859B2/ja not_active Expired - Fee Related
- 1995-06-29 MX MX9700349A patent/MX9700349A/es unknown
- 1995-06-29 DK DK95924728T patent/DK0770053T3/da active
- 1995-06-29 AU AU29122/95A patent/AU2912295A/en not_active Abandoned
- 1995-06-29 KR KR1019970700170A patent/KR100227061B1/ko not_active IP Right Cessation
- 1995-06-29 EP EP95924728A patent/EP0770053B1/en not_active Expired - Lifetime
- 1995-06-29 CA CA002195014A patent/CA2195014C/en not_active Expired - Fee Related
- 1995-06-29 DE DE69511559T patent/DE69511559T2/de not_active Expired - Lifetime
- 1995-06-29 WO PCT/US1995/008121 patent/WO1996002491A1/en active IP Right Grant
- 1995-06-29 ES ES95924728T patent/ES2138219T3/es not_active Expired - Lifetime
- 1995-07-07 ZA ZA955686A patent/ZA955686B/xx unknown
- 1995-07-07 IL IL11450495A patent/IL114504A/xx not_active IP Right Cessation
- 1995-07-12 MY MYPI95001951A patent/MY118639A/en unknown
- 1995-07-13 PE PE1995273731A patent/PE23796A1/es not_active Application Discontinuation
- 1995-07-13 TR TR95/00850A patent/TR199500850A2/xx unknown
- 1995-07-14 TW TW084107302A patent/TW422943B/zh not_active IP Right Cessation
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1996
- 1996-07-22 US US08/685,062 patent/US5733479A/en not_active Expired - Fee Related
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1998
- 1998-08-14 HK HK98109936A patent/HK1009266A1/xx not_active IP Right Cessation
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1999
- 1999-03-26 KR KR1019997002616A patent/KR100231955B1/ko not_active IP Right Cessation
- 1999-11-10 GR GR990402895T patent/GR3031802T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
WO1996002491A1 (en) | 1996-02-01 |
ES2138219T3 (es) | 2000-01-01 |
CA2195014A1 (en) | 1996-02-01 |
HK1009266A1 (en) | 1999-05-28 |
GR3031802T3 (en) | 2000-02-29 |
US5733479A (en) | 1998-03-31 |
AU2912295A (en) | 1996-02-16 |
US5600035A (en) | 1997-02-04 |
EP0770053B1 (en) | 1999-08-18 |
TR199500850A2 (tr) | 1996-10-21 |
KR100231955B1 (ko) | 2000-03-15 |
ATE183494T1 (de) | 1999-09-15 |
DE69511559D1 (de) | 1999-09-23 |
PE23796A1 (es) | 1996-06-15 |
TW422943B (en) | 2001-02-21 |
IL114504A0 (en) | 1995-11-27 |
DE69511559T2 (de) | 2000-05-04 |
MY118639A (en) | 2004-12-31 |
KR100227061B1 (ko) | 1999-10-15 |
JP2871859B2 (ja) | 1999-03-17 |
DK0770053T3 (da) | 2000-03-13 |
EP0770053A1 (en) | 1997-05-02 |
MX9700349A (es) | 1998-03-31 |
IL114504A (en) | 1999-12-31 |
JPH09508139A (ja) | 1997-08-19 |
CA2195014C (en) | 2001-12-04 |
ZA955686B (en) | 1997-01-07 |
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