KR970010687A - 프레스 성형용 금형 및 그것을 사용하여 성형된 컴퓨터 메모리용 유리원반 - Google Patents

프레스 성형용 금형 및 그것을 사용하여 성형된 컴퓨터 메모리용 유리원반 Download PDF

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KR970010687A
KR970010687A KR1019960036268A KR19960036268A KR970010687A KR 970010687 A KR970010687 A KR 970010687A KR 1019960036268 A KR1019960036268 A KR 1019960036268A KR 19960036268 A KR19960036268 A KR 19960036268A KR 970010687 A KR970010687 A KR 970010687A
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molding
computer memory
carbon coating
molding surface
mold
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KR100385257B1 (ko
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야수아끼 사까모또
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야수아끼 사까모또
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B40/00Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0254Physical treatment to alter the texture of the surface, e.g. scratching or polishing
    • C23C16/0263Irradiation with laser or particle beam
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73911Inorganic substrates
    • G11B5/73913Composites or coated substrates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739Magnetic recording media substrates
    • G11B5/73911Inorganic substrates
    • G11B5/73921Glass or ceramic substrates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/24Carbon, e.g. diamond, graphite, amorphous carbon
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/40Product characteristics
    • C03B2215/44Flat, parallel-faced disc or plate products
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/40Product characteristics
    • C03B2215/45Ring or doughnut disc products or their preforms
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
    • G11B11/10582Record carriers characterised by the selection of the material or by the structure or form
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Magnetic Record Carriers (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Liquid Crystal (AREA)

Abstract

탄소 코우팅을 행하기 전에, 초경재료로 제조된 금형 부재의 성형면에 대하여 이온주입을 행함으로써, 금형부재에 대한 탄소 코우팅의 부착성을 향상시킬 수 있으며, 금형의 수명을 증가시킬 수 있다.
금형 부재의 성형면에 탄소 코우팅을 행하여 소망하는 평면도를 확보한 성형용 프레스 금형에 있어서, 성형면에 탄소 코우팅을 행하기 전에 성형면에 대하여 이온 주입을 행하여, 성형면의 표층을 변성시키는 것을 특징으로 하고 있다.

Description

프레스 성형용 금형 및 그것을 사용하여 성형된 컴퓨터 메모리용 유리원반
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. 초경재료로 제조된 형 부재의 성형면에 탄소 코우팅을 행하여 소망하는 평면도가 확보되는 컴퓨터 메모리용 유리원반을 프레스 성형하기 위한 금형에 있어서, 성형면에 탄소 코우팅을 행하기 전에 성형면에 대하여 이온주입을 행하여 성형면의 표층을 변성시키는 것을 특징으로 하는 컴퓨터 메모리용 유리원반의 프레스 성형용 금형.
  2. 제1항에 있어서, 상기 성형면의 적어도 깊이 0.5μm까지의 표층에 대하여 이온주입을 행하는 것을 특징으로 하는 컴퓨터 메모리용 유리원반의 프레스 성형용 금형.
  3. 제1항에 있어서, 상기 탄소 코우팅이 상기 이온주입층 상에 두께 0.1∼1μm로 행해지는 것을 특징으로 하는 컴퓨터 메모리용 유리원반의 프레스 성형용 금형.
  4. 초경재료로 제조된 형 부재의 성형면에 탄소 코우팅을 행하여 소망하는 평면도가 확보된 성형용 금형의 성형면에 상기 탄소 코우팅을 행하기 전에, 성형면에 대하여 이온주입을 행하여 성형면의 표층을 변성시킨 금형을 사용하여 예비성형된 판유리를 프레스 성형하여 되는 컴퓨터 메모리용 유리원반.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960036268A 1995-08-29 1996-08-29 프레스성형용금형및그것을사용하여성형된컴퓨터메모리용유리원반 KR100385257B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52058595A 1995-08-29 1995-08-29
US08/520,585 1995-08-29

Publications (2)

Publication Number Publication Date
KR970010687A true KR970010687A (ko) 1997-03-27
KR100385257B1 KR100385257B1 (ko) 2003-08-09

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ID=24073252

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KR1019960036268A KR100385257B1 (ko) 1995-08-29 1996-08-29 프레스성형용금형및그것을사용하여성형된컴퓨터메모리용유리원반

Country Status (13)

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JP (2) JP3275091B2 (ko)
KR (1) KR100385257B1 (ko)
CN (1) CN1102470C (ko)
AU (1) AU718549B2 (ko)
CA (1) CA2184206C (ko)
DE (1) DE19634974A1 (ko)
FR (1) FR2738236B1 (ko)
GB (1) GB2304736B (ko)
IL (1) IL119144A0 (ko)
MY (1) MY115041A (ko)
NL (1) NL1003899C2 (ko)
SG (1) SG47172A1 (ko)
ZA (1) ZA967329B (ko)

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* Cited by examiner, † Cited by third party
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NL1008105C2 (nl) * 1998-01-23 1999-07-26 Axxicon Moulds Eindhoven Bv Spuitgietmatrijs.
JP2002079522A (ja) * 2000-06-23 2002-03-19 Hitachi Maxell Ltd ディスク基板成形金型及び樹脂成形金型
JP4702201B2 (ja) * 2006-06-28 2011-06-15 東洋製罐株式会社 樹脂加工用部材

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Also Published As

Publication number Publication date
IL119144A0 (en) 1996-11-14
FR2738236A1 (fr) 1997-03-07
CA2184206C (en) 2002-10-08
KR100385257B1 (ko) 2003-08-09
AU718549B2 (en) 2000-04-13
AU6432296A (en) 1997-03-06
DE19634974A1 (de) 1997-03-27
CN1102470C (zh) 2003-03-05
GB2304736A (en) 1997-03-26
MY115041A (en) 2003-03-31
ZA967329B (en) 1997-03-04
JP3275091B2 (ja) 2002-04-15
JPH09183622A (ja) 1997-07-15
JPH09194227A (ja) 1997-07-29
SG47172A1 (en) 1998-03-20
NL1003899C2 (nl) 1998-02-12
GB2304736B (en) 1999-09-22
CN1147983A (zh) 1997-04-23
CA2184206A1 (en) 1997-03-01
JP2909724B2 (ja) 1999-06-23
NL1003899A1 (nl) 1997-03-03
FR2738236B1 (fr) 1999-03-12
GB9618034D0 (en) 1996-10-09

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