KR970020217A - Si-O 함유 피복물의 침착방법 - Google Patents

Si-O 함유 피복물의 침착방법 Download PDF

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Publication number
KR970020217A
KR970020217A KR1019960049366A KR19960049366A KR970020217A KR 970020217 A KR970020217 A KR 970020217A KR 1019960049366 A KR1019960049366 A KR 1019960049366A KR 19960049366 A KR19960049366 A KR 19960049366A KR 970020217 A KR970020217 A KR 970020217A
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KR
South Korea
Prior art keywords
oxygen
reactive gas
gas mixture
deposition
support
Prior art date
Application number
KR1019960049366A
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English (en)
Inventor
마크 존 로보다
Original Assignee
루이스 노만 에드워드
다우 코닝 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 루이스 노만 에드워드, 다우 코닝 코포레이션 filed Critical 루이스 노만 에드워드
Publication of KR970020217A publication Critical patent/KR970020217A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

본 발명은 규소와 산소를 함유하고 유기 규소 물질과 산소 공급원으로 이루어진 반응성 기체 혼합물을 화학 증착시켜 형성된 피복물에 관한 것이다. 당해 방법은 반응성 기체 혼합물을 피복될 지지체를 함유하는 침착 챔버에 도입하는 단계 및 혼합물을 반응시켜 피복물을 형성하는 단계를 포함한다.

Description

Si-O 함유 피복물의 침착방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 디메틸실란 및 트리메틸실란으로부터 선택된 유기 규소 물질과 산소공급원으로 이루어진 반응성 기체 혼합물을 지지체를 함유하는 침착 챔버에 도입하는 단계 및 반응성 기체 혼합물을 반응시켜 규소와 산소를 함유하는 피복물을 형성하는 단계를 포함하여, 규소와 산소를 함유하는 피복물을 지지체에 침착시키는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960049366A 1995-10-30 1996-10-29 Si-O 함유 피복물의 침착방법 KR970020217A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55026195A 1995-10-30 1995-10-30
US08/550,261 1995-10-30

Publications (1)

Publication Number Publication Date
KR970020217A true KR970020217A (ko) 1997-05-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960049366A KR970020217A (ko) 1995-10-30 1996-10-29 Si-O 함유 피복물의 침착방법

Country Status (4)

Country Link
EP (1) EP0774533A1 (ko)
JP (1) JPH09172012A (ko)
KR (1) KR970020217A (ko)
TW (1) TW328971B (ko)

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Also Published As

Publication number Publication date
JPH09172012A (ja) 1997-06-30
TW328971B (en) 1998-04-01
EP0774533A1 (en) 1997-05-21

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