KR920018101A - 산 촉매반응에 의해 가교될 수 있는 공중합체 - Google Patents
산 촉매반응에 의해 가교될 수 있는 공중합체 Download PDFInfo
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- KR920018101A KR920018101A KR1019920002710A KR920002710A KR920018101A KR 920018101 A KR920018101 A KR 920018101A KR 1019920002710 A KR1019920002710 A KR 1019920002710A KR 920002710 A KR920002710 A KR 920002710A KR 920018101 A KR920018101 A KR 920018101A
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- Prior art keywords
- alkyl
- hydrogen
- copolymer
- iii
- phenyl
- Prior art date
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- 229920001577 copolymer Polymers 0.000 title claims 15
- 238000007171 acid catalysis Methods 0.000 title claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 12
- 239000001257 hydrogen Substances 0.000 claims 12
- 239000000203 mixture Substances 0.000 claims 10
- 150000002431 hydrogen Chemical class 0.000 claims 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 5
- 125000001624 naphthyl group Chemical group 0.000 claims 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 229910052736 halogen Inorganic materials 0.000 claims 4
- 150000002367 halogens Chemical class 0.000 claims 4
- -1 ethylene, propylene Chemical group 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 claims 2
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 229910021607 Silver chloride Inorganic materials 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 238000005227 gel permeation chromatography Methods 0.000 claims 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 125000006239 protecting group Chemical group 0.000 claims 1
- 239000011253 protective coating Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims 1
- 150000003460 sulfonic acids Chemical class 0.000 claims 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 claims 1
- 125000005958 tetrahydrothienyl group Chemical group 0.000 claims 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 claims 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
- C08F212/24—Phenols or alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (17)
- 산 촉매반응에 의해 가교될 수 있고 또 a) 1 : 1 내지 1 : 9 비율이 하기 일반식(Ⅰ) 및 (Ⅱ)의 구조반복 단위체 100 내지 80몰% 및 b) 하기 일반식(Ⅲ)의 구조반복 단위체 0 내지 20몰%로 구성되며 겔 투과 크로마토그래피로써 측정된 분자량(Nw)이 103내지 106인 공중합체 :(상기식에서, X 및 X'는 서로 독립해서 -CH-CH2-, C(CH3)-CH2- 또는이고, R는 수소 또는 산의 작용에 의해 제거될 수 있는 보호기이며, 라디칼 R1은 서로 독립해서 C1-C5알킬, 페닐 또는 나프틸이거나 또는 서로 합쳐져서 1,2-페닐렌 또는 -〔C(R3)(R4)〕x-이며, R3및/또는 R4는 수소 또는 메틸이고, x는 2 내지 5이며, 라디칼 R2는 서로 독립해서 수소, C1-C5알킬 또는 C1-C5알콕시이고, R5및 R7는 각각 수소이며, R6는 수소, 할로겐 또는 메틸이고, R8은 수소, 할로겐, 메틸, -CH2할로겐, -CH2CN, -CN, -COOH, -CONH2, -O-C1-C5알킬, -O-CO-C1-C5알킬, -COO-C1-C5알킬, -COO-페닐 또는 페닐이거나, 또는 R5및 R6는 각각 수소이고, 또R7및 R8은 합쳐져서 -CO-O-CO-이거나 또는 서로 독립해서 -COOH 또는 -COO-C1-C5알킬임.
- 제1항에 있어서, 100 내지 90몰%의 일반식(Ⅰ) 및 (Ⅱ)의 구조반복 단위체 및 0 내지 10몰%의 일반식(Ⅲ)의 구조반복 단위체로 구성된 공중합체.
- 제1항에 있어서, X 및 X'이 -C(CH3)-CH2-이고, 또 특히 각각 -CH-CH2인 공중합체.
- 제1항에 있어서, 라디칼 R1이 합쳐져서, -〔C(R3)(R4)〕x-이고 또 라디칼 R2는 각각 수소, 메틸, 에틸, 메톡시 또는 에톡시인 공중합체.
- 제1항에 있어서, R이 하기 일반식(Ⅳ), (Ⅴ), (Ⅵ) 또는 (Ⅶ)의 라디칼인 공중합체.-COO-C(CH3)3(Ⅵ) 또는 -CO-R13(Ⅶ),상기식에서, R9는 수소 또는 메틸이고, R10은 C1-C5알킬, 페닐 또는 나프틸이며, R11및 R12는 서로 독립해서 수소, C1-C5알킬, 페닐 또는 나프틸이거나, 또는 R10및 R12는 합쳐져서 비치환되거나 또는 C1-C4알킬, C1-C4알콕시, 페닐, 나프틸, 페녹시 또는 나프톡시에 의해 치환된 에틸렌, 프로필렌 또는 부틸렌이고, y는 2,3 또는 4이고, 또 R13는 C1-C5알킬 또는 C1-C5알콕시임.
- 제5항에 있어서, R은 -COO-C(CH3)3이고, 또 특히 y가 2 또는 3인 일반식(Ⅴ)의 라디칼인 공중합체.
- 제1항에 있어서, X 및 X'가 -CH-CH2-이고, R 및 2개의 라디칼 R2가 각각 수소이며 또 라디칼 R1이 합쳐져서 -〔C(R3)(R4)〕x이고 x가 2 내지 4, 특히 2 또는 3인 공중합체.
- ⅰ) 한 개 이상의 제1항에 따른 공중합체 및 ⅱ) 화학선하에서 산을 형성하는 한 개 이상의 화합물을 포함하는 감광성 조성물.
- 제8항에 있어서, 성분 ⅲ)으로서 용매 또는 용매의 혼합물을 포함하는 조성물.
- 제8항에 있어서, 공중합체 ⅰ)이 100 내지 90몰%의 일반식(Ⅰ) 및 (Ⅱ)의 반복구조 단위체 및 0 내지 10몰%의 일반식(Ⅲ)의 반복구조 단위체로 구성된 조성물.
- 제8항에 있어서, 공중합체 ⅰ)에서 X 및 X'이 -C(CH3)-CH2이고, 또 특히 각각 -CH-CH2인 조성물.
- 제8항에 있어서, 공중합체 ⅰ)중의 R이 -COO-C(CH3)3이고, 또 특히 y가 2 또는 3인 일반식(Ⅴ)의 라디칼인 조성물.
- 제8항에 있어서, 공중합체 ⅰ)중의 X 및 X'이 -H-CH2이고, R 및 2개의 라디칼 R2가 각각 수소이며, 또 라디칼 R1이 합쳐져서 X-〔C(R3)(R4)〕|x-이고, x가 2 내지 4 특히 2 또는 3인 조성물.
- 제8항에 있어서, 성분 ⅱ)로서 한 개 이상의 하기 일반식(Ⅷ)의 화합물로 포함하는 조성물.(Ⅷ)상기식에서, Ar1은 각각 비치환되거나 또는 할로겐, C1-C4알킬, C1-C4알콕시, -OH 및/또는 니트로에 의해 치환된 페닐, 나프틸 또는 페닐 -COCH2-이고, Z1은 C1-C6알킬 또는 C3-C7시클로알킬이며, Z2는 테트라히드로티엔일, 테트라히드로푸릴 또는 헥사히드로피릴이고, q는 0, 1, 2 또는 3이고, r은 0, 1 또는 2이며, s는 0 또는 1이고, q+r+s의 합은 3이며,은 염화물, 부롬화물 또는 요오드화물 음이온, 또는 유기 술폰산 또는 카르복시산의 음이온임.
- 제14항에 있어서, Ar1이 페닐이고, q가 3이며, r 및 s가 0이며, 인 조성물.
- 제8항에 있어서, 화합물 ⅱ)가 공중합체 ⅰ)의 중량을 기준으로 하여 0.1 내지 20중량%, 특히 1 내지 10중량%의 양으로 존재하는 조성물.
- 보호 코팅 및 릴리이프 구고 제조용, 특히 인쇄판, 인쇄회로 및 집적회로를 제조하기 위한 제8항에 따른 감광성 조성물의 용도.※참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH624/91-8 | 1991-03-01 | ||
| CH62491 | 1991-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR920018101A true KR920018101A (ko) | 1992-10-21 |
Family
ID=4191344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920002710A KR920018101A (ko) | 1991-03-01 | 1992-02-22 | 산 촉매반응에 의해 가교될 수 있는 공중합체 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5274060A (ko) |
| EP (1) | EP0502819A1 (ko) |
| JP (1) | JPH07179522A (ko) |
| KR (1) | KR920018101A (ko) |
| BR (1) | BR9200710A (ko) |
| CA (1) | CA2062096A1 (ko) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5807947A (en) * | 1988-10-21 | 1998-09-15 | Clariant Finance (Bvi) Limited | Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene |
| US6166161A (en) * | 1996-06-24 | 2000-12-26 | The Dow Chemical Company | Incorporation of functionalized comonomers in polyolefins |
| US7586013B2 (en) * | 2004-03-26 | 2009-09-08 | E.I. Du Pont De Nemours And Company | Method for preparing hydroxystyrenes and acetylated derivatives thereof |
| CA2574581A1 (en) * | 2004-07-23 | 2006-02-09 | Polnox Corporation | Anti-oxidant macromonomers and polymers and methods of making and using the same |
| US7902317B2 (en) | 2004-12-03 | 2011-03-08 | Polnox Corporation | Synthesis of aniline and phenol-based antioxidant macromonomers and corresponding polymers |
| US7799948B2 (en) | 2005-02-22 | 2010-09-21 | Polnox Corporation | Nitrogen and hindered phenol containing dual functional macromolecular antioxidants: synthesis, performances and applications |
| WO2006104957A2 (en) | 2005-03-25 | 2006-10-05 | Polnox Corporation | Alkylated and polymeric macromolecular antioxidants and methods of making and using the same |
| US8629782B2 (en) * | 2006-05-10 | 2014-01-14 | Schlumberger Technology Corporation | System and method for using dual telemetry |
| US8004421B2 (en) * | 2006-05-10 | 2011-08-23 | Schlumberger Technology Corporation | Wellbore telemetry and noise cancellation systems and method for the same |
| US7705176B2 (en) | 2005-10-27 | 2010-04-27 | Polnox Corporation | Macromolecular antioxidants based on sterically hindered phenols and phosphites |
| US20070149660A1 (en) | 2005-10-27 | 2007-06-28 | Vijayendra Kumar | Stabilized polyolefin compositions |
| WO2007064843A1 (en) | 2005-12-02 | 2007-06-07 | Polnox Corporation | Lubricant oil compositions |
| US7402713B2 (en) * | 2006-03-07 | 2008-07-22 | E.I. Du Pont De Nemours And Company | Processes for conversion of tyrosine to p-hydroxystyrene and p-acetoxystyrene |
| WO2008005358A2 (en) | 2006-07-06 | 2008-01-10 | Polnox Corporation | Novel macromolecular antioxidants comprising differing antioxidant moieties: structures, methods of making and using the same |
| US7767853B2 (en) | 2006-10-20 | 2010-08-03 | Polnox Corporation | Antioxidants and methods of making and using the same |
| US7468415B2 (en) * | 2007-01-04 | 2008-12-23 | E. I. Du Pont De Nemours And Company | Method for preparing glycidyloxystyrene monomers and polymers thereof |
| EP3071544B1 (en) | 2013-11-22 | 2022-07-06 | Polnox Corporation | Macromolecular antioxidants based on dual type moiety per molecule: structures methods of making and using the same |
| US20180251695A1 (en) | 2017-03-01 | 2018-09-06 | Polnox Corporation | Macromolecular Corrosion (McIn) Inhibitors: Structures, Methods Of Making And Using The Same |
| TW202120462A (zh) | 2019-08-09 | 2021-06-01 | 日商三菱瓦斯化學股份有限公司 | 化合物、聚合物、組成物、膜形成用組成物、圖型形成方法、絕緣膜之形成方法及化合物之製造方法，以及含有碘之乙烯基聚合物及其乙醯化衍生物之製造方法 |
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|---|---|---|---|---|
| US3063975A (en) * | 1960-03-25 | 1962-11-13 | Monsanto Chemicals | Copolymers of vinylbenzyl alcohol and vinylbenzyl alkyl ethers |
| US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
| GB1539192A (en) * | 1975-01-27 | 1979-01-31 | Ici Ltd | Photopolymerisable compositions |
| US4205151A (en) * | 1975-04-04 | 1980-05-27 | Dynapol | Polymeric N-substituted maleimide antioxidants |
| DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
| US4225689A (en) * | 1978-07-26 | 1980-09-30 | Eastman Kodak Company | Aldehyde-containing vinylaryl ethers |
| US4439517A (en) * | 1982-01-21 | 1984-03-27 | Ciba-Geigy Corporation | Process for the formation of images with epoxide resin |
| GB8413395D0 (en) * | 1984-05-25 | 1984-07-04 | Ciba Geigy Ag | Production of images |
| US4737426A (en) * | 1985-05-15 | 1988-04-12 | Ciba-Geigy Corporation | Cyclic acetals or ketals of beta-keto esters or amides |
| US4800224A (en) * | 1986-05-16 | 1989-01-24 | Ciba-Geigy Corporation | Optically active styrene derivatives, polymers obtained from these, complexes with iridium(I) and their use |
| US4800152A (en) * | 1987-03-16 | 1989-01-24 | International Business Machines Corporation | Negative resist compositions |
| DE3821585A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
-
1992
- 1992-02-20 EP EP92810125A patent/EP0502819A1/de not_active Withdrawn
- 1992-02-22 KR KR1019920002710A patent/KR920018101A/ko not_active Application Discontinuation
- 1992-02-27 US US07/843,798 patent/US5274060A/en not_active Expired - Lifetime
- 1992-02-28 BR BR929200710A patent/BR9200710A/pt not_active Application Discontinuation
- 1992-02-28 CA CA002062096A patent/CA2062096A1/en not_active Abandoned
- 1992-03-02 JP JP4080461A patent/JPH07179522A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0502819A1 (de) | 1992-09-09 |
| JPH07179522A (ja) | 1995-07-18 |
| CA2062096A1 (en) | 1992-09-02 |
| BR9200710A (pt) | 1992-11-10 |
| US5274060A (en) | 1993-12-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |